Patents by Inventor Seigo Ono
Seigo Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220411812Abstract: The present invention provides a method for improving salt tolerance of a plant so as to enable the plant to be cultivated under a high salt concentration condition. The present invention discloses a method for improving salt tolerance of a plant, including suppressing or inhibiting a function of PERK13 (Proline-rich extensin-like receptor kinase 13) in a plant; the method for improving salt tolerance of a plant, wherein an antagonist of PERK13 is brought into contact with a root of the plant; the method for improving salt tolerance of a plant, wherein the antagonist is one or more species of microorganisms or a secretion therefrom; and the method for improving salt tolerance of a plant, wherein the suppression of the function of the PERK13 is carried out by suppressing expression of PERK13 gene, or the inhibition of the function of the PERK13 is carried out by inhibiting expression of PERK13 gene.Type: ApplicationFiled: June 15, 2022Publication date: December 29, 2022Applicant: SEKISUI CHEMICAL CO., LTD.Inventors: Seigo ONO, Zenpei SHIMATANI
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Patent number: 11363820Abstract: The present invention provides a screening method for selecting plant symbiotic microorganisms enabling plant growth under abiotic stress and/or biotic stress, a microbial mixture of microorganisms which are selected from nature by the method and enables a plant to grow under salinity stress and/or hyperosmotic stress in symbiosis with the plant. Specifically, the present invention provides a screening method for selecting plant symbiotic microorganisms, comprising a first screening step of allowing at least one plant to grow for a predetermined period of time while being partially soaked in a solution containing a microbial mixture under abiotic stress and/or biotic stress, and collecting microorganisms adhering to grown plant to thereby select out the microorganisms as plant symbiotic microorganisms enabling plant growth under the stress.Type: GrantFiled: December 8, 2017Date of Patent: June 21, 2022Assignee: SEKISUI CHEMICAL CO., LTD.Inventor: Seigo Ono
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Patent number: 11343984Abstract: A hydroponic system (1) using seawater, wherein seawater (W1) is used for hydroponic cultivation of salt-tolerant plants, including a water supply pump (21) that pumps up, from the sea (S), seawater (W1) having a salinity, a bacteria content and an unwanted matter content are less than or equal to predetermined threshold values; a water tub (30) that stores seawater (W1) pumped up by the water supply pump (21) and accommodates salt-tolerant plants (P) to be cultivated; and a filter (27) that removes bacteria and unwanted matter from the seawater (W1) obtained from the sea (S); wherein the seawater (W1) from which the bacteria and the unwanted matter have been removed by the filter (27) is fed to the water tub (30).Type: GrantFiled: February 27, 2017Date of Patent: May 31, 2022Assignee: SEKISUI CHEMICAL CO., LTD.Inventors: Toshimasa Takeuchi, Setsuo Nakajima, Seigo Ono, Koichiro Iwasa, Makoto Fujigami
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Patent number: 11330774Abstract: The present invention provides a plant cultivation method, which enables plant cultivation under high salinity environment for a long time. A method for hydroponic plant cultivation under high salinity environment, comprising a cultivation step of hydroponically growing a plant with a cultivation solution having a sodium chloride concentration of 1% by mass or more, during which a salt resistance imparting treatment is performed at least once by bringing a salt tolerance imparting agent into contact with at least a part of a root of the plant, thereby maintaining salt tolerance of the plant.Type: GrantFiled: December 14, 2016Date of Patent: May 17, 2022Assignee: SEKISUI CHEMICAL CO., LTD.Inventors: Seigo Ono, Toshimasa Takeuchi, Setsuo Nakajima, Koichiro Iwasa, Makoto Fujigami
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Publication number: 20200359577Abstract: A method for controlling a serine content of a solanaceous plant, comprising performing cultivation of a solanaceous plant using a cultivation solution containing sodium chloride, while adjusting one or both of concentration of sodium chloride in the cultivation solution and number of days for performing the cultivation using the cultivation solution.Type: ApplicationFiled: September 28, 2018Publication date: November 19, 2020Applicant: SEKISUI CHEMICAL CO., LTD.Inventors: Seigo ONO, Hiroaki GOTOU
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Publication number: 20200245576Abstract: The present invention provides a plant cultivation method, which enables plant cultivation under high salinity environment for a long time. A method for hydroponic plant cultivation under high salinity environment, comprising a cultivation step of hydroponically growing a plant with a cultivation solution having a sodium chloride concentration of 1% by mass or more, during which a salt resistance imparting treatment is performed at least once by bringing a salt tolerance imparting agent into contact with at least a part of a root of the plant, thereby maintaining salt tolerance of the plant.Type: ApplicationFiled: December 14, 2016Publication date: August 6, 2020Applicant: SEKISUI CHEMICAL CO., LTD.Inventors: Seigo ONO, Toshimasa TAKEUCHI, Setsuo NAKAJIMA, Koichiro IWASA, Makoto FUJIGAMI
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Publication number: 20190343055Abstract: The hydroponic cultivation apparatus (1) of the present invention includes a container (10), a cover (50), a nutrient solution supply unit (20) for supplying a nutrient solution (W) to a hollow portion (12s) of the container (10), and a water level adjuster (60). The container (10) is formed in a tubular shape. The cover (50) has a size such that the cover (50) can protect rhizosphere (R) and cover the opening (14) of the container (10). The water level adjuster (60) is connected to the container (10) and enables adjustment of the water level of the nutrient solution (W) in the hollow portion (12s).Type: ApplicationFiled: February 2, 2018Publication date: November 14, 2019Applicant: SEKISUI CHEMICAL CO., LTD.Inventors: Motohiro SAKAKIBARA, Akiko TOGI, Naoki NISHIGUCHI, Seigo ONO, Hiroaki GOTOU
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Publication number: 20190345508Abstract: The present invention provides a method for improving salt tolerance of a plant so as to enable the plant to be cultivated under a high salt concentration condition. The present invention discloses a method for improving salt tolerance of a plant, including suppressing or inhibiting a function of PERK13 (Proline-rich extensin-like receptor kinase 13) in a plant; the method for improving salt tolerance of a plant, wherein an antagonist of PERK13 is brought into contact with a root of the plant; the method for improving salt tolerance of a plant, wherein the antagonist is one or more species of microorganisms or a secretion therefrom; and the method for improving salt tolerance of a plant, wherein the suppression of the function of the PERK13 is carried out by suppressing expression of PERK13 gene, or the inhibition of the function of the PERK13 is carried out by inhibiting expression of PERK13 gene.Type: ApplicationFiled: June 24, 2019Publication date: November 14, 2019Applicant: SEKISUI CHEMICAL CO., LTD.Inventors: Seigo ONO, Zenpei SHIMATANI
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Publication number: 20190297894Abstract: The present invention provides a screening method for selecting plant symbiotic microorganisms enabling plant growth under abiotic stress and/or biotic stress, a microbial mixture of microorganisms which are selected from nature by the method and enables a plant to grow under salinity stress and/or hyperosmotic stress in symbiosis with the plant. Specifically, the present invention provides a screening method for selecting plant symbiotic microorganisms, comprising a first screening step of allowing at least one plant to grow for a predetermined period of time while being partially soaked in a solution containing a microbial mixture under abiotic stress and/or biotic stress, and collecting microorganisms adhering to grown plant to thereby select out the microorganisms as plant symbiotic microorganisms enabling plant growth under the stress.Type: ApplicationFiled: December 8, 2017Publication date: October 3, 2019Applicant: SEKISUI CHEMICAL CO., LTD.Inventor: Seigo ONO
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Publication number: 20190223401Abstract: A plant corresponding to an item described in Standard Tables of Food Composition in Japan 2015 (Seventh Revised Version) and having a mass content of sodium which is at least 50 times a mass content of sodium of the item described in the Standard Tables of Food Composition in Japan 2015 (Seventh Revised Version), the mass content of sodium being measured per unit mass of edible portion of the plant.Type: ApplicationFiled: September 19, 2017Publication date: July 25, 2019Applicant: SEKISUI CHEMICAL CO., LTD.Inventors: Motohiro SAKAKIBARA, Akiko TOGI, Seigo ONO, Naoki NISHIGUCHI, Hiroaki GOTOU
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Publication number: 20190169631Abstract: The present invention provides a method for improving salt tolerance of a plant so as to enable the plant to be cultivated under a high salt concentration condition. The present invention discloses a method for improving salt tolerance of a plant, including suppressing or inhibiting a function of PERK13 (Proline-rich extensin-like receptor kinase 13) in a plant; the method for improving salt tolerance of a plant, wherein an antagonist of PERK13 is brought into contact with a root of the plant; the method for improving salt tolerance of a plant, wherein the antagonist is one or more species of microorganisms or a secretion therefrom; and the method for improving salt tolerance of a plant, wherein the suppression of the function of the PERK13 is carried out by suppressing expression of PERK13 gene, or the inhibition of the function of the PERK13 is carried out by inhibiting expression of PERK13 gene.Type: ApplicationFiled: June 15, 2017Publication date: June 6, 2019Applicant: SEKISUI CHEMICAL CO., LTD.Inventors: Seigo ONO, Zenpei SHIMATANI
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Publication number: 20190037788Abstract: A hydroponic system (1) using seawater, wherein seawater (W1) is used for hydroponic cultivation of salt-tolerant plants, including a water supply pump (21) that pumps up, from the sea (S), seawater (W1) having a salinity, a bacteria content and an unwanted matter content are less than or equal to predetermined threshold values; a water tub (30) that stores seawater (W1) pumped up by the water supply pump (21) and accommodates salt-tolerant plants (P) to be cultivated; and a filter (27) that removes bacteria and unwanted matter from the seawater (W1) obtained from the sea (S); wherein the seawater (W1) from which the bacteria and the unwanted matter have been removed by the filter (27) is fed to the water tub (30).Type: ApplicationFiled: February 27, 2017Publication date: February 7, 2019Applicant: SEKISUI CHEMICAL CO., LTD.Inventors: Toshimasa TAKEUCHI, Setsuo NAKAJIMA, Seigo ONO, Koichiro IWASA, Makoto FUJIGAMI
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Publication number: 20130109072Abstract: A support for enzyme immobilization is described, which is for immobilizing enzymes of various molecular sizes and also for, due to the modification of the surface silanol groups of porous silica particles, for immobilizing various kinds of enzymes, and enables the design of an immobilized enzyme, which exhibits an activity equivalent to that of the corresponding non-immobilized enzyme and withstands repeated use. A method for producing the support is also described. The support includes porous silica particles having an interparticle void structure therein, characterized in that the porous silica particles have a specific average particle size, a specific surface area, a specific pore volume, a specific pore size distribution and a specific porosity and have a substituent containing an organic group or an amino group on the surface thereof. An immobilized protein obtained by immobilizing a protein on the above support is also described.Type: ApplicationFiled: June 8, 2011Publication date: May 2, 2013Applicants: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, JGC CORPORATIONInventors: Tatsuo Tsunoda, Takayuki Nara, Seigo Ono, Chisato Sekikawa, Fujio Mizukami, Shuzo Kojima, Naoki Tahara, Hideaki Togashi, Miki Egami
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Patent number: 8425212Abstract: Flowmeter with a pair of helical gears using an oval pitch curve as a reference rack tooth profile. The tooth height ratio of the reference rack tooth profile is ?/4. The reference rack tooth profile is an oval pitch curve of two or less leaves. The moving radius of the oval pitch curve is expressed by ?=a/(1?b cos n?), where ? is a moving radius which is a distance between the center of rotation and the oval pitch curve, “a” is a similarity factor, “b” is a degree of flatness, n (n?2) is the number of leaves, and ? is an argument. The tooth height ratio is h=a/(1?b)?g0, where g0 is a distance between poles of the oval pitch curve and pitch line, wherein g0=a cos ?0/(1?b cos n?0). Values for the similarity factor “a”, degree of flatness “b”, and distance g0 are determined so that the tooth height ratio may be ?m/4.Type: GrantFiled: May 23, 2008Date of Patent: April 23, 2013Assignee: Oval CorporationInventors: Seigo Ono, Katsuichi Uchida
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Patent number: 7870785Abstract: A position displacement flowmeter having a pair of non-circular gears in a rolling contact on a pitch line without slippage. The positive displacement flowmeter comprises a casing and a pair of rotors provided in the casing and rotatable around its center axes. The pair of rotors, have a tooth profile curve which is an oval pitch curve itself having a trajectory of contact points on the pitch line, and they satisfy a condition of r1+r2=K=const r1 d?1=r2 d?2, and a moving radius of the oval pitch curve is given by ri=a/(1?b cos n?i) (i=1, 2), where “ri (i=1, 2)” is the moving radius that is a distance from a center of rotation to the oval pitch curve, “a” is a homothetic coefficient, “b” is a flattening, “n” is a number of lobes, and “?i (i=1, 2) is a moving angle.Type: GrantFiled: March 6, 2008Date of Patent: January 18, 2011Assignee: Oval CorporationInventors: Seigo Ono, Katsuichi Uchida
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Publication number: 20100307234Abstract: An ideal positive displacement flowmeter which has a pair of helical gears given by using oval pitch curve as reference rack tooth profile, with the tooth height ratio of the reference rack tooth profile even with a small number of teeth being set to ? m/4 which is a logical limit for the tooth height ratio of a one-point continuous contact tooth profile and which has no confinement phenomenon between tooth profiles. The positive displacement flowmeter has a pair of helical gears (1, 2) in a casing (3). The reference rack tooth profile of the pair of helical gears (1, 2) is an oval pitch curve of two or less leaves. The moving radius of the oval pitch curve is expressed by ?=a/(1?b cos n?), where ? is a moving radius which is a distance between the center of rotation and the oval pitch curve, “a” is a similarity factor, “b” is a degree of flatness, n (n?2) is the number of leaves, and ? is an argument.Type: ApplicationFiled: May 23, 2008Publication date: December 9, 2010Applicant: OVAL CORPORATIONInventors: Seigo Ono, Katsuichi Uchida
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Publication number: 20100281970Abstract: A position displacement flowmeter having a pair of non-circular gears in a rolling contact on a pitch line without slippage. The positive displacement flowmeter comprises a casing and a pair of rotors provided in the casing and rotatable around its center axes. The pair of rotors have a tooth profile curve which is an oval pitch curve itself having a trajectory of contact points on the pitch line, and they satisfy a condition of r1+r2=K=const r1 d?1=r2 d?2, and a moving radius of the oval pitch curve is given by ri=a/(1?bcosn?i) (i=1, 2), where “ri(i=1, 2)” is the moving radius that is a distance from a center of rotation to the oval pitch curve, “a” is a homothetic coefficient, “b” is a flattening, “n” is a number of lobes, and “?i(i=1, 2) is a moving angle.Type: ApplicationFiled: March 6, 2008Publication date: November 11, 2010Applicant: Oval CorporationInventors: Seigo Ono, Katsuichi Uchida
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Patent number: 4812829Abstract: A display device comprises a display, an input and a controller. The display displays a three-dimensional image, a vector cursor and a pointing image extending in a direction of movement of the vector cursor. The controller generates a display signal to display the three-dimensional image, vector cursor and pointing image. The controller recognizes the three-dimensional image crossing to the pointing image in response to the pointing signal from the input.Type: GrantFiled: May 11, 1987Date of Patent: March 14, 1989Assignee: Hitachi, Ltd.Inventors: Osamu Ebina, Seigo Ono
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Patent number: 4766423Abstract: A cursor moves at a constant velocity in a constant direction in a display space for displaying a three-dimensional image. When two parameters for representing a direction in a three-dimensional space are entered, the cursor changes its direction according to the entered direction at a rate determined by the entered magnitude. When a parameter for changing the velocity is entered, the cursor velocity is changed. It is not necessary to enter a three-dimensional coordinate to control the cursor to reach the desired position, and the manipulation of the cursor is very much simplified.Type: GrantFiled: January 5, 1987Date of Patent: August 23, 1988Assignee: Hitachi, Ltd.Inventors: Seigo Ono, Osamu Ebina
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Patent number: 4650053Abstract: In a spring type clutch disc, torque is transmitted from a disc plate (2) to a hub (3) through coil springs (12, 13). A slide member (11b, 14) making sliding contact with the hub (3) is interposed between the disc plate (2) and the hub (3). An electroless plate Ni coating is provided on one of the slide member (11b, 14) and the hub (3), while an electroless plate Ni-P-BN coating is provided on the other, so as to stabilize the coefficient of friction of and improve the wear resistance of the slidingly frictional engaging portion therebetween, whereby the first-stage hysteresis torque in the torsional characteristic of the clutch disc is stably maintained at a minimum.Type: GrantFiled: April 1, 1985Date of Patent: March 17, 1987Assignee: Mitsubishi Jidosha Kogyo Kabushiki KaishaInventors: Katsuhiko Kayanoki, Kazuo Teramachi, Seigo Ono, Yasuyuki Hashimoto