Abstract: A tooling system may comprise a device configured to communicate with an identifier of a machine tool and a tool database having tool information including a predefined proximity associated with the identifier. The device may be configured to automatically activate, without a user-initiated scan, communication with at least one of the machine tool and the tool database in response to the identifier being within the predefined proximity. The device may also be configured to transfer tool information of the machine tool with respect to the tool database.

Abstract: Example methods, systems, and apparatus described herein provide a minimally invasive technique of controlling shape and stress in a MEMS device. An example method includes depositing a layer of material continuously across a semiconductor wafer, exposing the layer of material to oxygen plasma to increase a relative amount of oxygen within the layer of material; and etching the layer of material after exposing the layer of material to the oxygen plasma.

Abstract: An apparatus in one embodiment comprises a processing platform that includes a plurality of processing devices each comprising a processor coupled to a memory. The processing platform is configured to implement virtual resources of at least a first cloud-based system. The processing platform further comprises a user-specific cloud infrastructure identification module configured to determine user-specific cloud infrastructure within the first cloud-based system, a virtual representation generator module configured to generate an interactive three-dimensional visualization of the first cloud-based system based on the user-specific cloud infrastructure, and a virtual representation display module configured to output the interactive three-dimensional visualization of the first cloud-based system via at least one type of interface.

Abstract: An apparatus in one embodiment comprises a processing platform that includes a plurality of processing devices each comprising a processor coupled to a memory. The processing platform is configured to implement at least a portion of at least a first cloud-based system. The processing platform comprises a modelling language extension module configured to implement artificial intelligence-based decision points into a process flow and compile context attributes associated with the artificial intelligence-based decision points based on data from artificial intelligence systems.

Abstract: An apparatus in one embodiment comprises a processing platform that includes a plurality of processing devices each comprising a processor coupled to a memory. The processing platform is configured to implement at least a portion of at least a first cloud-based system. The processing platform further comprises one or more integration adapters configured to implement multiple cloud resources onto the processing platform, a cloud services module configured to deploy one or more identified cloud services onto the processing platform, a processes module configured to deploy one or more identified business processes and one or more identified technical processes onto the processing platform, and an integration middleware configured to automate ad hoc execution of at least one of the one or more cloud services, the one or more business processes, and the one or more technical processes, in conjunction with at least one of the implemented cloud resources.

Abstract: An apparatus in one embodiment comprises a processing platform that includes a plurality of processing devices each comprising a processor coupled to a memory. The processing platform is configured to implement at least a portion of at least one of multiple cloud-based systems. The platform further comprises a ledger analysis module configured to identify common operation parameters associated with multiple ledger software offerings and infrastructure components required by the ledger software offerings. The platform also comprises a ledger adapter module configured to map the common operation parameters to multiple offering-specific ledger adapters, and a ledger infrastructure creation module configured to create infrastructure for implementing the ledger software offerings based on the identified infrastructure components.

Abstract: An apparatus in one embodiment comprises a processing platform that includes a plurality of processing devices each comprising a processor coupled to a memory. The platform is configured to implement at least a portion of at least a first cloud-based system. The platform comprises interfaces configured to enable interaction between actors and the platform, wherein the actors comprise cloud-based vendors and customers of resource offerings. The platform additionally comprises a repository configured to maintain individual resource offerings and data pertaining thereto, and a matchmaking module configured to match individual resource offerings based on associated customer attributes.

Abstract: An apparatus in one embodiment comprises a processing platform that includes a plurality of processing devices each comprising a processor coupled to a memory. The processing platform is configured to implement at least a portion of at least a first cloud-based system. The processing platform further comprises a smart agent engine configured to ingest datasets and related workflows in connection with service delivery operations and normalize the ingested datasets and workflows. The processing platform further comprises an analytics engine configured to generate metrics by applying machine learning algorithms to the normalized datasets and workflows, and generate an enhanced version of the normalized datasets and/or workflows by encompassing at least one inset and/or outflow based on the metrics and one or more algorithms. Also, the processing platform further comprises a decision support module configured to output the ingested datasets, the ingested workflows, and the enhanced dataset and/or workflow.

Abstract: Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the second sub-resolution assist feature is determined. A merging technique is determined in accordance with the distance and the merge bar width. The first sub-resolution assist feature and the second sub-resolution assist feature are merged according to the identified merging technique.

Abstract: Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the second sub-resolution assist feature is determined. A merging technique is determined in accordance with the distance and the merge bar width. The first sub-resolution assist feature and the second sub-resolution assist feature are merged according to the identified merging technique.

Abstract: Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the second sub-resolution assist feature is determined. A merging technique is determined in accordance with the distance and the merge bar width. The first sub-resolution assist feature and the second sub-resolution assist feature are merged according to the identified merging technique.

Abstract: In accordance with the invention, there is provided a system and method for checking a mask layout including sub-resolution assist features (SRAFs). A checking program divides each edge of each main feature into sections, forms a set of segments by searching perpendicularly over a distance to determine if any portion of a feature is located within the distance. Segments are then flagged based on whether a feature located within proximity to that segment. A classification program may then classify each of the main features based on the segment data.

Abstract: A method is provided for determining pitch of lithographic features of a mask. The method includes determining a bias based on an interaction between a plurality of reference features positioned according to a lithographic parameter of the mask, applying the bias to a plurality of lithographic features of the mask, and determining pitch of the plurality of lithographic features based on interactions between the biased plurality of lithographic features of the mask.

Abstract: A design application improves design checking by utilizing a template. During the checking process, the design application divides the design layout into regions. To further improve processing speed, the design application utilizes the template. The template maps the location of the regions of a design layout during a checking process. The template comprises information such as the dimensions and location of the regions in human-readable form. Because the human-readable template is computationally simple to process, the design application may locate, divide, manage, and merge the regions of the design layout more quickly.

Abstract: Modifying merged sub-resolution assist features includes receiving a mask pattern comprising the merged sub-resolution assist features, where a segmenting sub-resolution assist feature intersects a segmented sub-resolution assist feature at an intersection. Each sub-resolution assist feature is represented by an axis of the sub-resolution assist feature. The length of at least one axis is established, and an axis is modified in accordance with the length. Each axis is converted to a sub-resolution assist feature to yield the modified merged sub-resolution assist features.

Abstract: Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the second sub-resolution assist feature is determined. A merging technique is determined in accordance with the distance and the merge bar width. The first sub-resolution assist feature and the second sub-resolution assist feature are merged according to the identified merging technique.

Abstract: Modifying merged sub-resolution assist features includes receiving a mask pattern comprising the merged sub-resolution assist features, where a segmenting sub-resolution assist feature intersects a segmented sub-resolution assist feature at an intersection. Each sub-resolution assist feature is represented by an axis of the sub-resolution assist feature. The length of at least one axis is established, and an axis is modified in accordance with the length. Each axis is converted to a sub-resolution assist feature to yield the modified merged sub-resolution assist features.

Abstract: Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the second sub-resolution assist feature is determined. A merging technique is determined in accordance with the distance and the merge bar width. The first sub-resolution assist feature and the second sub-resolution assist feature are merged according to the identified merging technique.

Abstract: Modifying sub-resolution assist features includes receiving a mask pattern for a photolithographic mask. The mask pattern includes main features, and the photolithographic mask is operable to pattern a wafer pattern for a semiconductor wafer. Placement of sub-resolution assist features for the main features is estimated. The following is repeated for one or more iterations: correcting the main features using a wafer pattern model operable to estimate the wafer pattern; evaluating the sub-resolution assist features according to the wafer pattern model; and modifying at least one sub-resolution assist feature in accordance with the evaluation.

Abstract: A design application improves design checking by utilizing a template. During the checking process, the design application divides the design layout into regions. To further improve processing speed, the design application utilizes the template. The template maps the location of the regions of a design layout during a checking process. The template comprises information such as the dimensions and location of the regions in human-readable form. Because the human-readable template is computationally simple to process, the design application may locate, divide, manage, and merge the regions of the design layout more quickly.