Patents by Inventor Se-Yeon Kim

Se-Yeon Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250108009
    Abstract: A method for synthesizing hybrid nanoparticles comprising apolipoproteins uses a swirling microvortex device. The hybrid nanoparticles include proteins that include apolipoproteins and have various functionalities. The production method can be used to produce small, uniform, stable nanoparticles having various physiological activities.
    Type: Application
    Filed: December 12, 2024
    Publication date: April 3, 2025
    Inventors: Mi Yeon JEON, Woo Seung LEE, Se Yeon KIM, Yong Tae KIM
  • Patent number: 12251419
    Abstract: According to sustained-release microparticles containing deslorelin, and a preparation method therefor, of the present invention, sustained-release microparticles containing deslorelin in a formulation for subcutaneous administration are provided so that pain can be relieved during administration to animals, and a chemical castration effect can last for 2 to 36 months. In addition, the present invention is effective as a chemical castration agent for 2 to 8 months so as to have an excellent of removing boar taint.
    Type: Grant
    Filed: January 14, 2020
    Date of Patent: March 18, 2025
    Assignee: INVENTAGE LAB INC.
    Inventors: Ju Hee Kim, Se Yeon Kim
  • Patent number: 11911508
    Abstract: The present invention relates to: sustained-release microparticles capable of maintaining, for a long time, effects of preventing, treating or alleviating benign prostatic hyperplasia and prostate cancer and effects of preventing hair loss and promoting hair growth according to the administration of microparticles containing dutasteride; and a preparation method therefor, and according to the use of a method for administering the particles to a patient through an injection, a patient does not have to directly store or handle the microparticles, unlike an oral dosage form, and thus storage and handling are simple. In addition, drug effects are maintained for a long period of time of 1-3 months and, simultaneously, administration through injection can be facilitated since foreign body sensation and pain are reduced when being administered to a patient through injection because of the constant average diameter of the particles.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: February 27, 2024
    Assignee: INVENTAGE LAB INC.
    Inventors: Ju Hee Kim, Se Yeon Kim
  • Patent number: 11484495
    Abstract: The present disclosure relates to a sustained-release injectable composition comprising finasteride, and when the composition is injected as an injection formulation, it is possible to maintain a constant blood concentration for a long time without initial over-release in terms of the degree of release of finasteride, and when the composition is administrated by subcutaneous injection, it is possible to maintain the effect of treating hair loss and benign prostatic hyperplasia continuously for 1 to 3 months.
    Type: Grant
    Filed: December 21, 2020
    Date of Patent: November 1, 2022
    Assignee: INVENTAGE LAB INC.
    Inventors: Ju Hee Kim, Se Yeon Kim
  • Publication number: 20220202894
    Abstract: According to sustained-release microparticles containing deslorelin, and a preparation method therefor, of the present invention, sustained-release microparticles containing deslorelin in a formulation for subcutaneous administration are provided so that pain can be relieved during administration to animals, and a chemical castration effect can last for 2 to 36 months. In addition, the present invention is effective as a chemical castration agent for 2 to 8 months so as to have an excellent of removing boar taint.
    Type: Application
    Filed: January 14, 2020
    Publication date: June 30, 2022
    Inventors: Ju Hee KIM, Se Yeon KIM
  • Publication number: 20210205221
    Abstract: The present invention relates to: sustained-release microparticles capable of maintaining, for a long time, effects of preventing, treating or alleviating benign prostatic hyperplasia and prostate cancer and effects of preventing hair loss and promoting hair growth according to the administration of microparticles containing dutasteride; and a preparation method therefor, and according to the use of a method for administering the particles to a patient through an injection, a patient does not have to directly store or handle the microparticles, unlike an oral dosage form, and thus storage and handling are simple. In addition, drug effects are maintained for a long period of time of 1-3 months and, simultaneously, administration through injection can be facilitated since foreign body sensation and pain are reduced when being administered to a patient through injection because of the constant average diameter of the particles.
    Type: Application
    Filed: May 20, 2019
    Publication date: July 8, 2021
    Inventors: Ju Hee KIM, Se Yeon KIM
  • Publication number: 20210186864
    Abstract: The present disclosure relates to a sustained-release injectable composition comprising finasteride, and when the composition is injected as an injection formulation, it is possible to maintain a constant blood concentration for a long time without initial over-release in terms of the degree of release of finasteride, and when the composition is administrated by subcutaneous injection, it is possible to maintain the effect of treating hair loss and benign prostatic hyperplasia continuously for 1 to 3 months.
    Type: Application
    Filed: December 21, 2020
    Publication date: June 24, 2021
    Inventors: Ju Hee KIM, Se Yeon KIM
  • Patent number: 10861695
    Abstract: A method of forming a low-k layer includes forming a layer by providing a silicon source, a carbon source, an oxygen source, and a nitrogen source onto a substrate. The forming of the layer includes a plurality of main cycles, and each of the main cycles includes providing the silicon source, providing the carbon source, providing the oxygen source, and providing the nitrogen source, each of which is performed at least one time. Each of the main cycles includes sub-cycles in which the providing of the carbon source and the providing of the oxygen source are alternately performed.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: December 8, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sunyoung Lee, Minjae Kang, Se-Yeon Kim, Teawon Kim, Yong-Suk Tak, Sunjung Kim
  • Publication number: 20190333754
    Abstract: A method of forming a low-k layer includes forming a layer by providing a silicon source, a carbon source, an oxygen source, and a nitrogen source onto a substrate. The forming of the layer includes a plurality of main cycles, and each of the main cycles includes providing the silicon source, providing the carbon source, providing the oxygen source, and providing the nitrogen source, each of which is performed at least one time. Each of the main cycles includes sub-cycles in which the providing of the carbon source and the providing of the oxygen source are alternately performed.
    Type: Application
    Filed: December 12, 2018
    Publication date: October 31, 2019
    Inventors: Sunyoung Lee, Minjae Kang, Se-Yeon Kim, Teawon Kim, Yong-Suk Tak, Sunjung Kim
  • Patent number: 9283652
    Abstract: An edge grinding apparatus and method for grinding a glass substrate, with which a glass substrate can be ground by a fixed amount and the occurrence of defects can be minimized. The edge grinding apparatus includes an edge grinding unit which grinds a cut edge of a glass substrate while following the cut edge; a measuring unit which obtains positional information of the cut edge; and a control unit which receives the positional information of the cut edge from the measuring unit and controls a position of the edge grinding unit based on the positional information of the cut edge.
    Type: Grant
    Filed: October 9, 2012
    Date of Patent: March 15, 2016
    Assignee: Corning Precision Materials Co., Ltd.
    Inventors: Young Chae Ko, Se-Yeon Kim, Yeonhoon Kim, Jun-Seok Kim
  • Patent number: 8830888
    Abstract: A method and system for wireless charging using a radio wave. The method includes scanning a radio wave of an access point, determining an available charging frequency band among frequency bands, sending the access point a request for transmitting a charging radio wave at the charging frequency band, and switching power output from an antenna, to a battery circuit.
    Type: Grant
    Filed: May 20, 2011
    Date of Patent: September 9, 2014
    Assignee: Samsung Electronics Co,. Ltd.
    Inventors: Young-Shik Shin, Dae-Hyun Sim, Chang-Seok Lee, Beom-Soo Cho, Hyun-Soo Kim, Se-Yeon Kim
  • Publication number: 20140209243
    Abstract: A plasma equipment includes a chamber, a shower head disposed in an upper part of an inner space of the chamber for discharging a cleaning gas into the chamber, a plasma generator for generating a plasma gas from the cleaning gas, a lower electrode disposed in a lower part of the inner space of the chamber, a chuck covering the lower electrode, and a field inducing unit disposed outside the chamber for inducing an electric field or a magnetic field within the chamber in a direction parallel to top surfaces of the chuck and the lower electrode. The field inducing unit concentrates the plasma gas on an inner sidewall of the chamber and protects the chuck from the plasma gas.
    Type: Application
    Filed: January 24, 2014
    Publication date: July 31, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Se-Yeon Kim, Kyung Hwan Jeong
  • Patent number: 8767203
    Abstract: A plasma generating unit for a process monitoring device includes a hollow first electrode extending in a length direction and a second electrode extending in the length direction and positioned within and displaced from the first electrode with a distance therebetween. The first electrode has an inner diameter and the second electrode has an outer diameter selected to vary the distance between the electrodes in the length direction so that the plasma generating unit generates a plasma by ionizing a gas flowing between the electrodes at a different position in the length direction based on a pressure of the gas.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: July 1, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Se-Yeon Kim, Hun Jung Yi, Sangpyoung Jeon, Hyojin Yun
  • Publication number: 20140065928
    Abstract: An edge grinding apparatus and method for grinding a glass substrate, with which a glass substrate can be ground by a fixed amount and the occurrence of defects can be minimized. The edge grinding apparatus includes an edge grinding unit which grinds a cut edge of a glass substrate while following the cut edge; a measuring unit which obtains positional information of the cut edge; and a control unit which receives the positional information of the cut edge from the measuring unit and controls a position of the edge grinding unit based on the positional information of the cut edge.
    Type: Application
    Filed: October 9, 2012
    Publication date: March 6, 2014
    Applicant: Samsung Corning Precision Materials, Co., Ltd.
    Inventors: Young Chae Ko, Se-Yeon Kim, Yeonhoon Kim, Jun-Seok Kim
  • Patent number: 8541030
    Abstract: Disclosed is a method for preparing a longer sustained-release formulation containing bioactive substances. More particularly, the present invention provides a method for preparing longer sustained-release microcapsules comprising: adding an emulsion including bioactive substances, biocompatible polymer and polyvinylpyrrolidone to an aqueous solution.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: September 24, 2013
    Assignee: Dongkook Pharmaceutical Co., Ltd.
    Inventors: Nak-Hyun Lim, Jung-Kwoun Kim, Hyung-Joon Jung, Se-Yeon Kim, Goo-Young Jung, Kyung-Hoi Cha, Mork-Soon Park
  • Patent number: 8268316
    Abstract: Disclosed is a monoclonal antibody having very high affinity to anthrax toxin and potent toxin-neutralizing activity. Also disclosed are a composition for neutralizing anthrax toxin comprising the antibody and a kit for detecting anthrax toxin.
    Type: Grant
    Filed: March 10, 2006
    Date of Patent: September 18, 2012
    Assignee: Aprogen, Inc
    Inventors: Hyo Jeong Hong, Kyung Soo Inn, Nam Kyu Lim, Jung Whan Kim, Keun Soo Kim, Sang Yoon Lee, Se Yeon Kim, Hyun Jung Kang, Mee Sook Oh
  • Publication number: 20120062887
    Abstract: A plasma generating unit for a process monitoring device includes a hollow first electrode extending in a length direction and a second electrode extending in the length direction and positioned within and displaced from the first electrode with a distance therebetween. The first electrode has an inner diameter and the second electrode has an outer diameter selected to vary the distance between the electrodes in the length direction so that the plasma generating unit generates a plasma by ionizing a gas flowing between the electrodes at a different position in the length direction based on a pressure of the gas.
    Type: Application
    Filed: August 25, 2011
    Publication date: March 15, 2012
    Inventors: Se-Yeon Kim, Hun Jung Yi, Sangpyoung Jeon, Hyojin Yun
  • Publication number: 20120006351
    Abstract: A cleaning method for cleaning a semiconductor manufacturing apparatus may include generating plasma from a cleaning gas. The semiconductor manufacturing apparatus may be cleaned with the plasma. A positive direct-current voltage may be applied to an ESC of the semiconductor manufacturing apparatus during a cleaning of the semiconductor manufacturing apparatus. A negative direct-current voltage may be applied to the ESC during the cleaning of the semiconductor manufacturing apparatus. Also, a wall of the process chamber may be cleaned by applying the positive direct-current voltage to the ESC.
    Type: Application
    Filed: July 6, 2011
    Publication date: January 12, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hyun-Su Jun, Hun-Jung Yi, Sang-jean Jeon, Se-Yeon Kim, In-Joong Kim
  • Publication number: 20110286374
    Abstract: A method and system for wireless charging using a radio wave. The method includes scanning a radio wave of an access point, determining an available charging frequency band among frequency bands, sending the access point a request for transmitting a charging radio wave at the charging frequency band, and switching power output from an antenna, to a battery circuit.
    Type: Application
    Filed: May 20, 2011
    Publication date: November 24, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-Shik Shin, Dae-Hyun Sim, Chang-Seok Lee, Beom-Soo Cho, Hyun-Soo Kim, Se-Yeon Kim
  • Publication number: 20110222058
    Abstract: Provided are a process monitoring device for monitoring semiconductor device manufacturing processes, a semiconductor process apparatus including the same, and a process monitoring method thereof. The process monitoring device generates plasma from the exhaust gas of the process chamber using DBD-type electrodes and analyzes a spectrum of emission light from the plasma, thereby monitoring the semiconductor manufacturing process performed in the process chamber.
    Type: Application
    Filed: March 15, 2011
    Publication date: September 15, 2011
    Inventors: Se-Yeon KIM, HunJung Yi