Abstract: A supporting glass substrate includes a compression stress layer on a surface thereof, and has an average thermal expansion coefficient at 50° C. to 200° C. that is 7 ppm/° C. to 15 ppm/° C., an internal tensile stress that is 5 MPa to 55 MPa, and a depth of the compression stress layer that is 10 ?m to 60 ?m.

Abstract: The present invention relates to a glass including, in mol % in terms of oxides: 68% or more of SiO2; 0.1% to 8% of Al2O3; and 0.1% to 4% of SrO, in which [SiO2]+[B2O3] is 88% or more, [B2O3]?([RO]+[R2O]?[Al2O3]) is 27% or less, a relative dielectric constant at 25° C. and a frequency of 10 GHz is 4.5 or less, a dielectric loss tangent at 25° C. and a frequency of 10 GHz is 0.005 or less, ?Abs-OH is 4.0 or less, a total content (RO) of MgO, CaO, SrO, and BaO is more than 0% to 6%, a total content (R2O) of Li2O, Na2O, and K2O is 0% to 1%, [Al2O3]?[RO] is ?3% to less than 8%, [Al2O3]×[RO] is more than 0 to 30, [MgO]+[CaO] is 0.1% to 5.9%, and [MgO]/([MgO]+[Al2O3]) is 0 to 0.45.

Abstract: Rate of thermal expansion is reduced, and also electrical resistance is reduced. A glass 10 has a conductivity parameter A of 1.3 or more, the conductivity parameter A being calculated from the composition and represented by Formula (1), and a thermal expansion parameter B of 2.0 or less, the thermal expansion parameter B being calculated from the composition and represented by Formula (2).

Abstract: The present invention relates to a chemically strengthened glass having a sheet thickness t (mm), a compressive stress layer depth DOC of 180×t (?m) or more, CS30-50 which is a compressive stress integrated value at a depth of 30 ?m to 50 ?m from a surface of the chemically strengthened glass of 12000 Pa·m or less, and CS90 which is a compressive stress value at a depth of 90 ?m from the surface of 175×t?88 (MPa) or more.

Abstract: The present invention relates to a glass for chemical strengthening, including: in terms of mole percentage based on oxides, 50% or more of SiO2; 0% to 10% of B2O3; 1% to 30% of Al2O3; 0% to 10% of P2O5; 0% to 10% of Y2O3; 0% to 25% of Li2O; 0% to 25% of Na2O; 0% to 25% of K2O; 0% to 10% of MgO; 0% to 10% of CaO; 0% to 10% of SrO; 0% to 10% of BaO; 0% to 10% of ZnO; 0% to 5% of ZrO2; 0% to 5% of TiO2; 0% to 5% of SnO2; and 0% to 0.5% of Fe2O3, in which a ratio (R2O/Al2O3) of a total content of Li2O, Na2O, and K2O to a content of Al2O3 satisfies the following Expression: 0.8?(R2O/Al2O3)?30.

Abstract: At a preparatory step for correction, in a state that a reflective tape made with a retroreflective material is pasted in advance onto a floor surface of a measurement space in a direction away from the distance-measuring device, a distance La to an inside area of the reflective tape, and a distance Lb to an outside area of the reflective tape adjacent to the inside area are measured by the distance-measuring device, while measurement positions Y are being scanned along the reflective tape. A correction formula for converting the distance Lb to the distance La is created from a relationship between the distance La and the distance Lb obtained at each measurement position Y. At an actual measurement step, a distance (actual measurement value x) to the target object measured by the distance-measuring device is corrected in accordance with the correction formula, and a measurement-distance corrected value y is calculated.

Abstract: The present invention relates to a glass block including: Si; and at least one of Mg and Ca, and satisfying, in terms of mol %, 49.0% or less of B2O3, 11.5% or less of P2O5, 10.0 to 59.5% of a (=SiO2+B2O3+P2O5+GeO2), 66.5% or less of (a+Al2O3), 7.0% or less of Ga2O3, 0.44 or less of b (=Al2O3+Ga2O3+In2O3)/a, 20.0% or more of R2O (R2: alkaline earth metal), 50.0% or less of MgO, MgO?BaO, CaO?BaO, SrO?BaO, MgO?SrO, CaO?SrO, 1.2% or less of R12O (R1: alkali metal), 4.8% or less of TiO2 or ZrO2, 9.5% or less of MnO2, 11.8% or less of ZnO, 0.067 or less of Ta2O5/SiO2, 15.0% or less of an impurity element, and 0.20 or less of F/O.

Abstract: The present invention relates to a laminated member, including: a glass member having a linear transmittance at a wavelength of 850 nm of 80% or more; a bonding layer containing a resin and lying on the glass member; and a Si—SiC member lying on the bonding layer, in which the glass member includes predetermined amounts of SiO2, Al2O3, B2O3, and P2O5, the Si—SiC member has an average linear expansion coefficient ? at 20 to 200° C. of 2.85 to 4.00 ppm/° C., and has an average linear expansion coefficient ? at 20 to 200° C. of 1.50 to 5.00 ppm/° C., and the laminated member has an absolute value |???|, which is a value obtained by subtracting ? from ?, of 2.00 ppm/° C. or less.

Abstract: The present invention relates to a chemically strengthened glass having a haze value in terms of a thickness of 0.7 mm of 0.5% or less, having a surface compressive stress value of 400 MPa or more, having a depth of a compressive stress layer of 70 ?m or more, having an ST limit of 18000 MPa·?m to 30000 MPa·?m, and being a glass ceramic including at least one of a Li3PO4 crystal and a Li4SiO4 crystal, or including a solid solution crystal of Li3PO4 or Li4SiO4 or a solid solution of both Li3PO4 and Li4SiO4.

Abstract: Glass contains, in mol percentage on an oxide basis, SiO2: 35% to 60%, B2O3: 0.8% to 8%, Al2O3: 6% to 21%, and MgO: 17% to 44%. Additionally, (MgO/Al2O3)?1 is satisfied, a measured Madelung constant m calculated by an expression (1A) is equal to or larger than 1.05, and a thermal expansion factor as a ratio of a measured value ? of a linear thermal expansion coefficient to a calculated value ?cal of a linear thermal expansion coefficient calculated from composition is equal to or smaller than 0.7. Herein, E is a measured value of a Young's modulus of the glass, Vp is an average atomic packing factor of the glass, and Gt is average bond dissociation energy of the glass.

Abstract: The present invention relates to a laminated member including: a glass member having a linear transmittance at a wavelength of 850 nm of 80% or more; a bonding layer including a resin and lying on the glass member; and a Si—SiC member lying on the bonding member, in which the Si—SiC member has an average linear expansion coefficient ? at from 20° C. to 200° C. of from 2.85 ppm/° C. to 4.00 ppm/° C.

Abstract: The present invention relates to a glass including, represented by mole percent based on oxides: from 52% to 80% of SiO2; from 5% to 30% of B2O3; from 2% to 30% of Al2O3; from 0.1% to 11% of P2O5; and from 0.0001% to 5% of Na2O, in which the glass has an average thermal expansion coefficient ? at from 50° C. to 350° C. of from 5×10?7/° C. or more and 33×10?7/° C. or less.

Abstract: Provided are a TOF apparatus, a TOF system, and an installation status notification method that can automatically determine the quality of installation and reduce the loss of performing re-construction work. The TOF apparatus includes a processor. The processor executes an anomaly determination program, which is a program used to determine whether the installation state is normal or anomaly. By executing the anomaly determination program, the processor determines whether the installed state is normal or anomaly based on at least one of the viewpoints of the installation angle, the influence of interference, the field of view, and the measurement distance, and notifies the determination result.

Abstract: Suppressing deflection and reducing weight are to be achieved. A supporting glass substrate has a ratio of a Young's modulus (GPa) to a density (g/cm3) that is 37.0 (GPa·cm3/g) or more and the ratio has a value larger than a ratio calculation value, the ratio calculation value being a ratio of a Young's modulus (GPa) calculated from a composition to a density (g/cm3). The ratio calculation value is represented by the following expression: ?=2·?{(Vi·Gi)/Mi·Xi}, where, in the expression, Vi is a filling parameter of a metal oxide contained in the supporting glass substrate, Gi is a dissociation energy of a metal oxide contained in the supporting glass substrate, Mi is a molecular weight of a metal oxide contained in the supporting glass substrate, and Xi is a molar ratio of a metal oxide contained in the supporting glass substrate.

Abstract: A stress measurement device for strengthened glass includes a polarization phase difference variable member configured to vary a polarization phase difference of a laser light by one wavelength of the laser light or more; an imaging element configured to image a plurality of times at a predetermined time interval a scattered light emitted according to the laser light with the varied polarization phase difference entering the strengthened glass, and obtain a plurality of images; and an arithmetic unit configured to measure a periodic change in luminance of the scattered light using the plurality of images, calculate a change in a phase of the change in luminance, and calculate a stress distribution in a depth direction from a surface of the strengthened glass based on the change in the phase.

Abstract: At a preparatory step for correction, in a state that a reflective tape made with a retroreflective material is pasted in advance onto a floor surface of a measurement space in a direction away from the distance-measuring device, a distance La to an inside area of the reflective tape, and a distance Lb to an outside area of the reflective tape adjacent to the inside area are measured by the distance-measuring device, while measurement positions Y are being scanned along the reflective tape. A correction formula for converting the distance Lb to the distance La is created from a relationship between the distance La and the distance Lb obtained at each measurement position Y. At an actual measurement step, a distance (actual measurement value x) to the target object measured by the distance-measuring device is corrected in accordance with the correction formula, and a measurement-distance corrected value y is calculated.

Abstract: As a preparatory step for correction, a measurement sample is placed such that a distance of the measurement sample from the distance measuring device becomes a set value L1, a distance to the measurement sample 3? is measured by the distance measuring device, and a measurement value L2 is obtained. The measurement value L2 corresponding to a plurality of values of the set value L1 is acquired, while the set value L1 is changed to the plurality of values, and a correction formula for converting the measurement value L2 to the set value L1 is created on a basis of a relationship between the acquired set value L1 and measurement value L2. As an actual measurement step, a distance (actual measurement value x) to the target object 3 measured by the distance measuring device is corrected in accordance with the correction formula, and a measurement-distance corrected value y is calculated.

Abstract: To provide a glass plate having a high Young's modulus and a high devitrification viscosity. A glass includes, in mol % based on oxides: SiO2 of 30.0 to 50.0%; B2O3 of 10.0 to 30.0%; Al2O3 of 10.0 to 30.0%; Y2O3 of 3.0 to 17.0%; and Gd2O3 of 3.5 to 17.0%, in which (Gd2O3+Y2O3) is from 16.0 to 22.0%, and (Gd2O3/Y2O3) is from 0.15 to 7.0.

Abstract: A supporting glass substrate has a ratio of a Young's modulus (GPa) to a density (g/cm3) that is 37.0 (GPa·cm3/g) or more and the ratio has a value larger than a ratio calculation value, the ratio calculation value being a ratio of a Young's modulus (GPa) calculated from a composition to a density (g/cm3). The ratio calculation value is represented by the following expression: ?=2·?{(Vi·Gi)/Mi·Xi}, where, in the expression, Vi is a filling parameter of a metal oxide contained in the supporting glass substrate, Gi is a dissociation energy of a metal oxide contained in the supporting glass substrate, Mi is a molecular weight of a metal oxide contained in the supporting glass substrate, and Xi is a molar ratio of a metal oxide contained in the supporting glass substrate.

Abstract: A supporting glass substrate includes a compression stress layer on a surface thereof, and has an average thermal expansion coefficient at 50° C. to 200° C. that is 7 ppm/° C. to 15 ppm/° C., an internal tensile stress that is 5 MPa to 55 MPa, and a depth of the compression stress layer that is 10 ?m to 60 ?m.