Abstract: A method of fabrication of Ni electrodes by hydrogen bubbles dynamic templated electrodeposition of Ni on a substrate, the method comprising one of: i) selecting a current, and selecting an electrodeposition time at the selected current according to a deposit target thickness on the substrate; and ii) selecting an electrodeposition time, and selecting a current during the selected electrodeposition time according to the deposit target thickness on the substrate. The dynamic hydrogen bubble templated Ni films comprises micrometer-sized pores at a surface thereof, and pore walls having a cauliflower-like secondary structure.

Abstract: A method comprising forming a mesoporous conductive layer and depositing a capacitive material within pores of the mesoporous conductive layer through a thickness of the mesoporous conductive layer. The mesoporous conductive layer may be formed by physical deposition or electrodeposition of gold, platinum or titanium, and the capacitive material may be Ru, Ni, Fe, Co, Ir or Mn, yielding a mesoporous electrode. Two such electrodes may be assembled using a solid electrolyte, yielding an all-solid-state supercapacitor. The mesoporous conductive layer may be deposited on a substrate provided with an interdigitated electrode resin mask, and the resin mask removed after depositing the capacitive material within pores of the mesoporous conductive layer, to yield interdigitated electrodes.

Abstract: A method for preparation of highly porous and preferentially-oriented {100} platinum on a substrate by electrodeposition in a deposition bath, comprising using a deposition potential Edep lower than ERHE+150 mV and an acidified platinum salt solution having a Pt salt concentration less than 5.0 mmole L?1 or, in presence of hydrogen, comprising limiting the concentration of Pt salts in the electrolyte to less than 5.0 mmole L?1 and controlling the temperature of the electrolyte. Preferentially-oriented {100} platinum nanowires and thin films, comprising Pt{100} in a range between about 20 and about 60% and having a roughness factor of at least 50 are produced.

Abstract: A method for preparation of highly porous and preferentially-oriented {100} platinum on a substrate by electrodeposition in a deposition bath, comprising using a deposition potential Edep lower than ERHE+150 mV and an acidified platinum salt solution having a Pt salt concentration less than 5.0 mmole L?1 or, in presence of hydrogen, comprising limiting the concentration of Pt salts in the electrolyte to less than 5.0 mmole L?1 and controlling the temperature of the electrolyte. Preferentially-oriented {100} platinum nanowires and thin films, comprising Pt{100} in a range between about 20 and about 60% and having a roughness factor of at least 50 are produced.