Patents by Inventor Scott William Dunham

Scott William Dunham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7018940
    Abstract: A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: March 28, 2006
    Assignee: Genus, Inc.
    Inventor: Scott William Dunham
  • Publication number: 20040127067
    Abstract: A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor, chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.
    Type: Application
    Filed: September 4, 2003
    Publication date: July 1, 2004
    Inventor: Scott William Dunham
  • Patent number: 6626998
    Abstract: An RF electrode module for use with a gas-diffuser showerhead device in a CVD chamber has an electrically-conductive electrode ring with a ring, inside diameter (R-ID) and a ring outside diameter (R-OD). The ring has an upwardly-extending power post, and an internal water-cooling channel open to an upwardly extending inlet tube and an upwardly-extending outlet tube, the post and tubes parallel to a central axis of the ring. There is further an electrical-insulator ring having an insulator outside diameter (I-OD) equal to or greater than the R-OD and an insulator inside diameter (I-ID) equal to or smaller than the R-ID, and through-openings extending in the direction of the central axis of the ring and spaced such that the power post, inlet tube, and outlet tube extend through the through-openings in the insulator ring. In a preferred embodiment the I-ID is sized to engage a shoulder diameter of the gas diffuser showerhead device.
    Type: Grant
    Filed: November 8, 2000
    Date of Patent: September 30, 2003
    Assignee: Genus, Inc.
    Inventor: Scott William Dunham
  • Patent number: 6616766
    Abstract: A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.
    Type: Grant
    Filed: December 30, 2002
    Date of Patent: September 9, 2003
    Assignee: Genus, Inc.
    Inventor: Scott William Dunham
  • Publication number: 20030101934
    Abstract: A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.
    Type: Application
    Filed: December 30, 2002
    Publication date: June 5, 2003
    Inventor: Scott William Dunham
  • Publication number: 20010054391
    Abstract: A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.
    Type: Application
    Filed: August 23, 2001
    Publication date: December 27, 2001
    Inventor: Scott William Dunham
  • Patent number: 6284673
    Abstract: A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.
    Type: Grant
    Filed: January 24, 2001
    Date of Patent: September 4, 2001
    Assignee: Genus Inc.
    Inventor: Scott William Dunham
  • Publication number: 20010002582
    Abstract: A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.
    Type: Application
    Filed: January 24, 2001
    Publication date: June 7, 2001
    Inventor: Scott William Dunham
  • Patent number: 6206972
    Abstract: A showerhead diffuser apparatus for a CVD process has a first channel region having first plural independent radially-concentric channels and individual gas supply ports from a first side of the apparatus to individual ones of the first channels, a second channel region having second plural independent radially-concentric channels and a pattern of diffusion passages from the second channels to a second side of the apparatus, and a transition region between the first channel region and the second channel region having at least one transition gas passage for communicating gas from each first channel in the first region to a corresponding second channel in the second region. The showerhead apparatus has a vacuum seal interface for mounting the showerhead apparatus to a CVD reactor chamber such that the first side and supply ports face away from the reactor chamber and the second side and the patterns of diffusion passages from the second channels open into the reactor chamber.
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: March 27, 2001
    Assignee: Genus, Inc.
    Inventor: Scott William Dunham