Patents by Inventor Se Hyun KWON

Se Hyun KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240079248
    Abstract: A substrate processing method, involving etching a silicon nitride layer selectively in a substrate where a silicon oxide layer and the silicon nitride layer are stacked, includes: wet-etching the silicon nitride layer with a phosphoric acid-based etching solution; and dry-etching a regrowth oxide, which is formed on a surface of the silicon oxide layer in the wet etching step, with an etching gas.
    Type: Application
    Filed: September 1, 2023
    Publication date: March 7, 2024
    Applicant: TES Co., Ltd
    Inventors: Bong-Soo KWON, Do-Hyun KIM, Yu-Ri PARK, Se-Chan KIM
  • Publication number: 20240072712
    Abstract: Provided an electronic device including a main body and a kit connected to the main body, and the main body includes a battery, a first motor, an electric wire connected to the battery, and a first controller connected to the electric wire, the kit includes a second motor supplied with power through the electric wire, an inverter connected to the second motor, and a second controller connected to the electric wire and configured to control driving of the inverter, and the second controller is configured to transmit information to the first controller through switching frequency control of the inverter and control a switching frequency of the inverter so that a current associated with the second motor is greater than zero in a section in which transmission of the information is performed.
    Type: Application
    Filed: March 9, 2021
    Publication date: February 29, 2024
    Inventors: Se Hwa CHOE, Cha Seung JUN, Sung Yong SHIN, Sun Ku KWON, Dong Hyun LIM
  • Patent number: 11851515
    Abstract: The present disclosure relates to a photopolymer composition including a polymer matrix or a precursor thereof having a predetermined chemical structure; a photoreactive monomer; and a photoinitiator, a hologram recording medium, an optical element and a holographic recording method using the same.
    Type: Grant
    Filed: June 29, 2020
    Date of Patent: December 26, 2023
    Assignee: LG Chem, Ltd.
    Inventors: Seokhoon Jang, Heon Kim, Se Hyun Kwon, Yeongrae Chang
  • Patent number: 11827731
    Abstract: The present disclosure relates to a photopolymer composition for hologram production comprising a polymer matrix or a precursor thereof having a glass transition temperature of 80° C. or less; a photoreactive monomer; a low refractive index fluorine-based compound; and a photoinitiator, a hologram recording medium produced from the photopolymer composition, an optical element comprising the hologram recording medium, and a holographic recording method using the hologram recording medium.
    Type: Grant
    Filed: January 10, 2020
    Date of Patent: November 28, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Seokhoon Jang, Heon Kim, Se Hyun Kwon, Yeongrae Chang
  • Patent number: 11760647
    Abstract: Provided is a hydrophobic silica aerogel precursor, and a hydrophobic silica aerogel produced using the same. In the methods, a linear silane crosslinking agent containing a PEG-derived unit is introduced when preparing a hydrophobic aerogel precursor, resulting in the production of a hydrophobic silica aerogel having improved high-temperature thermal stability and improved physical properties.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: September 19, 2023
    Assignee: LG Chem, Ltd.
    Inventors: Hee Jung Choi, Se Hyun Kwon, Yeong Rae Chang, Seok Hoon Jang
  • Patent number: 11591433
    Abstract: The present disclosure is to provide a photopolymer composition including a polymer matrix or a precursor thereof including a reaction product of a reactive isocyanate compound having a hydrogen bonding functional group capable of forming multiple hydrogen bonds and at least one isocyanate group, and a polyol having at least two hydroxyl groups; a photoreactive monomer; and a photoinitiator, a hologram recording medium produced from the photopolymer composition, an optical element including the photopolymer composition and a holographic recording method using the photopolymer composition.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: February 28, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Heon Kim, Yeongrae Chang, Seokhoon Jang, Se Hyun Kwon
  • Patent number: 11435664
    Abstract: Provided is a photopolymer composition for hologram recording comprising: a polymer matrix or a precursor thereof; a dye including a compound of the following Chemical Formula 1; a photoreactive monomer; and a photoinitiator,
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: September 6, 2022
    Assignees: LG Chem, Ltd., Korea Advanced Institute of Science and Technology
    Inventors: Heon Kim, Yoosik Kim, Raisa Kharbash, Se Hyun Kwon, Yeongrae Chang, Seokhoon Jang
  • Patent number: 11307494
    Abstract: The present disclosure relates to a hologram medium comprising: a polymer substrate including a polymer resin in which a silane-based functional group is located in a main chain or a branched chain, wherein a fine pattern is formed on at least one surface of the polymer substrate, and an optical element.
    Type: Grant
    Filed: September 10, 2019
    Date of Patent: April 19, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Heon Kim, Seokhoon Jang, Se Hyun Kwon, Yeongrae Chang, Jinseok Byun
  • Patent number: 11292888
    Abstract: A photopolymerizable composition including: a polymer matrix or a precursor thereof containing a reaction product of an acrylate-based polyol and a compound containing at least one isocyanate group; a photoreactive monomer; and a non-reactive fluoro compound and a photoinitiator; a hologram recording medium produced from the composition; an optical element including the hologram recording medium; and a method of recording a hologram using the photopolymerizable composition.
    Type: Grant
    Filed: October 16, 2018
    Date of Patent: April 5, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Seok Hoon Jang, Heon Kim, Boo Kyung Kim, Yeong Rae Chang, Yongjoon Heo, Se Hyun Kwon
  • Patent number: 11226557
    Abstract: The present disclosure relates to a hologram recording medium having a main relaxation temperature (Tr) of 0° C. or less, wherein the Tr is a point where a rate of change of phase angle with respect to temperature is the largest in a range of ?80° C. to 30° C. in dynamic mechanical analysis. The present disclosure also relates to an optical element including the same and a holographic recording method using the hologram recording medium.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: January 18, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Seokhoon Jang, Hyunsup Lee, Heon Kim, Se Hyun Kwon, Yeongrae Chang
  • Publication number: 20210340302
    Abstract: The present disclosure relates to a photopolymer composition including a polymer matrix or a precursor thereof having a predetermined chemical structure; a photoreactive monomer; and a photoinitiator, a hologram recording medium, an optical element and a holographic recording method using the same.
    Type: Application
    Filed: June 29, 2020
    Publication date: November 4, 2021
    Inventors: Seokhoon JANG, Heon KIM, Se Hyun KWON, Yeongrae CHANG
  • Publication number: 20210301055
    Abstract: The present disclosure relates to a photopolymer composition for hologram production comprising a polymer matrix or a precursor thereof having a glass transition temperature of 80° C. or less; a photoreactive monomer; a low refractive index fluorine-based compound; and a photoinitiator, a hologram recording medium produced from the photopolymer composition, an optical element comprising the hologram recording medium, and a holographic recording method using the hologram recording medium.
    Type: Application
    Filed: January 10, 2020
    Publication date: September 30, 2021
    Inventors: Seokhoon Jang, Heon Kim, Se Hyun Kwon, Yeongrae Chang
  • Patent number: 11126082
    Abstract: The present disclosure is to provide a photopolymer composition including a polymer matrix or a precursor thereof having a specific chemical structure; a photoreactive monomer; and a photoinitiator. The present disclosure is also to provide a hologram recording medium, an optical element, and a holographic recording method using the photopolymer composition.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: September 21, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Seokhoon Jang, Sooyoung Kwak, Heon Kim, Se Hyun Kwon, Yeongrae Chang
  • Patent number: 11084933
    Abstract: The present invention relates to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the hologram recording medium.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: August 10, 2021
    Assignees: LG CHEM, LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Heon Kim, Yoosik Kim, Raisa Kharbash, Se Hyun Kwon, Yeongrae Chang, Seokhoon Jang
  • Publication number: 20210239894
    Abstract: The present disclosure relates to a hologram recording medium having one surface with a higher surface energy than a polymer resin layer containing at least one polymer selected from the group consisting of triacetyl cellulose, alicyclic olefin polymer and polyethylene terephthalate, a hologram recording medium wherein the surface energy of any one surface is 50 mN/m or more, and an optical element comprising the hologram medium.
    Type: Application
    Filed: September 11, 2019
    Publication date: August 5, 2021
    Applicant: LG CHEM, LTD.
    Inventors: Seokhoon JANG, Jinseok BYUN, Heon KIM, Se Hyun KWON, Yeongrae CHANG
  • Patent number: 11079678
    Abstract: A photopolymer composition comprising a polymer matrix or a precursor thereof including a reaction product between (i) a (meth)acrylate-based (co)polymer in which a silane-based functional group is located in a branched chain and an equivalent weight of the silane-based functional group is 300 g/eq to 2000 g/eq, and (ii) a linear silane crosslinking agent; a photoreactive monomer; and a photoinitiator, a hologram recording medium using the same, an optical element using the hologram recording medium, and a holographic recording method. The photopolymer composition can more easily provide a photopolymer layer having improved durability against temperature and humidity while having a large refractive index modulation value.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: August 3, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Seok Hoon Jang, Heon Kim, Yongjoon Heo, Se Hyun Kwon, Yeong Rae Chang
  • Publication number: 20210026239
    Abstract: Provided is a photopolymer composition for hologram recording comprising: a polymer matrix or a precursor thereof; a dye including a compound of the following Chemical Formula 1; a photoreactive monomer; and a photoinitiator,
    Type: Application
    Filed: December 13, 2019
    Publication date: January 28, 2021
    Inventors: Heon KIM, Yoosik KIM, Raisa KHARBASH, Se Hyun KWON, Yeongrae CHANG, Seokhoon JANG
  • Publication number: 20210003919
    Abstract: The present disclosure relates to a photopolymer composition, and more particularly, to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the photopolymer composition.
    Type: Application
    Filed: April 29, 2019
    Publication date: January 7, 2021
    Applicants: LG CHEM, LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Heon KIM, Yoosik KIM, Raisa KHARBASH, Se Hyun KWON, Yeongrae CHANG, Seokhoon JANG
  • Publication number: 20200407231
    Abstract: Provided is a hydrophobic silica aerogel precursor, and a hydrophobic silica aerogel produced using the same. In the methods, a linear silane crosslinking agent containing a PEG-derived unit is introduced when preparing a hydrophobic aerogel precursor, resulting in the production of a hydrophobic silica aerogel having improved high-temperature thermal stability and improved physical properties.
    Type: Application
    Filed: December 7, 2018
    Publication date: December 31, 2020
    Inventors: Hee Jung CHOI, Se Hyun KWON, Yeong Rae CHANG, Seok Hoon JANG
  • Publication number: 20200355996
    Abstract: The present disclosure relates to a hologram medium comprising: a polymer substrate including a polymer resin in which a silane-based functional group is located in a main chain or a branched chain, wherein a fine pattern is formed on at least one surface of the polymer substrate, and an optical element.
    Type: Application
    Filed: September 10, 2019
    Publication date: November 12, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Heon KIM, Seokhoon JANG, Se Hyun KWON, Yeongrae CHANG, Jinseok BYUN