Abstract: In projecting a pattern formed on a mask onto a substrate by using a progressive focus exposure method and transferring/forming an image of the pattern on a substrate, a control unit changes the distribution of energy amounts supplied onto the substrate based on the relative positions of the imaging plane and the substrate surface, and the integrated energy amount supplied onto the substrate in accordance with the position of an irradiation area on the substrate surface which is irradiated with an energy beam through the projection optical system. With this operation, in accordance with information about the distribution of variations in resist layer thickness on the substrate, which is obtained in advance, at least one of the distribution of energy amounts and the integrated energy, which reduce the influences of this distribution, can be changed.

Abstract: It is an object of the present invention to smoothly join divided patterns adjacent to each other in a synchronous moving direction when a mask and a substrate are moved in synchronization, and the divided patterns are joined and picture-synthesized on the substrate. According to the invention, when the mask and the substrate are moved in synchronization with respect to irradiation with an exposing light, the divided patterns of the mask are projected on the substrate, and a plurality of divided patterns adjacent on the substrate are joined and exposed, the divided patterns adjacent to each other in the synchronous moving direction partially overlap each other.