Patents by Inventor Seiichi Teshima

Seiichi Teshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6433231
    Abstract: A method for producing inexpensively in a high yield a halogen-containing aromatic compound, particularly a halogen-containing aromatic compound incorporating therein a bromodifluoroalkyl group, and a halogen-containing naphthalene compound useful as a raw material for a resin excelling in heat resistance, chemical resistance and water repellency, and having a low dielectric constant and a low refractivity are provided.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: August 13, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Seiichi Teshima, Masayoshi Konishi, Kozo Tajiri, Yoshinobu Asako, Sadao Miki
  • Patent number: 6384289
    Abstract: A process is provided which allows a 1,4-bis(difluoroalkyl)benzene derivative to be produced inexpensively by a simple procedure without requiring any special facility. This process comprises causing a compound (A) of the following formula (1): wherein X1, X2, X3, and X4 independently stand for an oxygen or sulfur atom, Y1 and Y2 independently stand for a group of the formula: —CnH2n—, in which n is 2 or 3, k is an integer in the range of 0 to 4, G stands for a halogen group, an alkyl group, a perfluoroalkyl group, or an alkoxy group, and m is an integer in the range of 0 to 4, to react with a fluorine-containing species, the molar ratio of the fluorine-containing species to compound (A) being in the range of 20-40. The process is carried out in the presence of a bromine-containing compound, which is in an amount of 2 to 3 equivalences to the amount of compound (A), in an organic solvent at −80° C. to 30° C.
    Type: Grant
    Filed: January 11, 2001
    Date of Patent: May 7, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Seiichi Teshima, Yoshinobu Asako
  • Publication number: 20010045350
    Abstract: A method for producing inexpensively in a high yield a halogen-containing aromatic compound, particularly a halogen-containing aromatic compound incorporating therein a bromodifluoroalkyl group, and a halogen-containing naphthalene compound useful as a raw material for a resin excelling in heat resistance, chemical resistance and water repellency, and having a low dielectric constant and a low refractivity are provided.
    Type: Application
    Filed: June 21, 2001
    Publication date: November 29, 2001
    Applicant: Nippon Shokubai Co., Ltd., a Japan corporation
    Inventors: Seiichi Teshima, Masayoshi Konishi, Kozo Tajiri, Yoshinobu Asako, Sadao Miki
  • Patent number: 6288290
    Abstract: This invention relates to a method for the production of an aromatic compound (II) having a (CH2)nCX2Br group (wherein X represents a fluorine or chlorine atom and the X's may be same or different, and n is an integer in the range of 0 to 4) by the reaction of photo-bromination of an aromatic compound (I) having a (CH2)nCX2H group (wherein X and n are as defined above) with a brominating agent, wherein the photo-bromination reaction is carried out while removing hydrogen bromide generated in the reaction system and/or in an atmosphere of a low oxygen content, and a halogen-containing naphthalene compound represented by the following formula (1): wherein Y represents —CF2H, —CF2Br, or —CHO group, Z1 and Z2 independently represent a halogen atom, and p and q independently are an integer in the range of 0 to 3.
    Type: Grant
    Filed: October 19, 1999
    Date of Patent: September 11, 2001
    Assignee: Nippon Shokubai, Co., Ltd.
    Inventors: Seiichi Teshima, Masayoshi Konishi, Kozo Tajiri, Yoshinobu Asako, Sadao Miki
  • Publication number: 20010002425
    Abstract: A process is provided which allows a 1,4-bis(difluoroalkyl)benzene derivative to be produced inexpensively by a simple procedure without requiring any special facility.
    Type: Application
    Filed: January 11, 2001
    Publication date: May 31, 2001
    Applicant: Nippon Shokubai Co., Ltd., a Japan Corporation
    Inventors: Seiichi Teshima, Yoshinobu Asako
  • Patent number: 6043397
    Abstract: A method for the production of a fluorine-containing aromatic compound is provided which allows the relevant reaction to proceed in a standard reaction vessel such as, for example, a glass vessel at room temperature under an ambient pressure without requiring provision of such special devices as have been necessary heretofore or adoption of harsh reaction conditions. This method comprises causing an aromatic compound (A) having a cyclic skeletal part of 6 to 16 carbon atoms containing a plurality of --C(.dbd.O)X groups, wherein X stands for a hydrogen atom, a halogen atom, or an alkyl group of 1 to 10 carbon atoms, and having the remaining hydrogen atoms unsubstituted or partly or wholly substituted with at least one species of halogen atom to react with a compound (B) represented by the formula: ##STR1## wherein R.sup.1 and R.sup.2 independently stand for an alkyl group of 1 to 6 carbon atoms or a phenyl group.
    Type: Grant
    Filed: August 25, 1998
    Date of Patent: March 28, 2000
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Seiichi Teshima, Yoshinobu Asako
  • Patent number: 5993701
    Abstract: A third-order nonlinear optical material having a metal oxide contained in a transparent polymer.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: November 30, 1999
    Assignee: Industrial Science & Technology
    Inventors: Masanori Ando, Toru Sakaguchi, Tetsuhiko Kobayashi, Seiichi Teshima, Yoshinobu Asako