Abstract: A manufacturing method of a wire grid polarizer includes the steps of: preparing a mold; sequentially forming a metal foil and a polymer on a substrate; molding a polymer by using the mold; etching the metal foil by using the molded polymer, and forming a wire grid pattern; and removing the polymer.

Abstract: A lithography apparatus is provided. The apparatus includes: a stage, a first light source unit, an optical system, an image obtaining means, an image edit means, an LC panel, and a second light source unit. The LC panel is coupled with the optical system and receives a signal of the image edited by the image edit means and displays the received image to perform a photo mask function. The second light source unit provides light used in performing an exposure on the test material using the imaged displayed on the LC panel for a photo mask.

Abstract: The present invention provides a flexible wire grid polarizer used in a visible ray band and a fabricating method thereof. The present invention includes the steps of forming a non-adhesive layer on an inner area of a lower substrate, forming a flexible polymer substrate on the lower substrate including the non-adhesive layer, forming a thin metal layer on the flexible polymer substrate, forming a metal grid pattern by etching the thin metal layer, dicing a wafer staying within a boundary of the non-adhesive layer on the lower substrate, and separating the lower substrate including the non-adhesive layer from the diced wafer to complete the flexible wire grid polarizer.

Abstract: A manufacturing method of a wavelength filter includes the steps of: depositing on a substrate a lower clad layer and a core layer, each made from a polymer material; compressing the core layer with a mold to lithograph a pattern of the mold onto the core layer; stabilizing the lower clad layer and the core layer; separating the core layer from the mold; forming an upper clad layer on the core layer; and forming an electrode on the upper clad layer.