Abstract: In an IC card incorporating residual multiplier hardware for implementing a high-speed algorithm for a residual multiplication arithmetic, a method and a device capable of executing a public key encryption processing such as an elliptic curve encryption processing at a high speed. Residual arithmetic succeeding to generation of a random number and residual arithmetic in a signature generating processing can be executed by using a residual multiplier. Further, in order to use effectively the residual multiplier for arithmetic operation on an elliptic curve, the point on the elliptic curve is transformed from a two-dimensional affine coordinate system to a three-dimensional coordinate system. Additionally, multiplicative inverse arithmetic for realizing reverse transformation from the three-dimensional coordinate system to the two-dimensional affine coordinate system as well as for determining a signature s can be executed only with the residual multiplication arithmetic.

Abstract: A glass for anodic bonding, which is a glass to be anodically bonded to a silicon crystal substrate and which contains substantially no Na2O and contains from 4 to 8 mol % of Li2O.

Abstract: In an IC card incorporating residual multiplier hardware for implementing a high-speed algorithm for a residual multiplication arithmetic, a method and a device capable of executing a public key encryption processing such as an elliptic curve encryption processing at a high speed. Residual arithmetic succeeding to generation of a random number and residual arithmetic in a signature generating processing can be executed by using a residual multiplier. Further, in order to use effectively the residual multiplier for arithmetic operation on an elliptic curve, the point on the elliptic curve is transformed from a two-dimensional affine coordinate system to a three-dimensional coordinate system. Additionally, multiplicative inverse arithmetic for realizing reverse transformation from the three-dimensional coordinate system to the two-dimensional affine coordinate system as well as for determining a signature s can be executed only with the residual multiplication arithmetic.

Abstract: In a data encryption/decryption method including an encryption step and a decryption step. In the encryption step, there are prepared n pairs of secret keys and public keys in a public-key cryptographic scheme, where n is a positive integer. A new key is generated in accordance with at least one of the public keys. Data is encrypted in a common-key cryptographic scheme by use of the new key. There is prepared a (k,n) threshold logic (k is an integer equal to or less than n) having terms associated with the new key and the n public keys. A calculation of the threshold logic is conducted by use of the new key and the n public keys, and encrypted data and a result of the calculation of the threshold logic are stored.

Abstract: In an IC card incorporating residual multiplier hardware for implementing a high-speed algorithm for a residual multiplication arithmetic, a method and a device capable of executing public key encryption processing such as an elliptic curve encryption processing at a high speed. Residual arithmetic succeeding to generation of a random number and residual arithmetic in a signature generating processing can be executed by using a residual multiplier. Further, in order to use effectively the residual multiplier for arithmetic operation on an elliptic curve, the point on the elliptic curve is transformed from a two-dimensional affine coordinate system to a three-dimensional coordinate system. Additionally, multiplicative inverse arithmetic for realizing reverse transformation from the three-dimensional coordinate system to the two-dimensional affine coordinate system as well as for determining a signature s can be executed only with the residual multiplication arithmetic.

Abstract: A process for purification of (meth)acrylic acid which comprises adding to a crude (meth)acrylic acid one or two or more polar organic substances as a second component at a concentration of 1-35% by weight, crystallizing (meth)acrylic acid from the resulting (meth)acrylic acid solution, and separating the precipitated crystal of (meth)acrylic acid and a mother liquor from each other.

Abstract: A client-server system is provided in which access to a service by a user can properly be controlled, even if an approval by another user is required for receiving the service. First, the server 2 executes a log-in processing by using a user identifier and password transmitted from the client terminal 2, and a user control file 202. Next, the server 2 executes a service control by using a service supply request transmitted from the client terminal 1 and a service control file 42 provided with the server. When the server determines that an approval by another user is required for providing the service, the server executes the approval request to the client terminal 1 that the concerned user uses. When the reply to the approval request is affirmative, the server executes the processing in accordance with the foregoing service supply request. When the reply is negative, the server informs to the user who made the foregoing service supply request that the approval is rejected.

Abstract: In order to provide a search alignment method capable of high-speed alignment without a relative movement between an alignment system and a substrate, an alignment mark is constituted by a plurality of element marks having shapes different from each other, the plurality of element marks are provided in such a manner that each two of them has a gap a little shorter than the size of the field of view of the alignment system therebetween, and if even one of the element marks constituting the alignment mark comes into the field of view of the alignment system, said element mark is identified out of all of said element marks, whereby the position of the entire alignment is measured from the position of said one element mark. Therefore, if the alignment mark is moved in a range wider than the field of view of the alignment system, it is possible to detect the position of the alignment mark by one measurement.

Abstract: Positional discrepancies of images of segmental areas, which are caused by stretching of a substrate in the Y direction, are corrected by changing magnifications of respective projection optical systems and inclinations of parallel plane glass pieces with respect optical axes. After that, positional discrepancies of the images after the correction are accurately detected by using a calibration system for the projection optical systems. Thus it is possible to confirm whether or not the positional discrepancies are accurately corrected. If the correction is insufficient as a result of the confirmation, at least one of correction of the magnifications of the respective projection optical systems and shift of the images projected through the respective projection optical systems onto the substrate is executed again so that amounts of the positional discrepancies are sufficiently small.

Abstract: A glass substrate for plasma display panel, which has a spectral transmittance of at least 87% in the range of from 400 nm to 700 nm at a thickness in the range of from 1.5 to 3.5 mm.

Abstract: In each of the second and subsequent heat treatments, in a case where a glass substrate shrinks by heat treatment at the same average cooling rate as the average cooling rate in the immediately preceding heat treatment, the average cooling rate is set to be larger than that in the immediately preceding heat treatment, and inversely, in a case where the glass substrate extends, the average cooling rate is set to be smaller than that in the immediately preceding heat treatment.

Abstract: In order to provide a search alignment method capable of high-speed alignment without a relative movement between an alignment system and a substrate, an alignment mark is constituted by a plurality of element marks having shapes different from each other, the plurality of element marks are provided in such a manner that each two of them has a gap a little shorter than the size of the field of view of the alignment system therebetween, and if even one of the element marks constituting the alignment mark comes into the field of view of the alignment system, said element mark is identified out of all of said element marks, whereby the position of the entire alignment is measured from the position of said one element mark. Therefore, if the alignment mark is moved in a range wider than the field of view of the alignment system, it is possible to detect the position of the alignment mark by one measurement.

Abstract: A pair of reference plates is so arranged as to have a predetermined positional relationship on a carriage that integrally holds a mask and a photosensitive substrate such that the mask and the photosensitive substrate oppose each other on two sides of a projecting optical system. By periodically detecting the positional relationship between the reference plates in the optical axis direction, a variation with time occurring in the detection characteristics of position detecting devices is detected. Both stable image formation characteristics and a high throughput are realized by correcting a driving signal to be supplied to a driving device in accordance with the detected variation.

Abstract: Alignment between a mask and a photosensitive substrate is performed using a first reference mark formed on the mask and a second reference mark formed on the photosensitive substrate. After that, the mask and the photosensitive substrate are relatively moved, so that an image of one of a light-shielding pattern and a light-transmitting pattern formed at a position different from the first reference mark on the mask is formed on the second reference mark on the photosensitive substrate. Then, a circuit pattern formed on the mask is transferred onto the photosensitive substrate, and a partial region including the second reference mark is exposed with the image of one of the light-shielding pattern and the light-transmitting pattern.

Abstract: A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projec

Abstract: An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.

Abstract: In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected.

Abstract: In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change

Abstract: In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change

Abstract: The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction.