Patents by Inventor Se Jin Choi
Se Jin Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240099071Abstract: A display device includes a first substrate, a first electrode above the first substrate, a pixel-defining film above the first electrode, and defining an emission area, a light-emitting layer above the first electrode and the pixel-defining film, a second electrode above the light-emitting layer, a thin-film encapsulation structure above the second electrode, and including an organic film defining an opening, and a color control layer above the thin-film encapsulation structure in the opening.Type: ApplicationFiled: June 23, 2023Publication date: March 21, 2024Inventors: Sang Hyung LIM, Se Jin PARK, Jae Ho EO, Soon Mi CHOI
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Publication number: 20240090318Abstract: The present invention relates to a novel heterocyclic compound usable in an organic light-emitting device and to an organic light-emitting device comprising same, wherein [chemical formula A] is as described in the detailed description of the invention.Type: ApplicationFiled: December 28, 2021Publication date: March 14, 2024Inventors: Se-Jin LEE, Seok-Bae PARK, Si-In KIM, Hee-Dae KIM, Yeong-Tae CHOI, Ji-Yung KIM, Kyung-Tae KIM, Myeong-Jun KIM, Kyeong-hyeon KIM, Seung-soo LEE, Tae Gyun LEE, Joon-Ho KIM
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Patent number: 11925110Abstract: Disclosed is a polycyclic aromatic compound that can be employed in an organic layer of an organic electroluminescent device. Also disclosed is a highly efficient organic electroluminescent device including the polycyclic aromatic compound. The use of the polycyclic aromatic compound significantly improves the luminous efficiency of the device.Type: GrantFiled: March 19, 2021Date of Patent: March 5, 2024Assignee: SFC CO., LTD.Inventors: Kyeong-hyeon Kim, Se-jin Lee, Yeong-tae Choi, Ji-yung Kim, Kyung-tae Kim, Myeong-jun Kim
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Patent number: 11482150Abstract: A display driving device supporting a low power mode according to an aspect of the present disclosure that is capable of minimizing power consumption when driving in the low power mode includes a plurality of output buffers connected to data lines to precharge the data lines with a first data signal corresponding to a black image when a precharge horizontal line is driven in a display panel including a first region where a standby image is displayed and the second region where the black image is displayed, the precharge horizontal line being included in the second region, and a gamma voltage generator connected to the data lines to output the first data signal to the data lines when other horizontal lines other than the precharge horizontal line in the second region are driven.Type: GrantFiled: April 28, 2021Date of Patent: October 25, 2022Assignee: SILICON WORKS CO., LTD.Inventors: Byeong Yong Kim, Chang Bae Lee, Se Jin Choi
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Publication number: 20210350735Abstract: A display driving device supporting a low power mode according to an aspect of the present disclosure that is capable of minimizing power consumption when driving in the low power mode includes a plurality of output buffers connected to data lines to precharge the data lines with a first data signal corresponding to a black image when a precharge horizontal line is driven in a display panel including a first region where a standby image is displayed and the second region where the black image is displayed, the precharge horizontal line being included in the second region, and a gamma voltage generator connected to the data lines to output the first data signal to the data lines when other horizontal lines other than the precharge horizontal line in the second region are driven.Type: ApplicationFiled: April 28, 2021Publication date: November 11, 2021Inventors: Byeong Yong KIM, Chang Bae LEE, Se Jin CHOI
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Patent number: 10962692Abstract: The present invention relates to a 3-dimensional complex multilayer structure. The 3-dimensional complex multilayer structure includes a first pattern and a second pattern having different thicknesses formed on one or both surfaces of a plate. The first pattern is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The second pattern is not parallel to the first pattern and is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The interfaces between the first pattern and the second pattern form figures selected from the group consisting of polygons, circles, ellipses, and combinations thereof. The figures are repetitively formed on one or both surfaces of the plate. The 3-dimensional complex multilayer structure includes different complex patterns, whereas a conventional device has a kind of simple pattern.Type: GrantFiled: January 26, 2018Date of Patent: March 30, 2021Assignee: Minuta Technology Co., Ltd.Inventors: Han Eol Lim, Se Jin Choi, Tae Wan Kim, Seung Joon Baek
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Publication number: 20180156950Abstract: The present invention relates to a 3-dimensional complex multilayer structure. The 3-dimensional complex multilayer structure includes a first pattern and a second pattern having different thicknesses formed on one or both surfaces of a plate. The first pattern is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The second pattern is not parallel to the first pattern and is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The interfaces between the first pattern and the second pattern form figures selected from the group consisting of polygons, circles, ellipses, and combinations thereof. The figures are repetitively formed on one or both surfaces of the plate. The 3-dimensional complex multilayer structure includes different complex patterns, whereas a conventional device has a kind of simple pattern.Type: ApplicationFiled: January 26, 2018Publication date: June 7, 2018Inventors: Han Eol LIM, Se Jin CHOI, Tae Wan KIM, Seung Joon BAEK
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Patent number: 9958581Abstract: The present invention relates to a 3-dimensional complex multilayer structure. The 3-dimensional complex multilayer structure includes a first pattern and a second pattern having different thicknesses formed on one or both surfaces of a plate. The first pattern is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The second pattern is not parallel to the first pattern and is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The interfaces between the first pattern and the second pattern form figures selected from the group consisting of polygons, circles, ellipses, and combinations thereof. The figures are repetitively formed on one or both surfaces of the plate. The 3-dimensional complex multilayer structure includes different complex patterns, whereas a conventional device has a kind of simple pattern.Type: GrantFiled: June 13, 2013Date of Patent: May 1, 2018Assignee: Minuta Technology Co., LTDInventors: Han Eol Lim, Se Jin Choi, Tae Wan Kim, Seung Joon Baek
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Publication number: 20150323712Abstract: The present invention relates to a 3-dimensional complex multilayer structure. The 3-dimensional complex multilayer structure includes a first pattern and a second pattern having different thicknesses formed on one or both surfaces of a plate. The first pattern is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The second pattern is not parallel to the first pattern and is selected from the group consisting of parallel lines, parallel curves, parallel zigzag lines, and combinations thereof which do not meet each other. The interfaces between the first pattern and the second pattern form figures selected from the group consisting of polygons, circles, ellipses, and combinations thereof. The figures are repetitively formed on one or both surfaces of the plate. The 3-dimensional complex multilayer structure includes different complex patterns, whereas a conventional device has a kind of simple pattern.Type: ApplicationFiled: June 13, 2013Publication date: November 12, 2015Inventors: Han Eol LIM, Se Jin CHOI, Tae Wan KIM, Seung Joon BAEK
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Patent number: 8092981Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.Type: GrantFiled: December 29, 2008Date of Patent: January 10, 2012Assignees: Samsung Electronics Co., Ltd., Techno Semichem Co., Ltd.Inventors: Hoon Kang, Jae-Sung Kim, Yang-Ho Jung, Hi-Kuk Lee, Yasuhiro Kameyama, Yuuji Mizuho, Jong-Cheol Kim, Se-Jin Choi
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Publication number: 20100255268Abstract: The present invention relates to a mold sheet composition for forming patterns, which comprises (A) an active energy ray-curable compound having one or more unsaturated double bond, and (B) 0.1 to 20 parts by weight of a photo-initiator based on 100 parts by weight of the component (A); and a mold sheet for forming patterns, which comprises the active energy curable compound of the composition, and has an intaglio of the desired pattern thereon.Type: ApplicationFiled: November 10, 2008Publication date: October 7, 2010Applicant: MINUTA TECHNOLOGYInventors: Se Jin Choi, Tae Wan Kim, Seung Joon Baek
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Publication number: 20090176337Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.Type: ApplicationFiled: December 29, 2008Publication date: July 9, 2009Applicants: SAMSUNG ELECTRONICS CO., LTD., TECHNO SEMICHEM CO., LTD.Inventors: Hoon KANG, Jae-Sung KIM, Yang-Ho JUNG, Hi-Kuk LEE, Yasuhiro KAMEYAMA, Yuuji MIZUHO, Jong-Cheol KIM, Se-Jin CHOI
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Patent number: 6924078Abstract: Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line edge roughness and slope pattern are improved when an ultrafine photoresist pattern is formed using photoresist copolymer having a multi-oxygen-containing compound as a repeating unit such as an ethyleneoxy moiety represented by Formula 1 with at least one polymerizable carbon-carbon double bond. In addition, the shape of pattern is improved by eliminating top loss and the adhesion of pattern to the substrate is improved. wherein n is an integer ranging from 1 to 5.Type: GrantFiled: August 22, 2002Date of Patent: August 2, 2005Assignees: Hynix Semiconductor Inc., Dongjin Semichem Co., Ltd.Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin, Se Jin Choi, Deog Bae Kim, Jae Hyun Kim
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Publication number: 20030091927Abstract: Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line edge roughness and slope pattern are improved when an ultrafine photoresist pattern is formed using photoresist copolymer having a multi-oxygen-containing compound as a repeating unit such as an ethyleneoxy moiety represented by Formula 1 with at least one polymerizable carbon-carbon double bond. In addition, the shape of pattern is improved by eliminating top loss and the adhesion of pattern to the substrate is improved.Type: ApplicationFiled: August 22, 2002Publication date: May 15, 2003Applicant: HYNIX SEMICONDUCTOR INC.Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin, Se Jin Choi, Deog Bae Kim, Jae Hyun Kim