Patents by Inventor Scott Zimmernan

Scott Zimmernan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electron beam method and apparatus for reducing or patterning the birefringence of halogenated optical materials
    Publication number: 20060071176
    Abstract: A controlled electron beam and heat will decrease the birefringence of a halogenated optical material under tensile stress. The electron beam and heat irradiation will occur in a chamber under near vacuum conditions. After electron beam irradiation and heating, the crystalline structure of the halogenated optical material layer has been randomized and made amorphous. The electron beam irradiation and heating will lower the high index of refraction of the halogenated optical material under stress and raise the low index of refraction of the halogenated optical material under stress. The differences in index of refraction between the high index of refraction area of and the low index of refraction area decrease which decreases the birefringence of the halogenated optical material under stress.
    Type: Application
    Filed: October 3, 2005
    Publication date: April 6, 2006
    Inventors: William Livesay, Scott Zimmernan