Patents by Inventor Se-Hwan Jung
Se-Hwan Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240158705Abstract: The present disclosure provides a method and device for refining waste plastic pyrolysis oil, the method including (S1) subjecting a waste plastic pyrolysis oil feedstock to a heat treatment by charging the waste plastic pyrolysis oil feedstock into a rotary kiln reactor and increasing a temperature of the rotary kiln reactor to form a product; (S2) recovering a gas component from the product of step (S1); (S3) separating a high boiling point wax component from the recovered gas component and re-supplying the separated high boiling point wax component to the rotary kiln reactor in step (S1); and (S4) recovering refined oil from the gas component from which the high boiling point wax component is removed.Type: ApplicationFiled: November 13, 2023Publication date: May 16, 2024Inventors: Sang Hwan Jo, Soo Kil Kang, Ik Hwan Na, Ho Won Lee, Jae Heum Jung, Se Rah Moon, Hee Young Jeon
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Patent number: 11973307Abstract: This surface-emitting laser device comprises: a first reflective layer; an active region disposed over the first reflective layer; an aperture region which is disposed over the active region and comprises an aperture and an insulating region; a second reflective layer disposed over the aperture region; and a second electrode electrically connected to the second reflective layer. The second electrode comprises first to sixth conductive layers. The first conductive layer may comprises Ti, and the sixth conductive layer may comprise Au.Type: GrantFiled: April 12, 2019Date of Patent: April 30, 2024Assignee: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.Inventors: Se Yeon Jung, Yong Gyeong Lee, Seung Hwan Kim
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Patent number: 11957495Abstract: An X-ray imaging apparatus includes an imaging device configured to capture a camera image of a target; a controller configured to stitch a plurality of X-ray images of respective divided regions of the target to generate one X-ray image of the target; and a display configured to display a settings window that provides a GUI for receiving a setting of an X-ray irradiation condition for the respective divided regions, and display the camera image in which positions of the respective divided regions are displayed.Type: GrantFiled: December 15, 2021Date of Patent: April 16, 2024Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Ho Jun Lee, Ju Hwan Kim, Se Hui Kim, Seung-Hoon Kim, Si Won Park, Phill Gu Jung, Duhgoon Lee, Myung Jin Chung, Do Hyeong Hwang, Sung Jin Park
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Patent number: 11174783Abstract: A high-efficiency power generation system includes: a combustor configured to generate a circulating fluid by burning a fuel; an expander configured to generate power by expanding the circulating fluid; a power generator configured to generate electricity using the power generated by the expander; a compressor configured to compress the expanded circulating fluid; a pump configured to circulate the compressed circulating fluid; a heat exchanger configured to allow the expanded circulating fluid passing through the expander and the compressed circulating fluid passing through the compressor to exchange heat with each other; and a power transmitter including a driving shaft, and configured to rotate a driven shaft, which includes shafts of the compressor and the pump, to transmit the power generated by the expander to the compressor and the pump.Type: GrantFiled: January 19, 2018Date of Patent: November 16, 2021Assignee: HANWHA POWER SYSTEMS CO., LTDInventors: Se Hwan Jung, Bong Gun Shin
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Publication number: 20190063315Abstract: A high-efficiency power generation system includes: a combustor configured to generate a circulating fluid by burning a fuel; an expander configured to generate power by expanding the circulating fluid; a power generator configured to generate electricity using the power generated by the expander; a compressor configured to compress the expanded circulating fluid; a pump configured to circulate the compressed circulating fluid; a heat exchanger configured to allow the expanded circulating fluid passing through the expander and the compressed circulating fluid passing through the compressor to exchange heat with each other; and a power transmitter including a driving shaft, and configured to rotate a driven shaft, which includes shafts of the compressor and the pump, to transmit the power generated by the expander to the compressor and the pump.Type: ApplicationFiled: January 19, 2018Publication date: February 28, 2019Applicant: HANWHA POWER SYSTEMS CO., LTDInventors: Se Hwan JUNG, Bong Gun SHIN
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Publication number: 20150140704Abstract: A cleaning solution and a method for manufacturing a display device, the cleaning solution including about 2 wt % to about 12 wt % of nitric acid; about 0.5 wt % to about 15 wt % of an organic acid; about 0.1 wt % to about 10 wt % of a salt compound; about 0.01 wt % to about 3 wt % of an inorganic salt that includes fluorine; and a balance of water, all amounts being based on a total weight of the cleaning solution.Type: ApplicationFiled: June 11, 2014Publication date: May 21, 2015Inventors: Jong-Hyun CHOUNG, In-Bae KIM, Hongsick PARK, Hyeonjeong SANG, Jaewoo JEONG, Byung uk KIM, Suk Il YOON, Se Hwan JUNG, Soon Beom HUH
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Patent number: 8163095Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.Type: GrantFiled: May 5, 2011Date of Patent: April 24, 2012Assignee: Samsung Electronics Co., Ltd.Inventors: Ji Sun Lee, Hong Sick Park, Jong Hyun Choung, Sun Young Hong, Bong Kyun Kim, Byeong Jin Lee, Byung Uk Kim, Jong Hyun Jeong, Suk II Yoon, Seong Bae Kim, Sung Gun Shin, Soon Beom Huh, Se Hwan Jung, Doo Young Jang
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Patent number: 8084184Abstract: A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.Type: GrantFiled: November 26, 2008Date of Patent: December 27, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Jong-Hyun Choung, Hong-Sick Park, Sun-Young Hong, Bong-Kyun Kim, Byeoung-Jin Lee, Byung-Uk Kim, Jong-Hyun Jeong, Suk-Il Yoon, Sung-Gun Shin, Soon-Beom Huh, Se-Hwan Jung, Doo-Young Jang
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Publication number: 20110206829Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.Type: ApplicationFiled: May 5, 2011Publication date: August 25, 2011Inventors: Ji Sun LEE, Hong Sick PARK, Jong Hyun CHOUNG, Sun Young HONG, Bong Kyun KIM, Byeong Jin LEE, Byung Uk KIM, Jong Hyun JEONG, Suk Il YOON, Seong Bae KIM, Sung Gun SHIN, Soon Beom HUH, Se Hwan JUNG, Doo Young JANG
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Patent number: 7968507Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.Type: GrantFiled: June 20, 2008Date of Patent: June 28, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Ji Sun Lee, Hong Sick Park, Jong Hyun Choung, Sun Young Hong, Bong Kyun Kim, Byeong Jin Lee, Byung Uk Kim, Jong Hyun Jeong, Suk Il Yoon, Seong Bae Kim, Sung Gun Shin, Soon Beom Huh, Se Hwan Jung, Doo Young Jang
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Patent number: 7956393Abstract: A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.Type: GrantFiled: September 21, 2009Date of Patent: June 7, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Jong-Hyun Choung, Bong-Kyun Kim, Hong-Sick Park, Sun-Young Hong, Young-Joo Choi, Byeong-Jin Lee, Nam-Seok Suh, Byung-Uk Kim, Suk-Il Yoon, Jong-Hyun Jeong, Sung-Gun Shin, Soon-Beom Huh, Se-Hwan Jung, Doo-Young Jang, Sun-Joo Park, Oh-Hwan Kweon
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Publication number: 20100151610Abstract: A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.Type: ApplicationFiled: September 21, 2009Publication date: June 17, 2010Inventors: Jong-Hyun CHOUNG, Bong-Kyun KIM, Hong-Sick PARK, Sun-Young HONG, Young-Joo CHOI, Byeong-Jin LEE, Nam-Seok SUH, Byung-Uk KIM, Suk-Il YOON, Jong-Hyun JEONG, Sung-Gun SHIN, Soon-Beom HUH, Se-Hwan JUNG, Doo-Young JANG, Sun-Joo PARK, Oh-Hwan KWEON
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Publication number: 20090170037Abstract: A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.Type: ApplicationFiled: November 26, 2008Publication date: July 2, 2009Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jong-Hyun CHOUNG, Hong-Sick Park, Sun-Young Hong, Bong-Kyun Kim, Byeoung-Jin Lee, Byung-Uk Kim, Jong-Hyun Jeong, Suk-Il Yoon, Sung-Gun Shin, Soon-Beom Huh, Se-Hwan Jung, Doo-Young Jang
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Publication number: 20090084406Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.Type: ApplicationFiled: June 20, 2008Publication date: April 2, 2009Inventors: Ji Sun Lee, Hong Sick Park, Jong Hyun Choung, Sun Young Hong, Bong Kyun Kim, Byeong Jin Lee, Byung Uk Kim, Jong Hyun Jeong, Suk Il Yoon, Seong Bae Kim, Sung Gun Shin, Soon Beom Huh, Se Hwan Jung, Doo Young Jang