Patents by Inventor Se Jin Ku
Se Jin Ku has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10240035Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.Type: GrantFiled: September 30, 2015Date of Patent: March 26, 2019Assignee: LG Chem, Ltd.Inventors: Je Gwon Lee, No Jin Park, Jung Keun Kim, Se Jin Ku, Mi Sook Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
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Patent number: 10227438Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.Type: GrantFiled: December 8, 2014Date of Patent: March 12, 2019Assignee: LG Chem, Ltd.Inventors: Je Gwon Lee, Jung Keun Kim, No Jin Park, Mi Sook Lee, Se Jin Ku, Eun Young Choi, Sung Soo Yoon
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Patent number: 10227436Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.Type: GrantFiled: December 8, 2014Date of Patent: March 12, 2019Assignee: LG Chem, Ltd.Inventors: Mi Sook Lee, Jung Keun Kim, Je Gwon Lee, No Jin Park, Se Jin Ku, Eun Young Choi, Sung Soo Yoon
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Patent number: 10202481Abstract: The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.Type: GrantFiled: June 5, 2016Date of Patent: February 12, 2019Assignee: LG Chem, Ltd.Inventors: Jung Keun Kim, Jeong Kyu Lee, Je Gwon Lee, Mi Sook Lee, No Jin Park, Se Jin Ku, Eun Young Choi, Sung Soo Yoon
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Patent number: 10196475Abstract: The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.Type: GrantFiled: June 5, 2016Date of Patent: February 5, 2019Assignee: LG Chem, Ltd.Inventors: Jung Keun Kim, Jeong Kyu Lee, Je Gwon Lee, Mi Sook Lee, No Jin Park, Se Jin Ku, Eun Young Choi, Sung Joon Oh, Sung Soo Yoon
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Patent number: 10196474Abstract: The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.Type: GrantFiled: June 5, 2016Date of Patent: February 5, 2019Assignee: LG Chem, Ltd.Inventors: No Jin Park, Jung Keun Kim, Je Gwon Lee, Mi Sook Lee, Se Jin Ku, Eun Young Choi, Sung Soo Yoon
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Patent number: 10184021Abstract: The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.Type: GrantFiled: June 5, 2016Date of Patent: January 22, 2019Assignee: LG Chem, Ltd.Inventors: Je Gwon Lee, Jung Keun Kim, No Jin Park, Mi Sook Lee, Se Jin Ku, Eun Young Choi, Sung Soo Yoon
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Patent number: 10153173Abstract: The present invention relates to a process for selectively removing a block on one side using a wet etching process in connection with self-assembly block copolymer thin films that have etching-resisting properties different from each other. The present invention can form a vertical nanopore structure having a high aspect ratio, even in the case of a thick film which has a vertically oriented cylinder self-assembly structure and which has one or more periods, by overcoming the limit of the prior art, which cannot implement a vertical pore structure through wet etching.Type: GrantFiled: February 2, 2016Date of Patent: December 11, 2018Assignee: LG Chem, Ltd.Inventors: Se Jin Ku, Eun Young Choi, Sung Soo Yoon, No Jin Park, Jung Keun Kim, Je Gwon Lee, Mi Sook Lee
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Patent number: 10150832Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.Type: GrantFiled: December 8, 2014Date of Patent: December 11, 2018Assignee: LG Chem, Ltd.Inventors: Mi Sook Lee, Jung Keun Kim, Je Gwon Lee, No Jin Park, Se Jin Ku, Eun Young Choi, Sung Soo Yoon
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Patent number: 10081698Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.Type: GrantFiled: December 8, 2014Date of Patent: September 25, 2018Assignee: LG Chem, Ltd.Inventors: Mi Sook Lee, Jung Keun Kim, Je Gwon Lee, No Jin Park, Se Jin Ku, Eun Young Choi, Sung Soo Yoon
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Publication number: 20180170024Abstract: The present application relates to a laminate, a method for preparing same and a use of the laminate. The present application can provide a method for forming a film, which comprises a self-assembled block copolymer, to have excellent uniformity in thickness even when the film is formed over a large area, a laminate comprising a polymer film formed by means of the method, and a use of same.Type: ApplicationFiled: June 13, 2016Publication date: June 21, 2018Applicant: LG Chem, Ltd.Inventors: Eun Young Choi, Se Jin Ku, Sung Soo Yoon, No Jin Park, Jung Keun Kim, Je Gwon Lee, Mi Sook Lee
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Publication number: 20180033638Abstract: The present invention relates to a process for selectively removing a block on one side using a wet etching process in connection with self-assembly block copolymer thin films that have etching-resisting properties different from each other. The present invention can form a vertical nanopore structure having a high aspect ratio, even in the case of a thick film which has a vertically oriented cylinder self-assembly structure and which has one or more periods, by overcoming the limit of the prior art, which cannot implement a vertical pore structure through wet etching.Type: ApplicationFiled: February 2, 2016Publication date: February 1, 2018Applicant: LG Chem, Ltd.Inventors: Se Jin Ku, Eun Young Choi, Sung Soo Yoon, No Jin Park, Jung Keun Kim, Je Gwon Lee, Mi Sook Lee
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Publication number: 20170306139Abstract: The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.Type: ApplicationFiled: September 30, 2015Publication date: October 26, 2017Applicant: LG Chem, Ltd.Inventors: Jung Keun Kim, Je Gwon Lee, Jeong Kyu Lee, Se Jin Ku, No Jin Park, Mi Sook Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
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Patent number: 9788434Abstract: The present invention relates to a preparation method for a dry film solder resist (DFSR) capable of forming the DFSR having fine unevenness on a surface by a more simplified method, and a film laminate used therein. The preparation method for a dry film solder resist includes forming a predetermined photo-curable and heat-curable resin composition on a transparent carrier film having a surface on which a fine unevenness having an average roughness (Ra) of 200 nm to 2 ?m is formed; laminating the resin composition on a substrate to form a laminated structure in which the substrate, the resin composition, and the transparent carrier film are sequentially formed; exposing the resin composition and delaminating the transparent carrier film; and alkaline-developing the resin composition in a non-exposure part and performing heat-curing.Type: GrantFiled: September 22, 2014Date of Patent: October 10, 2017Assignee: LG CHEM, LTD.Inventors: Min Su Jeong, You Jin Kyung, Byung Ju Choi, Woo Jae Jeong, Bo Yun Choi, Kwang Joo Lee, Se Jin Ku
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Publication number: 20170247492Abstract: The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.Type: ApplicationFiled: September 30, 2015Publication date: August 31, 2017Applicant: LG Chem, Ltd.Inventors: Eun Young CHOI, No Jin PARK, Jung Keun KIM, Je Gwon LEE, Se Jin KU, Mi Sook LEE, Hyung Ju RYU, Sung Soo YOON
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Publication number: 20170226260Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.Type: ApplicationFiled: September 30, 2015Publication date: August 10, 2017Applicant: LG Chem, Ltd.Inventors: Mi Sook Lee, Jung Keun Kim, Se Jin Ku, No Jin Park, Je Gwon Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
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Publication number: 20170226261Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.Type: ApplicationFiled: September 30, 2015Publication date: August 10, 2017Applicant: LG Chem, Ltd.Inventors: Je Gwon Lee, No Jin Park, Jung Keun Kim, Se Jin Ku, Mi Sook Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
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Publication number: 20170226235Abstract: The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.Type: ApplicationFiled: September 30, 2015Publication date: August 10, 2017Applicant: LG Chem, Ltd.Inventors: No Jin Park, Jung Keun Kim, Je Gwon Lee, Sung Soo Yoon, Se Jin Ku, Mi Sook Lee, Eun Young Choi, Hyung Ju Ryu
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Publication number: 20170226258Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.Type: ApplicationFiled: September 30, 2015Publication date: August 10, 2017Applicant: LG Chem, Ltd.Inventors: Mi Sook Lee, Jung Keun Kim, Se Jin Ku, No Jin Park, Je Gwon Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
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Publication number: 20170219922Abstract: Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.Type: ApplicationFiled: September 30, 2015Publication date: August 3, 2017Applicant: LG Chem, Ltd.Inventors: Se Jin Ku, Mi Sook Lee, Hyung Ju Ryu, Jung Keun Kim, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi