Abstract: A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid.

Abstract: A resist composition containing a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a01-1). In the formula, W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, and Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, where the alicyclic group has an oxygen atom or a sulfur atom in the ring structure, Ra1 to Ra3 each independently represents a hydrocarbon group having 1 to 10 carbon atoms which may have a substituent.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, a total amount of a basic component including a compound represented by general formula (d0) and an acid-generator component is 25 to 60 parts by weight relative to 100 parts by weight of a base material component. In formula (d0), Rd0 represents a monovalent organic group; Xd0 represents —O—, —C(?O)—, —O—C(?O)—, —C(?O)—O—, —S— or —SO2—; Yd0 represents a single bond or a divalent hydrocarbon group which may have a substituent; Mm+ represents a m-valent organic cation; and m represents an integer of 1 or more Rd0-Xd0-Yd0-COO?(Mm?)1/m??(d0).

Abstract: A resist composition is provided that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid.