Patents by Inventor Seina YAMAZAKI

Seina YAMAZAKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of producing block copolymer capable of creating specific structure pattern
    Patent number: 11560444
    Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure of a structural unit (u21) represented by general formula (u2-1) shown below, and the volume ratio of the first block, based on all blocks constituting the block copolymer being 42 to 44 vol %: In which RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 is a group derived from a compound represented by formula SHRt1, wherein Rt1 represents a hydrocarbon group having 1 to 5 carbon atoms optionally having a substituent.
    Type: Grant
    Filed: February 3, 2020
    Date of Patent: January 24, 2023
    Assignees: TOKYO OHKA KOGYO CO., LTD., TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Teruaki Hayakawa, Seina Yamazaki, Akiyoshi Yamazaki, Daisuke Kawana, Yoshitaka Komuro, Takaya Maehashi, Rin Odashima
  • Block copolymer, and method of producing structure containing phase-separated structure
    Patent number: 10941253
    Abstract: A block copolymer including a first block and a second block, the first block consisting of a polymer (P1) having a repeating structure of a structural unit (u1) containing in a side chain thereof a hyperbranched structure containing a silicon atom.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: March 9, 2021
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Tokyo Institute of Technology
    Inventors: Teruaki Hayakawa, Seina Yamazaki, Rin Odashima, Takehiro Seshimo, Daisuke Kawana, Akiyoshi Yamazaki
  • METHOD OF PRODUCING BLOCK COPOLYMER CAPABLE OF CREATING SPECIFIC STRUCTURE PATTERN
    Publication number: 20200262960
    Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure of a structural unit (u21) represented by general formula (u2-1) shown below, and the volume ratio of the first block, based on all blocks constituting the block copolymer being 42 to 44 vol %: In which RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 is a group derived from a compound represented by formula SHRt1, wherein Rt1 represents a hydrocarbon group having 1 to 5 carbon atoms optionally having a substituent.
    Type: Application
    Filed: February 3, 2020
    Publication date: August 20, 2020
    Inventors: Teruaki HAYAKAWA, Seina YAMAZAKI, Akiyoshi YAMAZAKI, Daisuke KAWANA, Yoshitaka KOMURO, Takaya MAEHASHI, Rin ODASHIMA
  • BLOCK COPOLYMER, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
    Publication number: 20180244856
    Abstract: A block copolymer including a first block and a second block, the first block consisting of a polymer (P1) having a repeating structure of a structural unit (u1) containing in a side chain thereof a hyperbranched structure containing a silicon atom.
    Type: Application
    Filed: February 13, 2018
    Publication date: August 30, 2018
    Inventors: Teruaki HAYAKAWA, Seina YAMAZAKI, Rin ODASHIMA, Takehiro SESHIMO, Daisuke KAWANA, Akiyoshi YAMAZAKI