Patents by Inventor Scott W. Indermuehle

Scott W. Indermuehle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High-voltage energy-dispersive spectroscopy using a low-voltage scanning electron microscope
    Patent number: 9099276
    Abstract: A scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) apparatus that includes a scanning electron microscope, an x-ray detector, and an auxiliary acceleration voltage source. The scanning electron microscope includes a sample holder, and a layered electron beam column arranged to output an electron beam towards the sample holder at an initial beam energy. The auxiliary acceleration voltage source is to apply an auxiliary acceleration voltage between the sample holder and the layered electron beam column to accelerate the electron beam to a final beam energy. At the final beam energy, the electron beam is capable of generating x-rays at multiple wavelengths from a larger range of atomic species than the electron beam at the initial beam energy.
    Type: Grant
    Filed: January 24, 2014
    Date of Patent: August 4, 2015
    Assignee: Keysight Technologies, Inc.
    Inventors: Lawrence P. Muray, Scott W. Indermuehle, James P. Spallas, Ying Wu, Dimitri Klyachko
  • HIGH-VOLTAGE ENERGY-DISPERSIVE SPECTROSCOPY USING A LOW-VOLTAGE SCANNING ELECTRON MICROSCOPE
    Publication number: 20150213995
    Abstract: A scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) apparatus that includes a scanning electron microscope, an x-ray detector, and an auxiliary acceleration voltage source. The scanning electron microscope includes a sample holder, and a layered electron beam column arranged to output an electron beam towards the sample holder at an initial beam energy. The auxiliary acceleration voltage source is to apply an auxiliary acceleration voltage between the sample holder and the layered electron beam column to accelerate the electron beam to a final beam energy. At the final beam energy, the electron beam is capable of generating x-rays at multiple wavelengths from a larger range of atomic species than the electron beam at the initial beam energy.
    Type: Application
    Filed: January 24, 2014
    Publication date: July 30, 2015
    Inventors: Lawrence P. Muray, Scott W. Indermuehle, James P. Spallas, Ying Wu, Dimitri Klyachko
  • Layered scanning charged particle microscope package for a charged particle and radiation detector
    Patent number: 8110801
    Abstract: A scanning charged particle microscope includes a layered charged particle beam column package; a sample holder; and a layered micro-channel plate detector package located between the column package and the sample holder.
    Type: Grant
    Filed: March 5, 2010
    Date of Patent: February 7, 2012
    Assignee: Agilent Technologies, Inc.
    Inventors: Scott W. Indermuehle, Charles S. Silver, James P. Spallas, Lawrence P. Muray
  • LAYERED SCANNING CHARGED PARTICLE MICROSCOPE PACKAGE FOR A CHARGED PARTICLE AND RADIATION DETECTOR
    Publication number: 20100224779
    Abstract: A scanning charged particle microscope includes a layered charged particle beam column package; a sample holder; and a layered micro-channel plate detector package located between the column package and the sample holder.
    Type: Application
    Filed: March 5, 2010
    Publication date: September 9, 2010
    Inventors: Scott W. Indermuehle, Charles S. Silver, James P. Spallas, Lawrence P. Muray