Patents by Inventor Seil CHOI

Seil CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
    Publication number: 20250051604
    Abstract: A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns using the hardmask layer manufactured from the hardmask composition, the hardmask composition includes a polymer including a structural unit represented by the following Chemical Formula 1; and a solvent,
    Type: Application
    Filed: January 31, 2024
    Publication date: February 13, 2025
    Inventors: Sunghwan KIM, Sanghee PARK, Hyejeong KIM, Seil CHOI, Soohee KIM
  • HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20240376342
    Abstract: A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming a pattern or patterns using a hardmask layer manufactured from the hardmask composition, the hardmask composition includes a polymer that includes a structural unit represented by Chemical Formula 1; and a solvent:
    Type: Application
    Filed: January 30, 2024
    Publication date: November 14, 2024
    Inventor: Seil CHOI
  • HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20240377747
    Abstract: A hardmask composition, including a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns using the hardmask layer including a cured product of the hardmask composition, the hardmask composition including a compound represented by Chemical Formula 1; and a solvent,
    Type: Application
    Filed: February 27, 2024
    Publication date: November 14, 2024
    Inventor: Seil CHOI
  • HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20240377746
    Abstract: A hardmask composition, including a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns using the hardmask layer including a cured product of the hardmask composition, the hardmask composition including a compound represented by Chemical Formula 1; and a solvent,
    Type: Application
    Filed: February 21, 2024
    Publication date: November 14, 2024
    Inventor: Seil CHOI
  • HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
    Publication number: 20240327321
    Abstract: A hardmask composition, including a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns using the hardmask layer including a cured product of the hardmask composition, the hardmask composition including a compound represented by Chemical Formula 1; and a solvent.
    Type: Application
    Filed: January 19, 2024
    Publication date: October 3, 2024
    Inventor: Seil CHOI
  • Hardmask composition and method of forming patterns
    Patent number: 11932715
    Abstract: A hardmask composition and a method of forming patterns using the hardmask composition, the composition including a polymer including a moiety derived from a compound represented by Chemical Formula 1; and a solvent:
    Type: Grant
    Filed: December 21, 2021
    Date of Patent: March 19, 2024
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Donghoon Won, Yongsik Yoo, Hyunsoo Lee, Seil Choi, Huiseon Choe
  • HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20230221641
    Abstract: A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, the composition including a solvent; and a polymer including a structural unit represented by Chemical Formula 1,
    Type: Application
    Filed: October 20, 2022
    Publication date: July 13, 2023
    Inventors: Seung-Wook SHIN, Yushin PARK, Seunghyun KIM, Sangchol PARK, Sangmi KIM, Seil CHOI, Huiseon CHOE
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS
    Publication number: 20220195082
    Abstract: A hardmask composition and a method of forming patterns using the hardmask composition, the composition including a polymer including a moiety derived from a compound represented by Chemical Formula 1; and a solvent:
    Type: Application
    Filed: December 21, 2021
    Publication date: June 23, 2022
    Inventors: Donghoon WON, Yongsik YOO, Hyunsoo LEE, Seil CHOI, Huiseon CHOE