Patents by Inventor Seiichiro Tachibaba

Seiichiro Tachibaba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20110171580
    Abstract: A positive resist composition comprising a polymer having a tetrahydrobenzocycloheptane-substituted secondary or tertiary carboxyl group ester as an acid labile group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.
    Type: Application
    Filed: January 7, 2011
    Publication date: July 14, 2011
    Inventors: Jun HATAKEYAMA, Takeru Watanabe, Seiichiro Tachibaba