Patents by Inventor Seiichi Miyanaga

Seiichi Miyanaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for antistatic treatment of resin and antistatic resin composition
    Patent number: 5879589
    Abstract: The present invention provides a process for the antistatic treatment of a resin which comprises dispersing the following organically-modified layer silicate in a synthetic resin in the state that the following specific state is attained. A novel resin composition is provided, comprising an organically-modified layer silicate compound having a specific volume resistivity of not more than 1.times.10.sup.13 .OMEGA..multidot.cm dispersed in a synthetic resin in a proportion of from 2 to 30 parts by weight based on 100 parts by weight of said synthetic resin in the state that (1) a primary aggregate and/or a secondary aggregate having a short axis length of not more than 500 nm is formed and (2) the average minimum interparticle distance is not more than 500 nm.
    Type: Grant
    Filed: January 31, 1997
    Date of Patent: March 9, 1999
    Assignee: Kao Corporation
    Inventors: Seiichi Miyanaga, Yasuhiro Doi, Kenichi Nishimura, Isao Nishi, Yuzo Sumida
  • Process for producing polymer particles with irregular shape
    Patent number: 5621055
    Abstract: A process for producing polymer particles with an irregular shape by polymerizing a water-soluble polymerizable monomer in a system comprising a hydrophobic organic solvent inert to the polymerization and an aqueous solution of the water-soluble polymerizable monomer, characterized in that the system further contains an anionic surfactant.
    Type: Grant
    Filed: September 19, 1995
    Date of Patent: April 15, 1997
    Assignee: Kao Corporation
    Inventors: Seiichi Miyanaga, Yoshimitsu Ina, Takahide Minami, Takayuki Amiya