Patents by Inventor Sean Frink

Sean Frink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Auto-stopping slurries for chemical-mechanical polishing of topographic dielectric silicon dioxide
    Patent number: 7696095
    Abstract: The present invention provides auto-stopping CMP slurry compositions that minimize post-CMP non-uniformity and also extend the time that polishing can be continued beyond the end point without the risk of over-polishing the dielectric silicon dioxide film. Auto-stopping CMP slurry compositions according to the invention include ceria abrasive particles and an effective amount of a polyalkylamine such as polyethyleneimine dispersed in water. The methods of the invention include polishing a topographic dielectric silicon dioxide film layer using the auto-stopping CMP slurry compositions to obtain a dielectric silicon dioxide surface having a desired predetermined minimum step height.
    Type: Grant
    Filed: February 23, 2007
    Date of Patent: April 13, 2010
    Assignee: Ferro Corporation
    Inventors: Eric Oswald, Sean Frink, Bradley Kraft, Brian Santora
  • AUTO-STOPPING SLURRIES FOR CHEMICAL-MECHANICAL POLISHING OF TOPOGRAPHIC DIELECTRIC SILICON DIOXIDE
    Publication number: 20080202037
    Abstract: The present invention provides auto-stopping CMP slurry compositions that minimize post-CMP non-uniformity and also extend the time that polishing can be continued beyond the end point without the risk of over-polishing the dielectric silicon dioxide film. Auto-stopping CMP slurry compositions according to the invention include ceria abrasive particles and an effective amount of a polyalkylamine such as polyethyleneimine dispersed in water. The methods of the invention include polishing a topographic dielectric silicon dioxide film layer using the auto-stopping CMP slurry compositions to obtain a dielectric silicon dioxide surface having a desired predetermined minimum step height.
    Type: Application
    Filed: February 23, 2007
    Publication date: August 28, 2008
    Applicant: FERRO CORPORATION
    Inventors: Eric Oswald, Sean Frink, Bradley Kraft, Brian Santora