Abstract: Structures having stacked transistors with backside access are described. In an example, an integrated circuit structure includes a front side structure. The front side structure includes a device layer including first, second, third and fourth stacks of nanowires and corresponding first, second, third and fourth overlying gate lines, and the device layer including first, second, third, fourth and fifth source or drain structures and corresponding overlying trench contacts alternating with the stacks of nanowires and the overlying gate lines, and one or more metallization layers above the device layer. A backside structure includes a backside via connection coupled to a bottom portion of the third source or drain structure, the bottom portion of the third source or drain structure isolated from a top portion of the third source or drain structure.

Abstract: An apparatus includes a first write bit line (WBL), a first P-channel metal oxide semiconductor (PMOS) transistor including a source coupled to the WBL, a first inverter including an input coupled to a drain of the first PMOS transistor, and a second PMOS transistor including a source coupled to an output of the first inverter. The first PMOS transistor and the second PMOS transistor are disposed in at least one PMOS layer configured between a first metal layer and a second metal layer. The register file circuit further includes a first via connecting a gate of the first PMOS transistor and a gate of the second PMOS transistor in the at least one PMOS layer to the first metal layer.

Abstract: Embodiments herein relate to a three-transistor gain cell which is provided using a complementary field-effect transistor device to achieve scaling. The cell includes an n-type layer arranged above a p-type layer. In one implementation, two nMOS transistors are arranged above one pMOS transistor and a conductive path is provided to connect the gate of one of the nMOS transistors to a storage node in the p-type layer, where the storage node is coupled to a drain of the pMOS transistor. In another implementation, one nMOS transistor is arranged above two pMOS transistors and a conductive path is provided to connect the gate of one of the pMOS transistors to a storage node in the n-type layer, where the storage node is coupled to a source of the nMOS transistor.

Abstract: An apparatus, system, and method for register file circuits are provided. A register file circuit can include a first write bit line (WBL), a first P-channel metal oxide semiconductor (PMOS) transistor including a source coupled to the WBL, a first inverter including an input coupled to a drain of the first PMOS transistor, a second PMOS transistor including a source coupled to an output of the first inverter, and a second WBL (WBLB) coupled to a drain of the second PMOS transistor. 1R1W register file and 2R1W register file designs are provided.

Abstract: Embodiments herein relate to scaling of Static Random Access Memory (SRAM) cells. An SRAM cell include nMOS transistors on one level above pMOS transistors on a lower level. Transistors on the two levels can have overlapping footprints to save space. Additionally, the SRAM cell can use pMOS access transistors in place of nMOS access transistors to allow reuse of areas of the cell which would otherwise be used by the nMOS access transistors. In one approach, gate interconnects are provided in these areas, which have an overlapping footprint with underlying pMOS access transistors to save space. The SRAM cells can be connected to bit lines and word lines in overhead and/or bottom metal layers. In another aspect, SRAM cells of a column are connected to bit lines in an overlying M0 metal layer and an underlying BM0 metal layers to reduce capacitance.

Abstract: Techniques are provided herein to form semiconductor devices having conductive backside structures to couple various transistor structures. In some embodiments, a given conductive backside structure acts as a shunt interconnect between two transistors, such as between the gate of one transistor and the source or drain region of another transistor. In an example, an integrated circuit includes two transistor devices having semiconductor material extending between separate source and drain regions and different gate structures over or around the semiconductor material of the two transistor devices. A conductive backside structure may be formed from the backside of the integrated circuit (e.g., after removing all or most of the substrate), where the backside structure contacts the source or drain region of one transistor and the gate structure of the other transistor.