Patents by Inventor Sebastiaan Maria Johannes Cornelissen
Sebastiaan Maria Johannes Cornelissen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9494875Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.Type: GrantFiled: September 19, 2012Date of Patent: November 15, 2016Assignee: ASML Netherlands B.V.Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will
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Publication number: 20140253900Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.Type: ApplicationFiled: September 19, 2012Publication date: September 11, 2014Applicant: ASML Netherlands B.V.Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will
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Patent number: 8481978Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: GrantFiled: April 8, 2011Date of Patent: July 9, 2013Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 8138486Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: GrantFiled: November 6, 2009Date of Patent: March 20, 2012Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen, Bob Streefkerk
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Publication number: 20110183257Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: ApplicationFiled: April 8, 2011Publication date: July 28, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hans JANSEN, Sebastiaan Maria Johannes CORNELISSEN, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Hernes JACOBS, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Bob STREEFKERK, Jan-Gerard Cornelis VAN DER TOORN, Peter SMITS, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
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Publication number: 20110090474Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: ApplicationFiled: December 29, 2010Publication date: April 21, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hans JANSEN, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 7928407Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: GrantFiled: November 22, 2006Date of Patent: April 19, 2011Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 7755742Abstract: A lithographic apparatus is disclosed in which a circular sensor is mounted to a substrate table with three leaf springs that are evenly spaced around a thermal axis of the sensor. The leaf springs are provided in two parts that are releasably attachable to each other. The leaf springs are elastic and allow some movement of the sensor relative to the substrate table on thermal expansion and contraction but ensure that the thermal center of the sensor does not move relative to the substrate table.Type: GrantFiled: October 11, 2005Date of Patent: July 13, 2010Assignee: ASML Netherlands B.V.Inventors: Sebastiaan Maria Johannes Cornelissen, Martinus Agnes Willem Cuijpers, Cornelis Christiaan Ottens, Peter Smits, Johannes Antonius Maria Van De Wal
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Patent number: 7679720Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.Type: GrantFiled: February 1, 2008Date of Patent: March 16, 2010Assignee: ASML Netherlands B.V.Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig-Schmidt, Harmen Klaas Van der Schoot, Rob Jansen
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Patent number: 7633073Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: GrantFiled: November 23, 2005Date of Patent: December 15, 2009Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen, Bob Streefkerk
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Publication number: 20090168042Abstract: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described.Type: ApplicationFiled: December 1, 2008Publication date: July 2, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Roger Johannes Maria Hubertus Kroonen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Fransiscus Mathijs Jacobs, Gerardus Arnoldus Hendricus Franciscus Janssen, Reinder Wietse Roos, Mattijs Hogeland
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Publication number: 20090168037Abstract: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.Type: ApplicationFiled: December 1, 2008Publication date: July 2, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Roger Johannes Maria Hubertus Kroonen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Ronald Van Der Ham, Niek Jacobus Johannes Roset, Fransiscus Mathijs Jacobs, Michel Riepen, Gerardus Arnoldus Hendricus Fanciscus Janssen, Reinder Wietse Roos, Mattijs Hogeland
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Publication number: 20080174750Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.Type: ApplicationFiled: February 1, 2008Publication date: July 24, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig-Schmidt, Harmen Klaas Van Der Schoot, Rob Jansen
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Patent number: 7359032Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.Type: GrantFiled: August 25, 2004Date of Patent: April 15, 2008Assignee: ASML Netherlands B.V.Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Harmen Klaas Van Der Schoot, Rob Jansen
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Patent number: 7184128Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, a support surface having an edge, and a support structure for supporting an object to be moved across the beam of radiation. The support structure is moveably supported on the support surface. The apparatus also includes a rim that is associated with the support surface. The support structure and the rim are configured to allow the support structure to move in a first direction toward the rim and collide with the rim. A total force generated by the collision on the support structure is at least partially directed away from a second direction that is opposite to the first direction.Type: GrantFiled: June 25, 2004Date of Patent: February 27, 2007Assignee: ASML Netherlands B.V.Inventors: Henricus Gerardus Tegenbosch, Sebastiaan Maria Johannes Cornelissen
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Patent number: 7072025Abstract: A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.Type: GrantFiled: May 2, 2005Date of Patent: July 4, 2006Assignee: ASML Netherlands B.V.Inventors: Henrikus Herman Marie Cox, Robertus Nicodemus Jacobus Van Ballegoij, Petrus Matthijs Henricus Vosters, Sven Antoin Johan Hol, Sebastiaan Maria Johannes Cornelissen
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Patent number: 6906786Abstract: A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.Type: GrantFiled: June 5, 2003Date of Patent: June 14, 2005Assignee: ASML Netherlands B.V.Inventors: Henrikus Herman Marie Cox, Robertus Nicodemus Jacobus Van Ballegoij, Petrus Matthijs Henricus Vosters, Sven Antoin Johan Hol, Sebastiaan Maria Johannes Cornelissen
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Publication number: 20040008331Abstract: A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.Type: ApplicationFiled: June 5, 2003Publication date: January 15, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Henrikus Herman Marie Cox, Robertus Nicodemus Jacobus Van Ballegoij, Petrus Matthijs Henricus Vosters, Sven Antoin Johan Hol, Sebastiaan Maria Johannes Cornelissen