Patents by Inventor Se Jin Choi

Se Jin Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240099071
    Abstract: A display device includes a first substrate, a first electrode above the first substrate, a pixel-defining film above the first electrode, and defining an emission area, a light-emitting layer above the first electrode and the pixel-defining film, a second electrode above the light-emitting layer, a thin-film encapsulation structure above the second electrode, and including an organic film defining an opening, and a color control layer above the thin-film encapsulation structure in the opening.
    Type: Application
    Filed: June 23, 2023
    Publication date: March 21, 2024
    Inventors: Sang Hyung LIM, Se Jin PARK, Jae Ho EO, Soon Mi CHOI
  • Publication number: 20240090318
    Abstract: The present invention relates to a novel heterocyclic compound usable in an organic light-emitting device and to an organic light-emitting device comprising same, wherein [chemical formula A] is as described in the detailed description of the invention.
    Type: Application
    Filed: December 28, 2021
    Publication date: March 14, 2024
    Inventors: Se-Jin LEE, Seok-Bae PARK, Si-In KIM, Hee-Dae KIM, Yeong-Tae CHOI, Ji-Yung KIM, Kyung-Tae KIM, Myeong-Jun KIM, Kyeong-hyeon KIM, Seung-soo LEE, Tae Gyun LEE, Joon-Ho KIM
  • Patent number: 11925110
    Abstract: Disclosed is a polycyclic aromatic compound that can be employed in an organic layer of an organic electroluminescent device. Also disclosed is a highly efficient organic electroluminescent device including the polycyclic aromatic compound. The use of the polycyclic aromatic compound significantly improves the luminous efficiency of the device.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: March 5, 2024
    Assignee: SFC CO., LTD.
    Inventors: Kyeong-hyeon Kim, Se-jin Lee, Yeong-tae Choi, Ji-yung Kim, Kyung-tae Kim, Myeong-jun Kim
  • Patent number: 11482150
    Abstract: A display driving device supporting a low power mode according to an aspect of the present disclosure that is capable of minimizing power consumption when driving in the low power mode includes a plurality of output buffers connected to data lines to precharge the data lines with a first data signal corresponding to a black image when a precharge horizontal line is driven in a display panel including a first region where a standby image is displayed and the second region where the black image is displayed, the precharge horizontal line being included in the second region, and a gamma voltage generator connected to the data lines to output the first data signal to the data lines when other horizontal lines other than the precharge horizontal line in the second region are driven.
    Type: Grant
    Filed: April 28, 2021
    Date of Patent: October 25, 2022
    Assignee: SILICON WORKS CO., LTD.
    Inventors: Byeong Yong Kim, Chang Bae Lee, Se Jin Choi
  • Publication number: 20210350735
    Abstract: A display driving device supporting a low power mode according to an aspect of the present disclosure that is capable of minimizing power consumption when driving in the low power mode includes a plurality of output buffers connected to data lines to precharge the data lines with a first data signal corresponding to a black image when a precharge horizontal line is driven in a display panel including a first region where a standby image is displayed and the second region where the black image is displayed, the precharge horizontal line being included in the second region, and a gamma voltage generator connected to the data lines to output the first data signal to the data lines when other horizontal lines other than the precharge horizontal line in the second region are driven.
    Type: Application
    Filed: April 28, 2021
    Publication date: November 11, 2021
    Inventors: Byeong Yong KIM, Chang Bae LEE, Se Jin CHOI
  • Patent number: 10962692
    Abstract: The present invention relates to a 3-dimensional complex multilayer structure. The 3-dimensional complex multilayer structure includes a first pattern and a second pattern having different thicknesses formed on one or both surfaces of a plate. The first pattern is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The second pattern is not parallel to the first pattern and is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The interfaces between the first pattern and the second pattern form figures selected from the group consisting of polygons, circles, ellipses, and combinations thereof. The figures are repetitively formed on one or both surfaces of the plate. The 3-dimensional complex multilayer structure includes different complex patterns, whereas a conventional device has a kind of simple pattern.
    Type: Grant
    Filed: January 26, 2018
    Date of Patent: March 30, 2021
    Assignee: Minuta Technology Co., Ltd.
    Inventors: Han Eol Lim, Se Jin Choi, Tae Wan Kim, Seung Joon Baek
  • Publication number: 20180156950
    Abstract: The present invention relates to a 3-dimensional complex multilayer structure. The 3-dimensional complex multilayer structure includes a first pattern and a second pattern having different thicknesses formed on one or both surfaces of a plate. The first pattern is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The second pattern is not parallel to the first pattern and is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The interfaces between the first pattern and the second pattern form figures selected from the group consisting of polygons, circles, ellipses, and combinations thereof. The figures are repetitively formed on one or both surfaces of the plate. The 3-dimensional complex multilayer structure includes different complex patterns, whereas a conventional device has a kind of simple pattern.
    Type: Application
    Filed: January 26, 2018
    Publication date: June 7, 2018
    Inventors: Han Eol LIM, Se Jin CHOI, Tae Wan KIM, Seung Joon BAEK
  • Patent number: 9958581
    Abstract: The present invention relates to a 3-dimensional complex multilayer structure. The 3-dimensional complex multilayer structure includes a first pattern and a second pattern having different thicknesses formed on one or both surfaces of a plate. The first pattern is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The second pattern is not parallel to the first pattern and is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The interfaces between the first pattern and the second pattern form figures selected from the group consisting of polygons, circles, ellipses, and combinations thereof. The figures are repetitively formed on one or both surfaces of the plate. The 3-dimensional complex multilayer structure includes different complex patterns, whereas a conventional device has a kind of simple pattern.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: May 1, 2018
    Assignee: Minuta Technology Co., LTD
    Inventors: Han Eol Lim, Se Jin Choi, Tae Wan Kim, Seung Joon Baek
  • Publication number: 20150323712
    Abstract: The present invention relates to a 3-dimensional complex multilayer structure. The 3-dimensional complex multilayer structure includes a first pattern and a second pattern having different thicknesses formed on one or both surfaces of a plate. The first pattern is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The second pattern is not parallel to the first pattern and is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The interfaces between the first pattern and the second pattern form figures selected from the group consisting of polygons, circles, ellipses, and combinations thereof. The figures are repetitively formed on one or both surfaces of the plate. The 3-dimensional complex multilayer structure includes different complex patterns, whereas a conventional device has a kind of simple pattern.
    Type: Application
    Filed: June 13, 2013
    Publication date: November 12, 2015
    Inventors: Han Eol LIM, Se Jin CHOI, Tae Wan KIM, Seung Joon BAEK
  • Patent number: 8092981
    Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.
    Type: Grant
    Filed: December 29, 2008
    Date of Patent: January 10, 2012
    Assignees: Samsung Electronics Co., Ltd., Techno Semichem Co., Ltd.
    Inventors: Hoon Kang, Jae-Sung Kim, Yang-Ho Jung, Hi-Kuk Lee, Yasuhiro Kameyama, Yuuji Mizuho, Jong-Cheol Kim, Se-Jin Choi
  • Publication number: 20100255268
    Abstract: The present invention relates to a mold sheet composition for forming patterns, which comprises (A) an active energy ray-curable compound having one or more unsaturated double bond, and (B) 0.1 to 20 parts by weight of a photo-initiator based on 100 parts by weight of the component (A); and a mold sheet for forming patterns, which comprises the active energy curable compound of the composition, and has an intaglio of the desired pattern thereon.
    Type: Application
    Filed: November 10, 2008
    Publication date: October 7, 2010
    Applicant: MINUTA TECHNOLOGY
    Inventors: Se Jin Choi, Tae Wan Kim, Seung Joon Baek
  • Publication number: 20090176337
    Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.
    Type: Application
    Filed: December 29, 2008
    Publication date: July 9, 2009
    Applicants: SAMSUNG ELECTRONICS CO., LTD., TECHNO SEMICHEM CO., LTD.
    Inventors: Hoon KANG, Jae-Sung KIM, Yang-Ho JUNG, Hi-Kuk LEE, Yasuhiro KAMEYAMA, Yuuji MIZUHO, Jong-Cheol KIM, Se-Jin CHOI
  • Patent number: 6924078
    Abstract: Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line edge roughness and slope pattern are improved when an ultrafine photoresist pattern is formed using photoresist copolymer having a multi-oxygen-containing compound as a repeating unit such as an ethyleneoxy moiety represented by Formula 1 with at least one polymerizable carbon-carbon double bond. In addition, the shape of pattern is improved by eliminating top loss and the adhesion of pattern to the substrate is improved. wherein n is an integer ranging from 1 to 5.
    Type: Grant
    Filed: August 22, 2002
    Date of Patent: August 2, 2005
    Assignees: Hynix Semiconductor Inc., Dongjin Semichem Co., Ltd.
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin, Se Jin Choi, Deog Bae Kim, Jae Hyun Kim
  • Publication number: 20030091927
    Abstract: Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line edge roughness and slope pattern are improved when an ultrafine photoresist pattern is formed using photoresist copolymer having a multi-oxygen-containing compound as a repeating unit such as an ethyleneoxy moiety represented by Formula 1 with at least one polymerizable carbon-carbon double bond. In addition, the shape of pattern is improved by eliminating top loss and the adhesion of pattern to the substrate is improved.
    Type: Application
    Filed: August 22, 2002
    Publication date: May 15, 2003
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin, Se Jin Choi, Deog Bae Kim, Jae Hyun Kim