Patents by Inventor Seiji Sagou

Seiji Sagou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5260153
    Abstract: An aperture pattern printing plate for manufacturing a shadow mask having an opaque layer form in parts on a surface of a transparent plate. The parts of the opaque layer corresponding to apertures in an effective area of the shadow mask. The opaque layer projecting from the transparent plate, and having a thickness of 30 to 50 .mu.m.
    Type: Grant
    Filed: November 14, 1991
    Date of Patent: November 9, 1993
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasuhisa Ohtake, Yasushi Magaki, Mitsuaki Yamazaki, Seiji Sagou, Hiroshi Tanaka
  • Patent number: 5128224
    Abstract: A method of manufacturing an aperture pattern printing plate in a limited number of steps using only one original printing plate. The method produces transparent portions on a portion of the printing plate corresponding to a non-effective area of a shadow mask, and opaque portions on a portion of the printing plate corresponding to an effective area of a shadow mask. The method has the steps of bringing a transparent plate having an unexposed transparent photosensitive layer formed on at least one of its principal surfaces into contact with an original plate having opaque areas corresponding to apertures in a to be constructed shadow mask. A first exposure is performed on the photosensitive layer through the original plate. The photosensitive layer is then developed to render exposed portions of the photosensitive layer opaque. These opaque portions are then etched away. A portion of the photosensitive layer corresponding to the non-effective area of a shadow mask is then covered to prevent exposure.
    Type: Grant
    Filed: March 1, 1990
    Date of Patent: July 7, 1992
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasuhisa Ohtake, Yasushi Magaki, Mitsuaki Yamazaki, Seiji Sagou, Hiroshi Tanaka
  • Patent number: 5006432
    Abstract: A shadow mask is formed by forming two photosensitive resin layers respectively on both major surfaces of a band-like metal sheet. The first resin layer is formed by coating a resin solution on the first major surface with the first major surface directed upward, and drying the solution while maintaining the metal sheet horizontal. Likewise, the second resin layer is formed by coating a resin solution of the second major surface with the second major surface directed upward, and drying the solution while maintaining the metal sheet horizontal. Predetermined openings are made in the first and second resin layers by exposing and developing. Then, the bared portions of metal sheet are etched to form apertures therein.
    Type: Grant
    Filed: October 24, 1988
    Date of Patent: April 9, 1991
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Seiji Sagou, Yasuhisa Ohtake
  • Patent number: 4960659
    Abstract: A method for preparing a shadow mask with a plurality of apertures for a color picture tube from a metal shadow mask sheet includes the step of exposing the entire surface of the photosensitive layers provided on the both surfaces of the metal sheet to an unpatterned light before or after the step of exposing the photosensitive layers to patterned light in order to form resist films.
    Type: Grant
    Filed: January 13, 1989
    Date of Patent: October 2, 1990
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Seiji Sagou
  • Patent number: 4772345
    Abstract: A method of manufacturing a phosphor screen of uniform thickness on an inner surface of a panel of a cathode ray tube, comprising the steps of forming a powder-receptive adhesive pattern on the inner surface of a substantially rectangular panel having a skirt portion at the periphery, forming a sealed vessel consisting essentially of a container for containing phosphor powder and the panel by combining integrally the container and the panel so that the openings of both are opposed, and rotating the sealed container about an axis parallel to the inner surface of the panel.
    Type: Grant
    Filed: March 30, 1987
    Date of Patent: September 20, 1988
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Seiji Sagou, Takeo Itou
  • Patent number: 4732828
    Abstract: In a method for a phosphor screen of a cathode ray tube including the steps of forming a photo-tacky layer on a panel of a cathode ray tube, exposing the photo-tacky layer to form an adhesive pattern on the layer, and adhering phosphor powder on the adhesive pattern, in which these exposing and adhering steps are repeated. Before next exposing step, the photo-tacky layer is heated and then exposed after cooled. The heating step prevents the sensitivity of the layer from deterioration occurred by the preceding adhering step.
    Type: Grant
    Filed: November 5, 1986
    Date of Patent: March 22, 1988
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Seiji Sagou, Takeo Itou
  • Patent number: 4687825
    Abstract: A method of manufacturing a phosphor screen of a cathode ray tube, comprises forming a pattern having a particle-receptive adhesive surface on an inner surface of a faceplate having a peripheral wall, rotating the faceplate about an axis perpendicular to its inner surface and passing its center, and charging phosphor particles onto the inner surface of the faceplate during or before rotation thereof so as to allow the phosphor particles to slide on the inner surface of the faceplate and to attach to the particle-receptive adhesive surface. The method can form a phosphor film having a uniform and sufficient thickness without an irregularity in the amount of phosphor attached.
    Type: Grant
    Filed: September 16, 1985
    Date of Patent: August 18, 1987
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Seiji Sagou, Takeo Itou