Patents by Inventor Sebastien Munari

Sebastien Munari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7370482
    Abstract: The cryogenic trap of the invention comprises, in a hollow body (3) having an access valve (2) and an outlet valve (6), a cold core (11) associated with a plate (13) having low thermal inertia and movable between a trapping position in contact with the cold core (11), and a regeneration position spaced apart from the cold core (11) and in contact with a heater ring (14). The plate (13) is in contact with gases to be trapped, and prevents them from passing to the cold core (11). Regeneration requires heating only of the plate (13) carrying the condensed and solidified gases, and it is therefore more rapid.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: May 13, 2008
    Assignee: Alcatel
    Inventors: Jean-Pierre Desbiolles, Gloria Sogan, Sébastien Munari, Emmanuelle Veran
  • Publication number: 20050235656
    Abstract: The cryogenic trap of the invention comprises, in a hollow body (3) having an access valve (2) and an outlet valve (6), a cold core (11) associated with a plate (13) having low thermal inertia and movable between a trapping position in contact with the cold core (11), and a regeneration position spaced apart from the cold core (11) and in contact with a heater ring (14). The plate (13) is in contact with gases to be trapped, and prevents them from passing to the cold core (11). Regeneration requires heating only of the plate (13) carrying the condensed and solidified gases, and it is therefore more rapid.
    Type: Application
    Filed: May 30, 2003
    Publication date: October 27, 2005
    Inventors: Jean-Pierre Desbiolles, Gloria Sogan, Sebastien Munari, Emmanuelle Veran
  • Publication number: 20050025634
    Abstract: A gas pumping system of the invention enables gas to be pumped from a process chamber (1) in order to regulate its pressure as a function of process steps. The system comprises a primary pump (2), a secondary pump (8), an inert gas injection device (6), and a regulator valve (4). The primary and/or secondary pump (2 and/or 8) is controlled in speed in order to regulate variations of greater amplitude. The regulator valve (4) is controlled in opening in order to regulate variations that are small amplitude and fast. The inert gas injection (6) is controlled in flow rate in order to regulate medium amplitude variations. This provides great reaction stability and a wide range of possible variation for the conditions in the process chamber (1).
    Type: Application
    Filed: May 7, 2004
    Publication date: February 3, 2005
    Inventors: Roland Bernard, Jean-Pierre Desbiolles, Sebastien Munari, Claude Rousseau