Patents by Inventor Scott T. Smith
Scott T. Smith has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7260255Abstract: Digital pixel data is obtained from radiographic imaging of one or more objects, and corresponds to an imaged area containing a feature to be measured. A data profile for a region around the measured feature is created from the digital pixel data. A reference profile is then created from the data profile. The reference profile represents an expected data profile for a reference condition of the objects, and accounts for the point spread function of the imager. The difference between the data profile and the reference profile is calculated. Based on that difference, the degree by which the actual condition of the objects varies from the reference condition is determined. The calculated difference can be compared to a lookup table mapping previously calculated differences to degrees of variation from the reference condition. The calculated difference can also be used as an input to an experimentally derived formula.Type: GrantFiled: May 7, 2004Date of Patent: August 21, 2007Assignee: Science Applications International CorporationInventors: Raulf M. Polichar, Gary M. Rush, Scott T. Smith
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Patent number: 7058107Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: GrantFiled: March 18, 2004Date of Patent: June 6, 2006Assignee: Cymer, Inc.Inventors: David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Richard C. Ujazdowski, Richard M. Ness, Scott T. Smith, William G. Hulburd
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Patent number: 6985508Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: GrantFiled: July 24, 2003Date of Patent: January 10, 2006Assignee: Cymer, Inc.Inventors: David S. Knowles, Daniel J. W. Brown, Herve A. Besaucele, David W. Meyers, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom, Palash P. Das, Stuart L. Anderson, Igor V. Fomenkov, Richard C. Ujazdowski, Eckehard D. Onkels, Richard M. Ness, Scott T. Smith, William G. Hulburd, Jeffrey Oicles
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Patent number: 6882674Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.Type: GrantFiled: December 21, 2001Date of Patent: April 19, 2005Assignee: Cymer, Inc.Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski
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Publication number: 20040251415Abstract: A system for detecting and graphically displaying a contents of a fast-moving target object comprises: a radiation source, having a position such that at least a portion of radiation emitted from the radiation source passes through the fast-moving target object, the fast-moving target object having a variable velocity and acceleration while maintaining a substantially constant distance from the radiation source and being selected from the group consisting of: a vehicle, a cargo container and a railroad car; a velocity measuring device configured to measure the variable velocity of the fast-moving target object; a detector array comprising a plurality of photon detectors, having a position such that at least some of the at least a portion of the radiation passing through the target object is received thereby, the detector array having a variable count time according to the variable velocity and a grid unit size; a counter circuit coupled to the detector array for discretely counting a number of photons enterinType: ApplicationFiled: April 28, 2004Publication date: December 16, 2004Inventors: Victor V. Verbinski, Scott T. Smith, Kenneth H. Valentine, Judith Maxwell, Jeffrey M. Adams, Ryan Shyffer
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Patent number: 6801560Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: GrantFiled: January 23, 2002Date of Patent: October 5, 2004Assignee: Cymer, Inc.Inventors: David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Richard C. Ujazdowski, Richard M. Ness, Scott T. Smith, William G. Hulburd
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Patent number: 6796936Abstract: An implantable radiation therapy device includes a biocompatible radiotranslucent outer capsule containing a radiation shielding element and a radioactive isotope at least partially shielded by the shielding element. When the device is at or below body temperature, radiation is prevented or limited from being transmitted through the outer capsule by the shielding element. When non-ambient energy is applied to the device, the shielding element and radioactive isotope are reconfigured such that an increased level of radiation is transmitted through the outer capsule and emitted by the device.Type: GrantFiled: October 28, 2002Date of Patent: September 28, 2004Assignee: Syntheon, LLCInventors: Charles R. Slater, Scott L. Jahrmarkt, Scott T. Smith, Kevin W. Smith
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Publication number: 20040174919Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: ApplicationFiled: March 18, 2004Publication date: September 9, 2004Inventors: David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Richard C. Ujazdowski, Richard M. Ness, Scott T. Smith, William G. Hulburd
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Patent number: 6757316Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.Type: GrantFiled: May 11, 2001Date of Patent: June 29, 2004Assignee: Cymer, Inc.Inventors: Peter C. Newman, Thomas P. Duffey, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Vladimir B. Fleurov, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Xiaojiang J. Pan, Vladimir Kulgeyko, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov
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Patent number: 6738410Abstract: A grating based line narrowing unit with bi-directional beam expansion for line narrowing lasers. In a preferred embodiment a beam from the chamber of the laser is expanded in the horizontal direction with a three-prism beam expander and is expanded in the vertical direction with a single prism. A narrow band of wavelengths in the expanded beam is reflected from a grating in a Littrow configuration back via the two beam expanders into the laser chamber for amplification.Type: GrantFiled: December 15, 2000Date of Patent: May 18, 2004Assignee: Cymer, Inc.Inventors: William N. Partlo, Alexander I. Ershov, Scott T. Smith
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Patent number: 6713770Abstract: A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.Type: GrantFiled: March 15, 2002Date of Patent: March 30, 2004Assignee: Cymer, Inc.Inventors: Richard L. Sandstrom, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Scott T. Smith, Daniel J. W. Brown
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Publication number: 20040047385Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: ApplicationFiled: July 24, 2003Publication date: March 11, 2004Inventors: David S. Knowles, Daniel J.W. Brown, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom, Palash P. Das, Stuart L. Anderson, Igor V. Fomenkov, Richard C. Ujazdowski, Eckehard D. Onkels, Richard M. Ness, Scott T. Smith, William G. Hulburd, Jeffrey Oicles
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Patent number: 6625191Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: GrantFiled: November 30, 2001Date of Patent: September 23, 2003Assignee: Cymer, Inc.Inventors: David S. Knowles, Daniel J. W. Brown, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom, Palash P. Das, Stuart L. Anderson, Igor V. Fomenkov, Richard C. Ujazdowski, Eckehard D. Onkels, Richard M. Ness, Scott T. Smith, William G. Hulburd, Jeffrey Oicles
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Publication number: 20030118072Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.Type: ApplicationFiled: December 21, 2001Publication date: June 26, 2003Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski
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Publication number: 20030088146Abstract: An implantable radiation therapy device includes a biocompatible radiotranslucent outer capsule containing a radiation shielding element and a radioactive isotope at least partially shielded by the shielding element. When the device is at or below body temperature, radiation is prevented or limited from being transmitted through the outer capsule by the shielding element. When non-ambient energy is applied to the device, the shielding element and radioactive isotope are reconfigured such that an increased level of radiation is transmitted through the outer capsule and emitted by the device.Type: ApplicationFiled: October 28, 2002Publication date: May 8, 2003Inventors: Charles R. Slater, Scott L. Jahrmarkt, Scott T. Smith, Kevin W. Smith
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Patent number: 6552346Abstract: A system and method of density detection in a target object involve irradiating the target object, detecting a first and second discrete number of photons penetrating the target object through respective first and second prescribed volumes and entering respective first and second radiation detectors. First and second numbers of photons detected by the first and second radiation detectors are counted, and a display output signal is generated in response to the first and second numbers. A graphical representation of the densities within the first and second volumes of the target object is displayed.Type: GrantFiled: April 12, 2001Date of Patent: April 22, 2003Assignee: Science Applications International CorporationInventors: Victor V. Verbinski, Scott T. Smith, Kenneth H. Valentine, Victor J. Orphan
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Patent number: 6535531Abstract: A gas discharge laser with a pulse multiplier. In the pulse multiplier, short pulses from the laser are divided into portions and all or all but one of these portions are delayed in delay legs by different time periods and recombined to provide a stretched output pulse having substantially reduced intensity and longer duration as compared to the pulse from the laser. Focusing optics are included in each delay leg to assure that beam size and angular spread of each portion of the combined pulse is not substantially different from other portions of the pulse.Type: GrantFiled: November 29, 2001Date of Patent: March 18, 2003Assignee: Cymer, Inc.Inventors: Scott T. Smith, Alexander I. Ershov, Rajasekhar M. Rao
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Patent number: 6480275Abstract: A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.Type: GrantFiled: January 29, 2001Date of Patent: November 12, 2002Assignee: Cymer, Inc.Inventors: Richard L. Sandstrom, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Scott T. Smith
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Patent number: 6471631Abstract: An implantable radiation therapy device includes a biocompatible radiotranslucent outer capsule containing a radiation shielding element and a radioactive isotope at least partially shielded by the shielding element. When the device is at or below body temperature, radiation is prevented or limited from being transmitted through the outer capsule by the shielding element. When non-ambient energy is applied to the device, the shielding element and radioactive isotope are reconfigured such that an increased level of radiation is transmitted through the outer capsule and emitted by the device.Type: GrantFiled: May 22, 2000Date of Patent: October 29, 2002Assignee: Syntheon, LLCInventors: Charles R. Slater, Scott L. Jahrmarkt, Scott T. Smith, Kevin W. Smith
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Patent number: D530767Type: GrantFiled: December 22, 2005Date of Patent: October 24, 2006Assignee: Indiana Metal CraftInventors: Ronald D. Davis, James A. Harding, Scott T. Smith, David M. Felice