Patents by Inventor Scott R. Sayles

Scott R. Sayles has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11981991
    Abstract: An aluminum or copper alloy sputtering chamber includes a front surface, a back surface opposite the front surface, and a sputter trap formed on at least a portion of the front surface A coating of titanium particles is formed on the sputter trap.
    Type: Grant
    Filed: January 9, 2023
    Date of Patent: May 14, 2024
    Assignee: Honeywell International Inc.
    Inventors: Jaeyeon Kim, Patrick Underwood, Susan D. Strothers, Shih-Yao Lin, Michael D. Payton, Scott R. Sayles
  • Publication number: 20230143320
    Abstract: An aluminum or copper alloy sputtering chamber includes a front surface, a back surface opposite the front surface, and a sputter trap formed on at least a portion of the front surface A coating of titanium particles is formed on the sputter trap.
    Type: Application
    Filed: January 9, 2023
    Publication date: May 11, 2023
    Inventors: Jaeyeon Kim, Patrick Underwood, Susan D. Strothers, Shih-Yao Lin, Michael D. Payton, Scott R. Sayles
  • Patent number: 11584985
    Abstract: A sputtering chamber component including a front surface, a back surface opposite the front surface, and a sputter trap formed on at least a portion of the back surface, and a coating of metallic particles formed on the sputter trap. The coating has a thickness from about 0.025 mm to about 2.54 mm (0.001 inches to about 0.1 inches) and is substantially free of impurities, and the particles of the coating are substantially diffused.
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: February 21, 2023
    Assignee: Honeywell International Inc.
    Inventors: Jaeyeon Kim, Patrick Underwood, Susan D. Strothers, Shih-Yao Lin, Michael D. Payton, Scott R. Sayles
  • Patent number: 10968510
    Abstract: A sputter trap formed on at least a portion of a sputtering chamber component has a plurality of particles and a particle size distribution plot with at least two different distributions. A method of forming a sputter trap having a particle size distribution plot with at least two different distributions is also provided.
    Type: Grant
    Filed: April 13, 2020
    Date of Patent: April 6, 2021
    Assignee: Honeywell International Inc.
    Inventors: Jaeyeon Kim, Patrick K. Underwood, Susan D. Strothers, Michael D. Payton, Scott R. Sayles
  • Publication number: 20200240004
    Abstract: A sputter trap formed on at least a portion of a sputtering chamber component has a plurality of particles and a particle size distribution plot with at least two different distributions. A method of forming a sputter trap having a particle size distribution plot with at least two different distributions is also provided.
    Type: Application
    Filed: April 13, 2020
    Publication date: July 30, 2020
    Inventors: Jaeyeon Kim, Patrick K. Underwood, Susan D. Strothers, Michael D. Payton, Scott R. Sayles
  • Patent number: 10655212
    Abstract: A sputter trap formed on at least a portion of a sputtering chamber component has a plurality of particles and a particle size distribution plot with at least two different distributions. A method of forming a sputter trap having a particle size distribution plot with at least two different distributions is also provided.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: May 19, 2020
    Assignee: Honeywell Internatonal Inc
    Inventors: Jaeyeon Kim, Patrick K. Underwood, Susan D. Strothers, Michael D. Payton, Scott R. Sayles
  • Publication number: 20200048761
    Abstract: A sputtering chamber component including a front surface, a back surface opposite the front surface, and a sputter trap formed on at least a portion of the back surface, and a coating of metallic particles formed on the sputter trap. The coating has a thickness from about 0.025 mm to about 2.54 mm (0.001 inches to about 0.1 inches) and is substantially free of impurities, and the particles of the coating are substantially diffused.
    Type: Application
    Filed: August 5, 2019
    Publication date: February 13, 2020
    Inventors: Jaeyeon Kim, Patrick Underwood, Susan D. Strothers, Shih-Yao Lin, Michael D. Payton, Scott R. Sayles
  • Publication number: 20180171465
    Abstract: A sputter trap formed on at least a portion of a sputtering chamber component has a plurality of particles and a particle size distribution plot with at least two different distributions. A method of forming a sputter trap having a particle size distribution plot with at least two different distributions is also provided.
    Type: Application
    Filed: November 28, 2017
    Publication date: June 21, 2018
    Inventors: Jaeyeon Kim, Patrick K. Underwood, Susan D. Strothers, Michael D. Payton, Scott R. Sayles
  • Publication number: 20170229295
    Abstract: A sputtering target assembly for use in a vapor deposition apparatus, the sputtering target assembly comprising a sputtering surface; a sidewall extending from the sputtering surface at an angle to the sputtering surface; a particle trap formed of a roughness located along the sidewall and extending radially from the sputtering surface, wherein the roughness of the particle trap has a macrostructure and a microstructure.
    Type: Application
    Filed: September 9, 2016
    Publication date: August 10, 2017
    Inventors: Jaeyeon Kim, Patrick K. Underwood, Susan D. Strothers, Michael D. Payton, Scott R. Sayles
  • Patent number: 7691240
    Abstract: The invention includes backing plates having coolant deflectors with at least a portion of each of the deflectors being nonlinear. Projections projecting from the backing plate are configured to insert into openings within a sputtering target. The invention includes targets having at least one opening to receive a fastener extending into the target through a back surface. The invention includes a target assembly having projections projecting from the backing plate and insertable within openings within the target. The invention includes a target assembly having a plurality of coolant deflectors disposed between the target and the backing plate. A segment of each of the deflectors is nonlinear. The invention includes methods of cooling a target. Coolant deflectors are disposed within a gap between the target and a backing plate with coolant deflectors being nonlinear along at least a portion of their length.
    Type: Grant
    Filed: May 1, 2006
    Date of Patent: April 6, 2010
    Assignee: Honeywell International Inc.
    Inventors: Werner H. Hort, Scott R. Sayles, Vince Speziale, Stephane Ferrasse, Harold A. Detlaff, Stuart D. Wright, Frank Alford, Andrew N. A. Wragg