Patents by Inventor Seiichi Takasuga

Seiichi Takasuga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6744211
    Abstract: A plasma density information measuring method capable of easily measuring the plasma density information over the long term, a probe for measuring the plasma density information, and a plasma density information measuring apparatus are disclosed. A measuring probe is set such that a tip end of a glass tube of the measuring probe is brought into contact with plasma PM to be measured. High-frequency power sent through a coaxial cable is supplied to the plasma PM from a loop antenna through a wall of the tube, and reflection power of the high-frequency power is received by the loop antenna to obtain a counter frequency variation of reflection coefficient of the high-frequency power. In the obtained reflection coefficient, a portion thereof in which the reflection coefficient is largely reduced is a peak at which strong absorption of high-frequency power is caused due to the plasma density. The plasma density can be obtained from the plasma absorption frequency.
    Type: Grant
    Filed: October 10, 2001
    Date of Patent: June 1, 2004
    Assignees: Nissin Inc., Nagoya University
    Inventors: Hideo Sugai, Seiichi Takasuga, Naoki Toyoda
  • Publication number: 20020047543
    Abstract: A plasma density information measuring method capable of easily measuring the plasma density information over the long term, a probe for measuring the plasma density information, and a plasma density information measuring apparatus are disclosed. A measuring probe is set such that a tip end of a glass tube of the measuring probe is brought into contact with plasma PM to be measured. High-frequency power sent through a coaxial cable is supplied to the plasma PM from a loop antenna through a wall of the tube, and reflection power of the high-frequency power is received by the loop antenna to obtain a counter frequency variation of reflection coefficient of the high-frequency power. In the obtained reflection coefficient, a portion thereof in which the reflection coefficient is largely reduced is a peak at which strong absorption of high-frequency power is caused due to the plasma density. The plasma density can be obtained from the plasma absorption frequency.
    Type: Application
    Filed: October 10, 2001
    Publication date: April 25, 2002
    Applicant: NISSIN INC.
    Inventors: Hideo Sugai, Seiichi Takasuga, Naoki Toyoda
  • Patent number: 6339297
    Abstract: A plasma density information measuring method capable of easily measuring the plasma density information over the long term, a probe for measuring the plasma density information, and a plasma density information measuring apparatus are disclosed. A measuring probe is set such that a tip end of a glass tube of the measuring probe is brought into contact with plasma PM to be measured. High-frequency power sent through a coaxial cable is supplied to the plasma PM from a loop antenna through a wall of the tube, and reflection power of the high-frequency power is received by the loop antenna to obtain a counter frequency variation of reflection coefficient of the high-frequency power. In the obtained reflection coefficient, a portion thereof in which the reflection coefficient is largely reduced is a peak at which strong absorption of high-frequency power is caused due to the plasma density. The plasma density can be obtained from the plasma absorption frequency.
    Type: Grant
    Filed: July 21, 1999
    Date of Patent: January 15, 2002
    Assignees: Nissin Inc., President of Nagoya University
    Inventors: Hideo Sugai, Seiichi Takasuga, Naoki Toyoda
  • Patent number: 6184623
    Abstract: A plasma generating apparatus and a method for controlling plasma-generating high frequency power capable of appropriately and easily controlling plasma density over the long term are disclosed. Measuring high frequency power is supplied to plasma through a dielectric tube. Apart from a supply system of plasma-generating high frequency power, there is provided a plasma density information obtaining section having long lifetime no hot filament. The plasma density information obtaining section obtains the plasma density information by measuring a physical amount related to reflection or absorption of the high frequency power. An actually measured plasma density monitored by the plasma density information obtaining section from moment to moment and a target plasma density held in a plasma density setting section are compared.
    Type: Grant
    Filed: July 21, 1999
    Date of Patent: February 6, 2001
    Assignees: Nissin Inc., Nagoya University
    Inventors: Hideo Sugai, Seiichi Takasuga, Naoki Toyoda