Patents by Inventor Se-Hwan Jung

Se-Hwan Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240158705
    Abstract: The present disclosure provides a method and device for refining waste plastic pyrolysis oil, the method including (S1) subjecting a waste plastic pyrolysis oil feedstock to a heat treatment by charging the waste plastic pyrolysis oil feedstock into a rotary kiln reactor and increasing a temperature of the rotary kiln reactor to form a product; (S2) recovering a gas component from the product of step (S1); (S3) separating a high boiling point wax component from the recovered gas component and re-supplying the separated high boiling point wax component to the rotary kiln reactor in step (S1); and (S4) recovering refined oil from the gas component from which the high boiling point wax component is removed.
    Type: Application
    Filed: November 13, 2023
    Publication date: May 16, 2024
    Inventors: Sang Hwan Jo, Soo Kil Kang, Ik Hwan Na, Ho Won Lee, Jae Heum Jung, Se Rah Moon, Hee Young Jeon
  • Patent number: 11973307
    Abstract: This surface-emitting laser device comprises: a first reflective layer; an active region disposed over the first reflective layer; an aperture region which is disposed over the active region and comprises an aperture and an insulating region; a second reflective layer disposed over the aperture region; and a second electrode electrically connected to the second reflective layer. The second electrode comprises first to sixth conductive layers. The first conductive layer may comprises Ti, and the sixth conductive layer may comprise Au.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: April 30, 2024
    Assignee: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.
    Inventors: Se Yeon Jung, Yong Gyeong Lee, Seung Hwan Kim
  • Patent number: 11957495
    Abstract: An X-ray imaging apparatus includes an imaging device configured to capture a camera image of a target; a controller configured to stitch a plurality of X-ray images of respective divided regions of the target to generate one X-ray image of the target; and a display configured to display a settings window that provides a GUI for receiving a setting of an X-ray irradiation condition for the respective divided regions, and display the camera image in which positions of the respective divided regions are displayed.
    Type: Grant
    Filed: December 15, 2021
    Date of Patent: April 16, 2024
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ho Jun Lee, Ju Hwan Kim, Se Hui Kim, Seung-Hoon Kim, Si Won Park, Phill Gu Jung, Duhgoon Lee, Myung Jin Chung, Do Hyeong Hwang, Sung Jin Park
  • Patent number: 11174783
    Abstract: A high-efficiency power generation system includes: a combustor configured to generate a circulating fluid by burning a fuel; an expander configured to generate power by expanding the circulating fluid; a power generator configured to generate electricity using the power generated by the expander; a compressor configured to compress the expanded circulating fluid; a pump configured to circulate the compressed circulating fluid; a heat exchanger configured to allow the expanded circulating fluid passing through the expander and the compressed circulating fluid passing through the compressor to exchange heat with each other; and a power transmitter including a driving shaft, and configured to rotate a driven shaft, which includes shafts of the compressor and the pump, to transmit the power generated by the expander to the compressor and the pump.
    Type: Grant
    Filed: January 19, 2018
    Date of Patent: November 16, 2021
    Assignee: HANWHA POWER SYSTEMS CO., LTD
    Inventors: Se Hwan Jung, Bong Gun Shin
  • Publication number: 20190063315
    Abstract: A high-efficiency power generation system includes: a combustor configured to generate a circulating fluid by burning a fuel; an expander configured to generate power by expanding the circulating fluid; a power generator configured to generate electricity using the power generated by the expander; a compressor configured to compress the expanded circulating fluid; a pump configured to circulate the compressed circulating fluid; a heat exchanger configured to allow the expanded circulating fluid passing through the expander and the compressed circulating fluid passing through the compressor to exchange heat with each other; and a power transmitter including a driving shaft, and configured to rotate a driven shaft, which includes shafts of the compressor and the pump, to transmit the power generated by the expander to the compressor and the pump.
    Type: Application
    Filed: January 19, 2018
    Publication date: February 28, 2019
    Applicant: HANWHA POWER SYSTEMS CO., LTD
    Inventors: Se Hwan JUNG, Bong Gun SHIN
  • Publication number: 20150140704
    Abstract: A cleaning solution and a method for manufacturing a display device, the cleaning solution including about 2 wt % to about 12 wt % of nitric acid; about 0.5 wt % to about 15 wt % of an organic acid; about 0.1 wt % to about 10 wt % of a salt compound; about 0.01 wt % to about 3 wt % of an inorganic salt that includes fluorine; and a balance of water, all amounts being based on a total weight of the cleaning solution.
    Type: Application
    Filed: June 11, 2014
    Publication date: May 21, 2015
    Inventors: Jong-Hyun CHOUNG, In-Bae KIM, Hongsick PARK, Hyeonjeong SANG, Jaewoo JEONG, Byung uk KIM, Suk Il YOON, Se Hwan JUNG, Soon Beom HUH
  • Patent number: 8163095
    Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.
    Type: Grant
    Filed: May 5, 2011
    Date of Patent: April 24, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ji Sun Lee, Hong Sick Park, Jong Hyun Choung, Sun Young Hong, Bong Kyun Kim, Byeong Jin Lee, Byung Uk Kim, Jong Hyun Jeong, Suk II Yoon, Seong Bae Kim, Sung Gun Shin, Soon Beom Huh, Se Hwan Jung, Doo Young Jang
  • Patent number: 8084184
    Abstract: A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: December 27, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-Hyun Choung, Hong-Sick Park, Sun-Young Hong, Bong-Kyun Kim, Byeoung-Jin Lee, Byung-Uk Kim, Jong-Hyun Jeong, Suk-Il Yoon, Sung-Gun Shin, Soon-Beom Huh, Se-Hwan Jung, Doo-Young Jang
  • Publication number: 20110206829
    Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.
    Type: Application
    Filed: May 5, 2011
    Publication date: August 25, 2011
    Inventors: Ji Sun LEE, Hong Sick PARK, Jong Hyun CHOUNG, Sun Young HONG, Bong Kyun KIM, Byeong Jin LEE, Byung Uk KIM, Jong Hyun JEONG, Suk Il YOON, Seong Bae KIM, Sung Gun SHIN, Soon Beom HUH, Se Hwan JUNG, Doo Young JANG
  • Patent number: 7968507
    Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: June 28, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ji Sun Lee, Hong Sick Park, Jong Hyun Choung, Sun Young Hong, Bong Kyun Kim, Byeong Jin Lee, Byung Uk Kim, Jong Hyun Jeong, Suk Il Yoon, Seong Bae Kim, Sung Gun Shin, Soon Beom Huh, Se Hwan Jung, Doo Young Jang
  • Patent number: 7956393
    Abstract: A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: June 7, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-Hyun Choung, Bong-Kyun Kim, Hong-Sick Park, Sun-Young Hong, Young-Joo Choi, Byeong-Jin Lee, Nam-Seok Suh, Byung-Uk Kim, Suk-Il Yoon, Jong-Hyun Jeong, Sung-Gun Shin, Soon-Beom Huh, Se-Hwan Jung, Doo-Young Jang, Sun-Joo Park, Oh-Hwan Kweon
  • Publication number: 20100151610
    Abstract: A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.
    Type: Application
    Filed: September 21, 2009
    Publication date: June 17, 2010
    Inventors: Jong-Hyun CHOUNG, Bong-Kyun KIM, Hong-Sick PARK, Sun-Young HONG, Young-Joo CHOI, Byeong-Jin LEE, Nam-Seok SUH, Byung-Uk KIM, Suk-Il YOON, Jong-Hyun JEONG, Sung-Gun SHIN, Soon-Beom HUH, Se-Hwan JUNG, Doo-Young JANG, Sun-Joo PARK, Oh-Hwan KWEON
  • Publication number: 20090170037
    Abstract: A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.
    Type: Application
    Filed: November 26, 2008
    Publication date: July 2, 2009
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jong-Hyun CHOUNG, Hong-Sick Park, Sun-Young Hong, Bong-Kyun Kim, Byeoung-Jin Lee, Byung-Uk Kim, Jong-Hyun Jeong, Suk-Il Yoon, Sung-Gun Shin, Soon-Beom Huh, Se-Hwan Jung, Doo-Young Jang
  • Publication number: 20090084406
    Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.
    Type: Application
    Filed: June 20, 2008
    Publication date: April 2, 2009
    Inventors: Ji Sun Lee, Hong Sick Park, Jong Hyun Choung, Sun Young Hong, Bong Kyun Kim, Byeong Jin Lee, Byung Uk Kim, Jong Hyun Jeong, Suk Il Yoon, Seong Bae Kim, Sung Gun Shin, Soon Beom Huh, Se Hwan Jung, Doo Young Jang