Patents by Inventor Sebastiaan Smit

Sebastiaan Smit has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate positioning system, lithographic apparatus and device manufacturing method
    Patent number: 9470988
    Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.
    Type: Grant
    Filed: October 17, 2013
    Date of Patent: October 18, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Albert Johannes Maria Jansen, Andre Bernardus Jeunink, Johannes Mathias Theodorus Antonius Adriaens, Frank Auer, Peterjan Broomans, Suzanne Johanna Antonetta Geertruda Cosijns, Willem Herman Gertruda Anna Koenen, Sebastiaan Smit, Joris Wilhelmus Henricus Vermunt
  • SUBSTRATE POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150277242
    Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.
    Type: Application
    Filed: October 17, 2013
    Publication date: October 1, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Albert Johannes Maria Jansen, Andre Bernardus Jeunink, Johannes Mathias Theodorus Antonius Adriaens, Frank Auer, Peterjan Broomans, Suzanne Johanna Antonetta Geertruda Cosijns, Willem Herman Gertruda Anna Koenen, Sebastiaan Smit, Joris Wilhelmus Henricus Vermunt