Abstract: A system and method are disclosed for controlling a registration overlay. The method comprises estimating a state using moving horizon estimation and determining an input of the registration overlay using the state. The system comprises an estimator configured to determine a state using moving horizon estimation; and a regulator configured to determine an input of the registration overlay using the state.

Abstract: A method and model-predictive controller that takes raw overlay registration data from a metrology tool, such as the KLA-5200 metrology tool, and estimates process disturbances. Once these disturbances are estimated, the controller regulates them to zero, resulting in precise control of overlay. The controller includes a state estimator which is configured to estimate the following system states: wafer x-translation, wafer y-translation, wafer scale in x, wafer scale in y, wafer rotation, wafer non-orthogonality, reticle magnification, asymmetric magnification, reticle rotation, asymmetric reticle rotation. The controller includes a regulator which is configured to regulate the system states to desired targets.