Abstract: The invention relates to a system for temperature control of an electrode. The system comprises at least one heat pipe, a coupling element and a temperature control apparatus. In this case, the heat pipe is suitable for being arranged in the electrode at least in part and by means of at least one first end. The coupling element is suitable for heating or cooling a second end of the heat pipe, while the temperature control apparatus is suitable for heating or cooling the coupling element. In this case, the electrode and the temperature control apparatus are galvanically separated from one another. The invention further relates to a treatment facility comprising a treatment chamber and at least one electrode inside the treatment chamber and at least one system of this kind for temperature control of an electrode.

Abstract: The invention relates to an apparatus for transporting a substrate into or out of a treatment apparatus, to a treatment apparatus, to a method of processing a substrate and to a treatment system having a movement arrangement for moving such an apparatus for transporting a substrate. In this case, the apparatus for transporting a substrate has a substrate carrier that includes a horizontally extending holding area and one or a plurality of gripping arms. The holding area is even and uniform on a first surface facing the substrate, the shape of said holding area substantially corresponding to the shape of the substrate and the area size of said holding area being substantially the same as the area size of the substrate, the substrate being held with its rear side on the holding area merely by its weight.

Abstract: A substrate carrier includes a substrate carrier plate having a front-sided substrate carrier surface on which at least one substrate receiving area is provided for receiving a respective substrate. The substrate carrier is intended to enable a secure support of the substrate and a simple, damage-free removal of the substrate from the substrate carrier when operating in a fast manner, preferably without impairment of the characteristics of the substrate or the substrate processing. Therefore, the substrate receiving area has an interior area and an exterior area running around the interior area. The exterior area has spaced plateaus which are raised compared to a surface of the interior area for the support of edge areas of the substrates. Ventilation channels are provided between the plateaus.

Abstract: A process module includes at least one evacuable process chamber in the process module and at least one support device horizontally moveable through the process module in at least one substrate transport direction for respectively accommodating at least one flat substrate to be processed in the process chamber. The process module allows consistent and high-quality processing of all substrates at high production speed and at the lowest device costs possible. In the process module the at least one process chamber is physically closeable with respect to the process module by the support device, the position of which is changeable in at least one closing direction transverse to the substrate transport direction and the at least one support device forms a bottom of the at least one process chamber.