Patents by Inventor Sean J. Bentley

Sean J. Bentley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220372890
    Abstract: In the compressor of a gas turbine engine, variable guide vanes are adjusted by virtue of connections to an actuation ring that can be rotated within a fixed range of degrees. The connections between the guide vanes and the actuation ring can undergo significant torsional stress. Accordingly, an actuation system is disclosed for reducing the torsional stress experienced by the actuation connections.
    Type: Application
    Filed: May 20, 2021
    Publication date: November 24, 2022
    Applicant: Solar Turbines Incorporated
    Inventors: Sean J. Bentley, David Adair, David Lau, Tyler Elsey, Bill Fahrbach, Jonathan Leagon
  • Patent number: 7859646
    Abstract: According to one exemplary embodiment of the present invention, a method for writing an arbitrary, two-dimensional pattern using interferometric lithography and classical techniques includes the steps of: (1) creating a pixel array defined by a number of pixels having specific coordinates; (2) mapping pixel information based on the desired pattern, the pixel information including a list of which pixels are activated to define the desired two-dimensional pattern; (3) controlling a relative strength of each pixel for indicating a feature height of a portion of the desired two-dimensional pattern; and (4) controlling a degree that one pixel is shifted in an x-direction and a y-direction relative to original coordinates of the pixel in order to define the desired two-dimensional pattern pixel by pixel.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: December 28, 2010
    Assignee: Adelphi University
    Inventor: Sean J. Bentley
  • Publication number: 20080174847
    Abstract: According to one exemplary embodiment of the present invention, a method for writing an arbitrary, two-dimensional pattern using interferometric lithography and classical techniques includes the steps of: (1) creating a pixel array defined by a number of pixels having specific coordinates; (2) mapping pixel information based on the desired pattern, the pixel information including a list of which pixels are activated to define the desired two-dimensional pattern; (3) controlling a relative strength of each pixel for indicating a feature height of a portion of the desired two-dimensional pattern; and (4) controlling a degree that one pixel is shifted in an x-direction and a y-direction relative to original coordinates of the pixel in order to define the desired two-dimensional pattern pixel by pixel.
    Type: Application
    Filed: June 15, 2007
    Publication date: July 24, 2008
    Inventor: Sean J. Bentley