Patents by Inventor Seiichiro Higashiya

Seiichiro Higashiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MOCVD precursors based on organometalloid ligands
    Patent number: 6340768
    Abstract: Volatile metal complexes with &agr;-sila-&bgr;-diketonate ligands containing haloalkyl, and particularly, perfluoroalkyl, substitutents are useful as metal precursors for chemical vapor deposition processes and as nanostructured materials containing fluorous domains.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: January 22, 2002
    Assignee: Research Foundation of State University of New York
    Inventors: John T. Welch, Kulbinder Kumar Banger, Seiichiro Higashiya, Silvana C. Ngo