Abstract: Disclosed is an oral pharmaceutical formulation of pelubiprofen which is improved in dissolution rate and stability. As a result of an improvement in the dissolution rate of pelubiprofen, the oral pharmaceutical formulation can show high bioavailability and thus exert pharmacological effects thereof rapidly. It also can be stored with high stability as a result of the minimal generation of related compounds.

Abstract: Disclosed is an oral pharmaceutical formulation of pelubiprofen which is improved in dissolution rate and stability. As a result of an improvement in the dissolution rate of pelubiprofen, the oral pharmaceutical formulation can show high bioavailability and thus exert pharmacological effects thereof rapidly. It also can be stored with high stability as a result of the minimal generation of related compounds.

Abstract: An array substrate of the present invention includes a storage capacitor that has a storage-on-gate structure. One embodiment of the present invention discloses the array substrate having a metal island pattern on the substrate beneath a drain electrode. The metal island pattern is disposed beneath a drain contact hole through which a pixel electrode contacts the drain electrode. Since the metal island pattern has the same thickness as the gate line, the passivation layer can have the same height both in a drain region and in a storage region. Over-etching is minimized with the passivation layer in the drain and storage region having the same uniform thickness.

Abstract: A method of fabricating liquid crystal display devices that includes plasma etching an insulation layer while simultaneously removing contaminates from the exposed surface of a substrate. Thinning of the substrate can then be performed by a subsequent etch process to form a highly planar substrate surface that can improve the picture quality of the completed LCD device.

Abstract: An array substrate of the present invention includes a storage capacitor that has a storage-on-gate structure. One embodiment of the present invention discloses the array substrate having a metal island pattern on the substrate beneath a drain electrode. The metal island pattern is disposed beneath a drain contact hole through which a pixel electrode contacts the drain electrode. Since the metal island pattern has the same thickness as the gate line, the passivation layer can have the same height both in a drain region and in a storage region. Over-etching is minimized with the passivation layer in the drain and storage region having the same uniform thickness.

Abstract: An array substrate of the present invention includes a storage capacitor that has a storage-on-gate structure. One embodiment of the present invention discloses the array substrate having a metal island pattern on the substrate beneath a drain electrode. The metal island pattern is disposed beneath a drain contact hole through which a pixel electrode contacts the drain electrode. Since the metal island pattern has the same thickness as the gate line, the passivation layer can have the same height both in a drain region and in a storage region. Over-etching is minimized with the passivation layer in the drain and storage region having the same uniform thickness.

Abstract: An array substrate of the present invention includes a storage capacitor that has a storage-on-gate structure. One embodiment of the present invention discloses the array substrate having a metal island pattern on the substrate beneath a drain electrode. The metal island pattern is disposed beneath a drain contact hole through which a pixel electrode contacts the drain electrode. Since the metal island pattern has the same thickness as the gate line, the passivation layer can have the same height both in a drain region and in a storage region. Over-etching is minimized with the passivation layer in the drain and storage region having the same uniform thickness.

Abstract: A method of fabricating liquid crystal display devices that includes plasma etching an insulation layer while simultaneously removing contaminates from the exposed surface of a substrate. Thinning of the substrate can then be performed by a subsequent etch process to form a highly planar substrate surface that can improve the picture quality of the completed LCD device.