Patents by Inventor Seiji Onoue

Seiji Onoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7739631
    Abstract: A testing method includes: storing QC data for each of electronic device manufacturing processes in a storage unit; changing the QC data for each of the processes to a common fixed form of data; providing a contour for the QC data for each of the processes using the common fixed form of data; comparing a singularity map to a failure generation map for a completed device; and finding a causal process for a failure and a defect through the comparison.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: June 15, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Ryuuichi Teramoto, Seiji Onoue
  • Publication number: 20090087757
    Abstract: A method for feature prediction, determining an incident angle at an incident amount prediction point on basis of a pattern data, determining an incident amount at the incident amount prediction point on basis of the incident angle and a process condition data, determining an incident amount distribution on basis of the incident amount at a plurality of the incident amount prediction points, selecting a feature prediction point on basis of the incident amount distribution and a predetermined threshold or a manufacturing history data, and performing prediction of a feature at the selected feature prediction point.
    Type: Application
    Filed: September 26, 2008
    Publication date: April 2, 2009
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventor: Seiji ONOUE
  • Publication number: 20080178131
    Abstract: A testing method includes: storing QC data for each of electronic device manufacturing processes in a storage unit; changing the QC data for each of the processes to a common fixed form of data; providing a contour for the QC data for each of the processes using the common fixed form of data; comparing a singularity map to a failure generation map for a completed device; and finding a causal process for a failure and a defect through the comparison.
    Type: Application
    Filed: September 17, 2007
    Publication date: July 24, 2008
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Ryuuichi Teramoto, Seiji Onoue
  • Patent number: 6402847
    Abstract: A dry processing apparatus includes a lower electrode for holding a substrate to be processed in a chamber, a shower head, provided to face a surface of the lower electrode, on which the substrate to be processed is placed, for supplying a process gas to the substrate to be processed, placed on the lower electrode, and a pumping channel formed to surround an outer circumference of the lower electrode, wherein a pumping gap portion for communicating a processing space formed between the lower electrode and the shower head, and the pumping channel with each other, is made such that a width of the gap portion differs between an exhaust pump side where the pumping channel is connected to an exhaust pump, and an opposite side thereto.
    Type: Grant
    Filed: November 26, 1999
    Date of Patent: June 11, 2002
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shigeyuki Takagi, Makoto Saito, Seiji Onoue, Ichiro Tohno, Hiroshi Nishimura