Patents by Inventor Seiichiro Yaginuma
Seiichiro Yaginuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240034062Abstract: A liquid ejection head includes a nozzle plate where a nozzle for ejecting a liquid is provided, a substrate including a piezoelectric element for generating pressure for ejecting the liquid from the nozzle, and a wall member made of a resin and provided between the nozzle plate and the substrate to form a pressure chamber that communicates with the nozzle. A structure for connecting at least two side surfaces, among a plurality of side surfaces of the wall member that forms the pressure chamber, is provided.Type: ApplicationFiled: July 26, 2023Publication date: February 1, 2024Inventor: SEIICHIRO YAGINUMA
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Patent number: 11498331Abstract: A liquid ejection head including a liquid distribution path with a first liquid circulation flow path that is branched from the liquid distribution path and a second liquid circulation flow path joined to the liquid distribution path. A flow path wall sections the first and second liquid circulation flow paths and an ejection orifice is provided in each of the second liquid circulation flow path. Energy generating elements and liquid circulating elements are provided in each of the first and second liquid circulation flow paths. A structure is provided on an extension line of a center line of the first flow path wall and is placed at a position at which the structure overlaps the liquid distribution path.Type: GrantFiled: October 13, 2020Date of Patent: November 15, 2022Assignee: Canon Kabushiki KaishaInventor: Seiichiro Yaginuma
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Patent number: 11465418Abstract: A manufacturing method for a structure includes preparing a dry film supported on one surface of a support; bonding the dry film to a substrate so that the dry film and the substrate are in contact with each other; performing first exposure of the dry film bonded to the substrate via the support; removing the support after the first exposure; performing second exposure of the dry film after the support is removed via a photomask; and developing the dry film after the first exposure and the second exposure.Type: GrantFiled: March 17, 2021Date of Patent: October 11, 2022Assignee: Canon Kabushiki KaishaInventors: Kenji Tamamori, Kazuhiro Asai, Tetsushi Ishikawa, Seiichiro Yaginuma
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Patent number: 11424157Abstract: A method of manufacturing a structure that includes a substrate provided with a through hole, and a resin layer provided on a front surface of the substrate to close the through hole, includes, in order, preparing the substrate including the through hole and including a support substrate on a back surface of the substrate to close the through hole, bonding a dry film to a front surface of the substrate, the dry film including a support member and a resin layer on the support member, to close the through hole with the resin layer and turn the through hole into a closed space with the substrate, the support substrate, and the dry film, opening the through hole turned into the closed space from the support substrate side, and separating the support member from the dry film while retaining the resin layer on the front surface of the substrate.Type: GrantFiled: April 10, 2020Date of Patent: August 23, 2022Assignee: CANON KABUSHIKI KAISHAInventors: Seiichiro Yaginuma, Ryotaro Murakami, Hideomi Kumano, Masahisa Watanabe, Tetsushi Ishikawa
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Patent number: 11155083Abstract: A member transfer method includes sticking a member supported at a support to an object, thinning the support after the sticking of the member to the object, and removing the support from the member after the thinning of the support.Type: GrantFiled: July 15, 2019Date of Patent: October 26, 2021Assignee: Canon Kabushiki KaishaInventors: Teruo Ozaki, Masaki Ohsumi, Tomohiko Nakano, Seiichiro Yaginuma, Keiji Matsumoto
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Patent number: 11135841Abstract: A liquid discharge head includes a discharge port member including a discharge port, a flow path member including a pressure chamber and a liquid flow path, a substrate, and a structure that is arranged on the substrate on an upstream side of a center of the discharge port and that is configured to generate a flow of the liquid toward the discharge port. The liquid in the pressure chamber circulates. A position corresponding to a portion of the structure having a greatest height from a surface of the substrate is located on the upstream side of the center of the discharge port in a flow direction of the liquid. A thickness of the structure in a discharge direction of the liquid is 0.1 times or greater than a thickness of the liquid flow path in the discharge direction of the liquid.Type: GrantFiled: April 1, 2020Date of Patent: October 5, 2021Assignee: Canon Kabushiki KaishaInventors: Masataka Nagai, Masafumi Morisue, Koji Sasaki, Seiichiro Yaginuma, Shinji Kishikawa
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Publication number: 20210300042Abstract: A manufacturing method for a structure includes preparing a dry film supported on one surface of a support; bonding the dry film to a substrate so that the dry film and the substrate are in contact with each other; performing first exposure of the dry film bonded to the substrate via the support; removing the support after the first exposure; performing second exposure of the dry film after the support is removed via a photomask; and developing the dry film after the first exposure and the second exposure.Type: ApplicationFiled: March 17, 2021Publication date: September 30, 2021Inventors: Kenji Tamamori, Kazuhiro Asai, Tetsushi Ishikawa, Seiichiro Yaginuma
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Patent number: 11110719Abstract: In a liquid discharge head, a first pump and a second pump are arranged inside a channel, the channel includes a pressure chamber including an energy generating element, and liquid inside the pressure chamber is circulatable between inside and outside of the pressure chamber by the first pump or the second pump. The first pump is arranged on one side relative to a midpoint of the channel in an extending direction of the channel, and the second pump is arranged on another side relative to the midpoint of the channel in the extending direction of the channel.Type: GrantFiled: March 24, 2020Date of Patent: September 7, 2021Assignee: Canon Kabushiki KaishaInventors: Koji Sasaki, Masafumi Morisue, Seiichiro Yaginuma, Shinji Kishikawa, Masataka Nagai
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Publication number: 20210237455Abstract: The present invention provides a liquid ejection apparatus and a liquid collection container that can suppress a decrease in productivity by reducing time required to remove an absorber from a waste liquid collection unit and time required to attach the absorber to the waste liquid collection unit. To this end, a second absorber is provided to cover partition walls in a collection unit.Type: ApplicationFiled: January 28, 2021Publication date: August 5, 2021Inventors: Tetsushi ISHIKAWA, Seiichiro YAGINUMA
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Publication number: 20210213765Abstract: A liquid ejection apparatus includes a liquid ejection head for ejecting liquid and a mounting section for receiving a waste liquid container to be attached thereto. The waste liquid container is capable of receiving and containing the waste liquid discharged from a discharge port arranged in the mounting section. The liquid ejection apparatus has a blocking member for shielding the discharge port in accordance with an operation of removing the waste liquid container from the mounting section. The liquid ejection apparatus minimizes the risk of staining one or both of the user's hands handling the waste liquid container and the user's clothes with the waste liquid remaining on the discharge port of the liquid ejection apparatus.Type: ApplicationFiled: January 13, 2021Publication date: July 15, 2021Inventors: Kenji Tamamori, Tetsushi Ishikawa, Takashi Sugawara, Keiji Watanabe, Masafumi Morisue, Seiichiro Yaginuma
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Publication number: 20210114372Abstract: A liquid ejection head including a liquid distribution path with a first liquid circulation flow path that is branched from the liquid distribution path and a second liquid circulation flow path joined to the liquid distribution path. A flow path wall sections the first and second liquid circulation flow paths and an ejection orifice is provided in each of the second liquid circulation flow path. Energy generating elements and liquid circulating elements are provided in each of the first and second liquid circulation flow paths. A structure is provided on an extension line of a center line of the first flow path wall and is placed at a position at which the structure overlaps the liquid distribution path.Type: ApplicationFiled: October 13, 2020Publication date: April 22, 2021Inventor: Seiichiro Yaginuma
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Publication number: 20200335391Abstract: A method of manufacturing a structure that includes a substrate provided with a through hole, and a resin layer provided on a front surface of the substrate to close the through hole, includes, in order, preparing the substrate including the through hole and including a support substrate on a back surface of the substrate to close the through hole, bonding a dry film to a front surface of the substrate, the dry film including a support member and a resin layer on the support member, to close the through hole with the resin layer and turn the through hole into a closed space with the substrate, the support substrate, and the dry film, opening the through hole turned into the closed space from the support substrate side, and separating the support member from the dry film while retaining the resin layer on the front surface of the substrate.Type: ApplicationFiled: April 10, 2020Publication date: October 22, 2020Inventors: Seiichiro Yaginuma, Ryotaro Murakami, Hideomi Kumano, Masahisa Watanabe, Tetsushi Ishikawa
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Publication number: 20200331266Abstract: A liquid discharge head includes a discharge port member including a discharge port, a flow path member including a pressure chamber and a liquid flow path, a substrate, and a structure that is arranged on the substrate on an upstream side of a center of the discharge port and that is configured to generate a flow of the liquid toward the discharge port. The liquid in the pressure chamber circulates. A position corresponding to a portion of the structure having a greatest height from a surface of the substrate is located on the upstream side of the center of the discharge port in a flow direction of the liquid. A thickness of the structure in a discharge direction of the liquid is 0.1 times or greater than a thickness of the liquid flow path in the discharge direction of the liquid.Type: ApplicationFiled: April 1, 2020Publication date: October 22, 2020Inventors: Masataka Nagai, Masafumi Morisue, Koji Sasaki, Seiichiro Yaginuma, Shinji Kishikawa
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Publication number: 20200316956Abstract: In a liquid discharge head, a first pump and a second pump are arranged inside a channel, the channel includes a pressure chamber including an energy generating element, and liquid inside the pressure chamber is circulatable between inside and outside of the pressure chamber by the first pump or the second pump. The first pump is arranged on one side relative to a midpoint of the channel in an extending direction of the channel, and the second pump is arranged on another side relative to the midpoint of the channel in the extending direction of the channel.Type: ApplicationFiled: March 24, 2020Publication date: October 8, 2020Inventors: Koji Sasaki, Masafumi Morisue, Seiichiro Yaginuma, Shinji Kishikawa, Masataka Nagai
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Patent number: 10744771Abstract: To manufacture a liquid ejection head, a film having a lower surface free energy than a surface free energy of a substrate is first formed on an inner face of a liquid supply port. Next, a dry film to be a flow path forming member is attached to cover the surface of the substrate, and then a member to be an ejection orifice forming member is provided on the surface of the dry film.Type: GrantFiled: August 30, 2018Date of Patent: August 18, 2020Assignee: CANON KABUSHIKI KAISHAInventors: Keiji Matsumoto, Seiichiro Yaginuma, Koji Sasaki, Jun Yamamuro, Kunihito Uohashi, Ryotaro Murakami, Tomohiko Nakano, Shingo Nagata
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Patent number: 10625506Abstract: A method for manufacturing a liquid discharge head includes a transferring step of transferring a dry film supported by a supporting member to a substrate having a hole, and a peeling step of peeling the supporting member off the dry film on the substrate. In the peeling step, the dry film is in contact with a wall surface defining the hole in the substrate.Type: GrantFiled: February 6, 2018Date of Patent: April 21, 2020Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Asai, Kenji Fujii, Keiji Matsumoto, Koji Sasaki, Kunihito Uohashi, Jun Yamamuro, Seiichiro Yaginuma, Masahisa Watanabe, Ryotaro Murakami
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Patent number: 10562306Abstract: A liquid ejection head is manufactured by covering a mold material arranged on a patterned protecting layer on a substrate and subsequently removing the mold material to produce a flow path. A sacrificial layer employed as the mold material operates as mask for patterning the protecting layer.Type: GrantFiled: June 12, 2018Date of Patent: February 18, 2020Assignee: CANON KABUSHIKI KAISHAInventors: Seiichiro Yaginuma, Koji Sasaki, Kazuhiro Asai
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Publication number: 20200023640Abstract: A member transfer method includes sticking a member supported at a support to an object, thinning the support after the sticking of the member to the object, and removing the support from the member after the thinning of the support.Type: ApplicationFiled: July 15, 2019Publication date: January 23, 2020Inventors: Teruo Ozaki, Masaki Ohsumi, Tomohiko Nakano, Seiichiro Yaginuma, Keiji Matsumoto
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Patent number: 10538090Abstract: A method for manufacturing a perforated substrate includes forming a through-hole extending through a substrate from a first surface to a second surface opposite the first surface; forming a film on the first surface, a sidewall of the through-hole, and the second surface; forming a resist on the first surface; patterning the resist such that the resist closes an opening of the through-hole in the first surface; etching the film on the first surface using the resist as a mask; before the etching step, forming an inspection member on the second surface such that the inspection member closes an opening of the through-hole in the second surface; and determining whether there is a film patterning defect or a flaw that causes a film patterning defect.Type: GrantFiled: November 17, 2017Date of Patent: January 21, 2020Assignee: Canon Kabushiki KaishaInventors: Seiichiro Yaginuma, Masataka Nagai, Masaya Uyama
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Patent number: 10500861Abstract: A method for manufacturing a liquid ejection head including providing a negative first photosensitive resin layer on the substrate, forming a pattern of the flow path by selectively exposing the first photosensitive resin layer, providing a negative second photosensitive resin layer on the first photosensitive resin layer, providing a negative third photosensitive resin layer on the second photosensitive resin layer, forming a pattern of the ejection port by selectively exposing the second and third photosensitive resin layers, developing the first, second, and third photosensitive resin layers, irradiating an activation energy line on at least the third photosensitive resin layer after the developing, and heat curing the first, second, and third photosensitive resin layers after the irradiating of the activation energy line.Type: GrantFiled: August 4, 2017Date of Patent: December 10, 2019Assignee: Canon Kabushiki KaishaInventors: Kunihito Uohashi, Shingo Nagata, Kenji Fujii, Jun Yamamuro, Koji Sasaki, Keiji Matsumoto, Seiichiro Yaginuma, Ryotaro Murakami, Tomohiko Nakano, Masataka Nagai