Abstract: An oxide film according to this invention is a film of an oxide (possibly including inevitable impurities) containing silver (Ag) and nickel (Ni). This oxide film is an aggregate of microcrystals, an amorphous form including microcrystals, or an amorphous form and has p-type conductivity, which exhibits no clear diffraction peak with the XRD analysis, as seen in a chart in FIG. 3 indicating X-ray diffraction (XRD) analysis results of a first oxide film and a second oxide film. This oxide film achieves a broader bandgap than that of a conventional oxide film as well as high p-type conductivity. This oxide film is an aggregate of microcrystals, an amorphous form containing microcrystals, or an amorphous form as described above, and is thus easily formed on a large substrate and is suitable also for industrial production.

Abstract: One oxide film of the present invention is a film of an oxide (which can contain incidental impurities) containing one transition element selected from the group consisting of niobium (Nb) and tantalum (Ta) and copper (Cu). The oxide film is an aggregate of microcrystals, an amorphous form including microcrystals or an amorphous form, which shows no clear diffraction peak in an XRD analysis and has p-type conductivity as shown in the chart of FIG. 5 showing the results of XRD (X-ray diffraction) analyses of a first oxide film and a second oxide film. According to this oxide film, p-type conductivity higher than that of a conventional oxide film is obtained. This oxide film is an aggregate of microcrystals, an amorphous form containing microcrystals or an amorphous form, is consequently easily formed on a large substrate, and is therefore suitable also for industrial production.

Abstract: The use of an amorphous block copolyester resin as a viscoelastic resin for a composite vibration damping material, and a viscoelastic resin composition for a composite vibration damping material which comprises the amorphous block copolyester resin and at least one compound selected from the group consisting of polyepoxy compounds, polyisocyanate compounds and acid anhydrides.