Abstract: Infusion systems and related methods involving a catheter hub and an extension or IV administration set having a male Luer connector for fluid communication with the catheter hub. A support adaptor is provided with the extension or IV administration set and has a body with a length between first and second ends, and a body wall having a continuous wall surface in a radial direction relative to the length and which defines an exterior of the body. An internal wall of the support adaptor defines a bore with the body wall, wherein the bore has first and second openings. A tubing length is located in the bore and extends out of the second opening. The bore includes first and second bore sections. Optionally, the second bore section is angled relative to the first bore section. A support surface is located beneath the bore, elevation wise.

Abstract: A threshing and separating system including a non-stationary rotor cage including a perforated cylindrical body extending in a longitudinal direction from a first open end portion to a second open end portion. The first open end portion supported by a first rotatable coupling point, and the second open end portion supported by a second rotatable coupling point. The threshing and separating system also includes a rotor configured to rotate within the non-stationary rotor cage to thresh harvested crop. The non-stationary rotor cage is configured to rotate about an axis extending between the first rotatable coupling point and the second rotatable coupling point, and to be rotationally driven by the rotor via the threshed harvested crop.

Abstract: A threshing and separating system including a non-stationary rotor cage including a perforated cylindrical body extending in a longitudinal direction from a first open end portion to a second open end portion. The first open end portion supported by a first rotatable coupling point, and the second open end portion supported by a second rotatable coupling point. The threshing and separating system also includes a rotor configured to rotate within the non-stationary rotor cage to thresh harvested crop. The non-stationary rotor cage is configured to rotate about an axis extending between the first rotatable coupling point and the second rotatable coupling point, and to be rotationally driven by the rotor via the threshed harvested crop.

Abstract: The present embodiment relates to a miniaturized single-use apparatus for the preparation and analysis of suspensions of cells for flow cytometry. The cartridge apparatus is a unique combination, in order of function, of a miniature single-drive, two-cylinder syringe pump, a dual-channel stopcock valve that also performs volumetric measuring functions, a capillary-based fluid loading and measuring method, a miniaturized multistage interfacial-surface-generator mixer, a microfluidic magnetic cell selector, branching microfluidic channels with widths determined according to function, enclosed absorption-based disposal of potentially biohazardous liquids and a design compatible with manufacturing as a single-use device. In one embodiment the device for processing and labeling samples processes and samples small volumes, such as a drop of blood. The device can exist in hand-held versions, hand-carried versions and bench-scale versions of optical reading devices for flow cytometry.

Abstract: A system for feeding washing racks to an entrance of a washer, comprising: a directionally alternating transfer conveyor positioned at, and able to communicate said washing racks with, said entrance of said washer; said conveyor having a first receiving mode, a second receiving mode, and a discharge mode; and a pre-wash enclosure substantially surrounding said conveyor and including a first and second door, said first and said second door each actuable between an open position and a closed position; and a pre-wash selective water flow interior of said pre-wash enclosure and directed generally toward said conveyor.

Abstract: A silsesquioxane resins useful in antireflective coatings wherein the silsesquioxane resin has the formula (PhSiO(3-x)/2(OR?)x)m(HSiO(3-x)/2(OR?)x)n(MeSiO(3-x)/2(OR?)x)o(RSiO(3-x)/2(OR?)x)p and a method of forming an antireflective coating on an electronic device comprising applying to an electronic device an antireflective coating composition comprising the silsesquioxane resin and a solvent, and removing the solvent and curing the silsesquioxane resin to form an antireflective coating on the electronic device.

Abstract: An unload auger assembly for a combine harvester includes a drive coupler configured between adjacent first and second auger segments. The coupler includes a driver component and associated driver cog coupled to the first auger segment. A driven component and associated driven cog is coupled to the second auger segment. The driven cog is rotationally engaged by the driver cog to transmit rotational drive from the first auger segment to the second auger segment. A friction clutch is configured in-line between the driver component and driven component and rotationally couples the driver component to the driven up to a release torque value wherein the friction clutch disengages the driver component from the driven component.

Abstract: A silsesquioxane resin is applied on top of the patterned photo-resist and cured to produce a cured silsesquioxane resin on top of the pattern surface. Subsequently, an aqueous base stripper or a reactive ion etch recipe containing CF4 is used to “etch back” the silicon resin to the top of the photoresist material, exposing the entire top surface of the photoresist. Then, a second reactive ion etch recipe containing O2 to etch away the photoresist. The result is a silicon resin film with via holes with the size and shape of the post that were patterned into the photoresist. Optionally, the new pattern can be transferred into the underlying layer(s).

Abstract: A silsesquioxane resin is applied on top of the patterned photo-resist and cured to produce a cured silsesquioxane resin on top of the pattern surface. Subsequently, a reactive ion etch recipe containing CF4 to “etch back” the silicon resin to the top of the photoresist material, exposing the entire top surface of the organic based photoresist. Then, a second reactive ion etch recipe containing O2 to etch away the organic photoresist. The result is a silicon resin film with via holes with the size and shape of the post that were patterned into the photoresist. Optionally, the new pattern can be transferred into the underlying layer(s).

Abstract: A silsesquioxane resin is applied over the patterned photo-resist and cured at the pattern surface to produce a cured silsesquioxane resin on the pattern surface. The uncured silsesquioxane resin layer is then removed leaving the cured silsesquioxane resin on the pattern surface. The cured silsesquioxane resin on horizontal surfaces is removed to expose the underlying photo-resist. This photo-resist is removed leaving a pattern of cured silsesquioxane. Optionally, the new pattern can be transferred into the underlying layer(s).

Abstract: An unload auger assembly for a combine harvester includes a drive coupler configured between adjacent first and second auger segments. The coupler includes a driver component and associated driver cog coupled to the first auger segment. A driven component and associated driven cog is coupled to the second auger segment. The driven cog is rotationally engaged by the driver cog to transmit rotational drive from the first auger segment to the second auger segment. A friction clutch is configured in-line between the driver component and driven component and rotationally couples the driver component to the driven up to a release torque value wherein the friction clutch disengages the driver component from the driven component.

Abstract: A polysilane-polysilazane copolymer contains a polysilane unit of formula (I), and a polysilazane unit of formula (II), where each R1 and each R2 are each independently selected from H, Si, and N atoms, R3 is selected from H, Si, or C atoms, a?1, b?1, and a quantity (a+b)?2. The polysilane-polysilazane copolymer may be formulated in a composition with a solvent. The polysilane-polysilazane copolymer may be used in PMD and STI applications for trench filling, where the trenches have widths of 100 nm or less and aspect ratios of at least (6). The polysilane-polysilazane copolymer can be prepared by amination of a perchloro polysilane having (2) or more silicon atoms per molecule with a primary amine.

Abstract: A method of forming an antireflective coating on an electronic device comprising (A) applying to an electronic device an ARC composition comprising (i) a silsesquioxane resin having the formula (PhSiO(3-X)/2(OH)x)mHSiO(3-x)/2(OH)x)N(MeSiO(3-x)/2(OH)x)p where Ph is a phenyl group, Me is a methyl group, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95, p has a value of 0.05 to 0.95, and m+n+p?1; and (ii) a solvent; and (B) removing the solvent and curing the silsesquioxane resin to form an antireflective coating on the electronic device.

Abstract: Disclosed is silsesquioxane resin composition that contains a free radical curable functional group that is stabilized with a hydrophilic inhibitor. The hydrophilic inhibitor that has the capability to scavenge free radicals such as ascorbic acid or salicylic acid is used to stabilize the resin. The resins are useful in semiconductor formation such as for anti-reflective coatings, hardmasks or photoresist layers.

Abstract: A silsesquioxane-based composition that contains (a) silsesquioxane resins that contain HSiO3/2 units and RSiO3/2 units wherein; R is an acid dissociable group, and (b) 7-diethylamino-4-methylcoumarin. The silsesquioxane-based compositions are useful as positive resist compositions in forming patterned features on substrate, particularly useful for multi-layer layer (i.e. bilayer) 193 nm & 157 nm photolithographic applications.

Abstract: A simple and practical method that can reduce the feature size of a patterned structure bearing surface hydroxyl groups is described. The patterned structure can be obtained by any patterning technologies, such as photo-lithography, e-beam lithography, nano-imprinting lithography. The method includes: (1) initially converting the hydroxyl or silanol-rich surface into an amine-rich surface with the treatment of an amine agent, preferably a cyclic compound; (2) coating an epoxy material on the top of the patterned structure; (3) forming an extra layer when applied heat via a surface-initiated polymerization; (4) applying an amine coupling agent to regenerate the amine-rich surface; (5) coating an epoxy material on the top of the patterned structure to form the next layer; (6) repeating step 4 and 5 to form multiple layers; This method allows the fabrication of feature sizes of various patterns and contact holes that are difficult to reach by conventional lithographic methods.

Abstract: Embodiments of the present safety needle assembly include a slidable needle shield. Digital pressure applied to a leaf spring retention latch removes a compressive force from a biasing member and automatically moves the needle shield from a ready-to-use configuration to a protected configuration in which the needle shield covers the sharp needle tip. In the protected configuration the needle shield is prevented from sliding proximally along the needle a sufficient distance to expose the needle tip.

Abstract: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.

Abstract: A silsesquioxane resin comprised of the units (Ph(CH2)rSiO(3-x)/2(OR?)x)m, (HSiO(3-x)/2(OR?)x)n?(MeSiO(3-x)/2(OR?)x)o?(RSiO(3-x)/2(OR?)x)p, (R1SiO(3-x)/2(OR?)x)q where Ph is a phenyl group, Me is a methyl group; R? is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from an aryl sulfonate ester group; and R1 is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.95; n has a value of 0.05 to 0.95; o has a value of 0.05 to 0.95; p has a value of 0.05 to 0.5; q has a value of 0 to 0.5; and m+n+o+p+q=1.