Patents by Inventor Sebastjan Glinsek

Sebastjan Glinsek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250048933
    Abstract: A process for manufacturing a MIM structure with a thick film of PZT material. The PZT material is deposited on a substrate by alternative deposition between a PZT slurry and a PZT solution. Additionally, a haptic device comprising a MIM actuator manufactured with such a process.
    Type: Application
    Filed: December 20, 2022
    Publication date: February 6, 2025
    Inventors: Emmanuel DEFAY, Sebastjan GLINSEK, Song LONGFEI
  • Patent number: 12194751
    Abstract: An only inkjet-printing-based process for depositing functional materials, in various instances PZT, Bi-based material or (K,Na)-based material, on a substrate, in various instances platinized silicon. Substrate templating (via SAMs) and material deposition are both performed by an inkjet printing process. Additionally, a composition to be used as a SAM precursor ink which is a thiol in a solvent mixture. Further, a cartridge for a printing machine with such a composition. Still further, the use of such a cartridge, alone, or as a kit with another cartridge containing a precursor of the functional material, in particular to perform both steps of the printing method. Finally, a product, for instance a microsystem, obtained by the process.
    Type: Grant
    Filed: October 24, 2019
    Date of Patent: January 14, 2025
    Assignee: LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
    Inventors: Nicolas Godard, Daniele Sette, Sebastjan Glinsek, Emmanuel Defay
  • Publication number: 20240088202
    Abstract: A material deposition method comprising: providing a substrate; forming a film of HfO2 by chemical solution deposition, CSD, on the substrate; depositing a solution of PbTiO3 on the film of HfO2; depositing a layer of Pb(Zrx,Ti1-x)O3 on the seed layer, where O?x?1; and forming interdigitated electrodes on the Pb(Zrx,Ti1-x)O 3 layer. Also a ferroelectric microsystem obtained by this deposition method. Experiments show an improved fatigue resistance for such a microsystem.
    Type: Application
    Filed: January 13, 2022
    Publication date: March 14, 2024
    Inventors: Naveen ARUCHAMY, Torsten GRANZOW, Emmanuel DEFAY, Sebastjan GLINSEK
  • Publication number: 20230247906
    Abstract: A material deposition method comprising: preparing a precursor solution of Pb(Zrx,Ti1-x)O3 using 1-methoxy-2-propanol as a solvent and acetylacetone as a modifier; and forming a seed layer for a electroactive film by spin coating the precursor solution on a substrate. The electroactive film can be PZT, PZO or BFO, spin-coated or inkjet printed on the seed layer. Experience shows pure orientation for the piezoelectric film thanks to the use of 1-methoxy-2-propanol when preparing the seed layer. This orientation is attributed to the formation of nano crystals on the seed layer constituting a pre-crystallization.
    Type: Application
    Filed: June 25, 2021
    Publication date: August 3, 2023
    Inventors: Nicolas GODARD, Sebastjan GLINSEK, Alfredo BLAZQUEZ MARTINEZ, Emmanuel DEFAY
  • Publication number: 20230077545
    Abstract: A piezoelectric device comprising a transparent substrate; a transparent barrier layer on the substrate; a transparent piezoelectric layer on the transparent barrier layer; a transparent layer of interdigitated electrodes on the transparent piezoelectric layer; wherein the piezoelectric device further comprises a transparent dielectric layer at least on the portion of piezoelectric layer that is between successive fingers of the transparent layer of interdigitated electrodes, the transparent dielectric layer having a refractive index lower than a refractive index of the transparent layer of interdigitated electrodes and a dielectric strength superior to 3 MV/m.
    Type: Application
    Filed: January 22, 2021
    Publication date: March 16, 2023
    Inventors: Emmanuel DEFAY, Stéphanie GIROD, Sebastjan GLINSEK, Aymen MAHJOUB
  • Patent number: 11299646
    Abstract: An inkjet-printing-base process for depositing functional materials, for example PZT, on a substrate, in various instances platinized silicon. Substrate templating (via SAMs) and material deposition are both performed by an inkjet printing process. Additionally, a composition to be used as a SAM precursor ink which is a thiol in a solvent mixture, wherein the composition can be 1 dodecanethiol in a solvent mixture of 2-methoxyethanol and glycerol.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: April 12, 2022
    Assignee: Luxembourg Institute of Science And Technology (LIST)
    Inventors: Nicolas Godard, Daniele Sette, Sebastjan Glinsek, Emmanuel Defay
  • Publication number: 20210379898
    Abstract: An only inkjet-printing-based process for depositing functional materials, in various instances PZT, Bi-based material or (K,Na)-based material, on a substrate, in various instances platinized silicon. Substrate templating (via SAMs) and material deposition are both performed by an inkjet printing process. Additionally, a composition to be used as a SAM precursor ink which is a thiol in a solvent mixture. Further, a cartridge for a printing machine with such a composition. Still further, the use of such a cartridge, alone, or as a kit with another cartridge containing a precursor of the functional material, in particular to perform both steps of the printing method. Finally, a product, for instance a microsystem, obtained by the process.
    Type: Application
    Filed: October 24, 2019
    Publication date: December 9, 2021
    Inventors: Nicolas GODARD, Daniele SETTE, Sebastjan GLINSEK, Emmanuel DEFAY
  • Publication number: 20210155817
    Abstract: An inkjet-printing-base process for depositing functional materials, for example PZT, on a substrate, in various instances platinized silicon. Substrate templating (via SAMs) and material deposition are both performed by an inkjet printing process. Additionally, a composition to be used as a SAM precursor ink which is a thiol in a solvent mixture, wherein the composition can be 1 dodecanethiol in a solvent mixture of 2-methoxyethanol and glycerol.
    Type: Application
    Filed: April 27, 2018
    Publication date: May 27, 2021
    Inventors: Nicolas Godard, Daniele Sette, Sebastjan Glinsek, Emmanuel Defay