Patents by Inventor Scott Peitzsch

Scott Peitzsch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrostatic chuck to limit particle deposits thereon
    Patent number: 7583491
    Abstract: An ion implanter includes an electrostatic chuck. The electrostatic chuck is configured to repel charged particles from a surface of the electrostatic chuck to limit deposits of the charged particles on the surface when the electrostatic chuck is not supporting any workpiece. An electrostatic chuck including a dielectric layer and at least one electrode is also provided. The at least one electrode is configured to accept a DC voltage signal to produce a first charge to repel charged particles from the dielectric layer when the dielectric layer is not supporting any workpiece to thereby limit deposits of the charged particles on the dielectric layer.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: September 1, 2009
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Scott Peitzsch