Patents by Inventor Se Min Chun

Se Min Chun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230328871
    Abstract: Disclosed is a plasma generation device. A plasma generation device, according to an exemplary embodiment of the present invention, comprises: an electromagnetic wave generator; a plasma torch which generates plasma by arc discharge; and a waveguide which guides an electromagnetic wave generated by the electromagnetic wave generator to be transmitted to the plasma side, wherein the electromagnetic wave transmitted through the waveguide heats one side portion of the plasma.
    Type: Application
    Filed: August 6, 2021
    Publication date: October 12, 2023
    Applicant: Korea Institute of Fusion Energy
    Inventors: Dong Hun SHIN, Yong Cheol HONG, Se Min CHUN, Geon Woo YANG, Hee Jae LEE
  • Publication number: 20230234020
    Abstract: Provided is a microwave plasma device, including: a hollow tube that is hollow and irradiated with a microwave; a swirl gas inlet that is located at a lower end portion of the hollow tube and injected with a swirl gas; an axial gas inlet that penetrates through the lower end portion of the hollow tube and injected with an axial gas; and a swirl gas barrier that is located inside the hollow tube, located near where the swirl gas is injected, and extends in a longitudinal direction of the hollow tube, in which a gap g is formed between the swirl gas barrier and the hollow tube, and plasma is generated inside the hollow tube and nitrogen oxide is generated inside the hollow tube.
    Type: Application
    Filed: May 25, 2021
    Publication date: July 27, 2023
    Inventors: Yong Cheol HONG, Se Min CHUN, Geon Woo YANG, Hee Jae LEE
  • Patent number: 10655206
    Abstract: Disclosed herein is a surface treatment method of a ceramic powder using microwave plasma in order to enhance flowability. The surface treatment method can be applied to a ceramic powder having a small particle size of 45 ?m or less and can significantly enhance flowability while reducing an influence on a particle size compared to a conventional method. Consequently, the ceramic particles surface-treated by the above-described surface treatment method can be formed to have a smooth and dense coating film without pores during spray coating.
    Type: Grant
    Filed: October 29, 2018
    Date of Patent: May 19, 2020
    Assignee: SEWON HARDFACING CO., LTD.
    Inventors: Heung Soo Moon, Pyoung Woo Shin, Sae Mee Park, Yong Cheol Hong, Se Min Chun, Dong Hun Shin
  • Publication number: 20190300998
    Abstract: Disclosed herein is a surface treatment method of a ceramic powder using microwave plasma in order to enhance flowability. The surface treatment method can be applied to a ceramic powder having a small particle size of 45 ?m or less and can significantly enhance flowability while reducing an influence on a particle size compared to a conventional method. Consequently, the ceramic particles surface-treated by the above-described surface treatment method can be formed to have a smooth and dense coating film without pores during spray coating.
    Type: Application
    Filed: October 29, 2018
    Publication date: October 3, 2019
    Inventors: Heung Soo MOON, Pyoung Woo SHIN, Sae Mee PARK, Yong Cheol HONG, Se Min CHUN, Dong Hun SHIN
  • Patent number: 9932228
    Abstract: The present invention provides a hybrid reforming system for producing syngas through a reforming reaction between carbon dioxide plasma and a hydrocarbon material, the system comprising: a carbon dioxide feeder (110) which feeds carbon dioxide; a hydrocarbon material feeder (120) which feeds the hydrocarbon material; a plasma reformer (200) which respectively receives carbon dioxide and the hydrocarbon material from the carbon dioxide feeder (110) and the hydrocarbon material feeder (120), and produces primary syngas through a reforming reaction while producing the carbon dioxide plasma using electromagnetic waves; a wet carbon-refining device (130) which is arranged at a gas exhaust end of the plasma reformer (200) and filters and refines carbon contained in the primary syngas; and a catalyst dry-reformer (140) which is arranged at a gas exhaust end of the wet carbon-refining device (130) and produces secondary syngas by making the refined syngas undergo a catalyst dry-reforming reaction.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: April 3, 2018
    Assignee: KOREA BASIC SCIENCE INSTITUTE
    Inventors: Yong Cheol Hong, Dae Hyun Choi, Se Min Chun
  • Patent number: 9731268
    Abstract: The present invention discloses a plasma dry reforming apparatus for producing synthetic gas, main components of which are hydrogen and carbon monoxide, by reforming methane and carbon dioxide injected in plasma, the apparatus comprising: a plasma reformer 100, 200 which produces carbon dioxide plasma by making carbon dioxide supplied therein into plasma, ignites plasma flame by supplying hydrocarbon to the produced dioxide plasma, and produces synthetic gas by supplying methane to the plasma flame.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: August 15, 2017
    Assignee: KOREA BASIC SCIENCE INSTITUTE
    Inventors: Yong Cheol Hong, Se Min Chun, Seong Yun Cho
  • Publication number: 20160121296
    Abstract: The present invention provides a hybrid reforming system for producing syngas through a reforming reaction between carbon dioxide plasma and a hydrocarbon material, the system comprising: a carbon dioxide feeder (110) which feeds carbon dioxide; a hydrocarbon material feeder (120) which feeds the hydrocarbon material; a plasma reformer (200) which respectively receives carbon dioxide and the hydrocarbon material from the carbon dioxide feeder (110) and the hydrocarbon material feeder (120), and produces primary syngas through a reforming reaction while producing the carbon dioxide plasma using electromagnetic waves; a wet carbon-refining device (130) which is arranged at a gas exhaust end of the plasma reformer (200) and filters and refines carbon contained in the primary syngas; and a catalyst dry-reformer (140) which is arranged at a gas exhaust end of the wet carbon-refining device (130) and produces secondary syngas by making the refined syngas undergo a catalyst dry-reforming reaction.
    Type: Application
    Filed: October 30, 2015
    Publication date: May 5, 2016
    Applicant: KOREA BASIC SCIENCE INSTITUTE
    Inventors: Yong Cheol HONG, Dae Hyun CHOI, Se Min CHUN
  • Publication number: 20150246337
    Abstract: The present invention discloses a plasma dry reforming apparatus for producing synthetic gas, main components of which are hydrogen and carbon monoxide, by reforming methane and carbon dioxide injected in plasma, the apparatus comprising: a plasma reformer 100, 200 which produces carbon dioxide plasma by making carbon dioxide supplied therein into plasma, ignites plasma flame by supplying hydrocarbon to the produced dioxide plasma, and produces synthetic gas by supplying methane to the plasma flame.
    Type: Application
    Filed: September 9, 2013
    Publication date: September 3, 2015
    Applicant: KOREA BASIC SCIENCE INSTITUTE
    Inventors: Yong Cheol Hong, Se Min Chun, Seong Yun Cho