Abstract: A method for depositing parylene onto a substrate includes utilizing a vaporization chamber and a pyrolysis chamber to crack a dimer into a monomer gas, directly ionizing the monomer gas by passing the monomer gas through a plasma generation chamber comprising plasma prior to injection of the monomer gas into a deposition chamber, and polymerizing the ionized monomer in the deposition chamber to create a polymer and a protective coating on a substrate.

Abstract: Protective coatings with one or more additives dispersed therethrough are disclosed. A protective coating may comprise a poly(p-xylylene), or parylene. An additive may be configured to cause the protective coating to contrast (e.g., visibly, etc.) with features or components that are exposed beyond a periphery of the protective coating. Additives that provide other characteristics are also disclosed. In addition, methods for applying protective coatings according to this disclosure are disclosed, as are inspection methods.

Abstract: Protective coatings with one or more additives dispersed therethrough are disclosed. A protective coating may comprise a poly(p-xylylene), or parylene. An additive may be configured to cause the protective coating to contrast (e.g., visibly, etc.) with features or components that are exposed beyond a periphery of the protective coating. Additives that provide other characteristics are also disclosed. In addition, methods for applying protective coatings according to this disclosure are disclosed, as are inspection methods.

Abstract: A protective coating for an electronic device, such as a coating that is substantially impermeable to moisture and oxygen, comprises an ultra-thin film comprising a plurality of sub-layers formed by atomic layer deposition (ALD) processes. Low temperature ALD processes may be used to form the sub-layers of the protective coating. The density of the protective film may be enhanced with energy, to which the protective coating or sub-layers thereof may be exposed during deposition or intermittently during the deposition process. ALD apparatuses that are equipped to perform the disclosed processes are also disclosed, as are electronic devices that include the disclosed protective coatings.