Patents by Inventor Seiichi Matsuo

Seiichi Matsuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrodeposition resist film drying method
    Patent number: 5674659
    Abstract: Provided is a method for producing a photoresist film for use in producing a a precision fine process component capable of achieving removal of moisture component and film formation by heating in a short time, forming a resist film having a resolution much finer than that of the conventional method, and easily drying a thin board. The resist film obtained through the electrodeposition coating process is roll-pressed by pressure rolls with heat applied to the film.
    Type: Grant
    Filed: September 27, 1994
    Date of Patent: October 7, 1997
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Seiichi Matsuo, Kouichi Nagata, Shigeharu Tanaka, Makoto Shimizu