Patents by Inventor Seishi SHIBAYAMA

Seishi SHIBAYAMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polysiloxane, composition comprising the same and cured film using the same
    Patent number: 11866553
    Abstract: [Problem] To provide a polysiloxanecapable of forming a cured film of a thick film with high heat resistance, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition. [Means for Solution] To provide a polysiloxane comprising a repeating unit represented by the following formula (Ib), wherein R2 is each independently hydrogen, alkyl, aryl, alkenyl, and the like, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: January 9, 2024
    Assignee: Merck Patent GmbH
    Inventors: Naofumi Yoshida, Megumi Takahashi, Seishi Shibayama, Katsuto Taniguchi, Masanobu Hayashi, Toshiaki Nonaka
  • DEVICE
    Publication number: 20230320140
    Abstract: The present invention relates to a color conversion device (100).
    Type: Application
    Filed: September 1, 2021
    Publication date: October 5, 2023
    Applicant: MERCK PATENT GMBH
    Inventors: Tadashi KISHIMOTO, Atsuko NOYA, Julian BURSCHKA, Teruaki SUZUKI, Daishi YOKOYAMA, Seishi SHIBAYAMA
  • Negative type photosensitive composition
    Patent number: 11579530
    Abstract: [Problem] To provide a negative type photosensitive composition which can be developed with a low-concentration developer. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin having a carboxyl group, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent, wherein the content of the compound containing two or more (meth)acryloyloxy groups is 40 to 300 mass % based on the total mass of the alkali-soluble resin.
    Type: Grant
    Filed: July 29, 2020
    Date of Patent: February 14, 2023
    Assignee: MERCK PATENT GMBH
    Inventors: Daishi Yokoyama, Seishi Shibayama, Atsuko Noya
  • Negative type photosensitive composition comprising black colorant
    Patent number: 11579527
    Abstract: [Problem] To provide a negative type photosensitive composition which is capable of forming a cured film having high resolution and high light shielding properties. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin, (II) a black colorant, (III) a polymerization initiator, and (IV) a solvent, wherein the black colorant (II) has a transmittance ratio represented by [transmittance at the wavelength of 365 nm]/[transmittance at the wavelength of 500 nm] of 1.2 more.
    Type: Grant
    Filed: July 29, 2020
    Date of Patent: February 14, 2023
    Assignee: MERCK PATENT GMBH
    Inventors: Seishi Shibayama, Daishi Yokohama, Atsuko Noya
  • NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
    Publication number: 20220260912
    Abstract: [Problem] To provide a negative type photosensitive composition which can be developed with a low-concentration developer. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin having a carboxyl group, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent, wherein the content of the compound containing two or more (meth)acryloyloxy groups is 40 to 300 mass % based on the total mass of the alkali-soluble resin.
    Type: Application
    Filed: July 29, 2020
    Publication date: August 18, 2022
    Inventors: Daishi YOKOYAMA, Seishi SHIBAYAMA, Atsuko NOYA
  • NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION COMPRISING BLACK COLORANT
    Publication number: 20220260913
    Abstract: [Problem] To provide a negative type photosensitive composition which is capable of forming a cured film having high resolution and high light shielding properties. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin, (II) a black colorant, (III) a polymerization initiator, and (IV) a solvent, wherein the black colorant (II) has a transmittance ratio represented by [transmittance at the wavelength of 365 nm]/[transmittance at the wavelength of 500 nm] of 1.2 more.
    Type: Application
    Filed: July 29, 2020
    Publication date: August 18, 2022
    Inventors: Seishi SHIBAYAMA, Daishi YOKOHAMA, Atsuko NOYA
  • POLYSILOXANE, COMPOSITION COMPRISING THE SAME AND CURED FILM USING THE SAME
    Publication number: 20210171718
    Abstract: [Problem] To provide a polysiloxanecapable of forming a cured film of a thick film with high heat resistance, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition. [Means for Solution] To provide a polysiloxane comprising a repeating unit represented by the following formula (Ib), wherein R2 is each independently hydrogen, alkyl, aryl, alkenyl, and the like, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition.
    Type: Application
    Filed: November 29, 2018
    Publication date: June 10, 2021
    Inventors: Naofumi YOSHIDA, Megumi TAKAHASHI, Seishi SHIBAYAMA, Katsuto TANIGUCHI, Masanobu HAYASHI, Toshiaki NONAKA
  • POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM USING THE SAME
    Publication number: 20200225583
    Abstract: To provide a positive type photosensitive composition capable of forming a cured film of a thick film with high heat resistance. A positive type photosensitive siloxane composition comprising a polysiloxane having a specific structure, a silanol condensation catalyst, a diazonaphtho-quinone derivative and a solvent.
    Type: Application
    Filed: September 24, 2018
    Publication date: July 16, 2020
    Inventors: Naofumi YOSHIDA, Megumi TAKAHASHI, Seishi SHIBAYAMA, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Mask blank having a resist layer, method for manufacturing mask blank having resist layer, and method for manufacturing transfer mask
    Patent number: 10712652
    Abstract: A mask blank having a resist layer, which enables charge-up to be suppressed during electron beam irradiation. The mask blank having a resist layer includes a substrate having a thin film, a resist layer formed on a surface of the thin film, and a conductive layer formed on the resist layer. The conductive layer includes a first metal layer containing aluminum as a main component thereof and a second metal layer made of a metal other than aluminum. The first metal layer is formed on the resist layer side of the second metal layer.
    Type: Grant
    Filed: November 7, 2016
    Date of Patent: July 14, 2020
    Assignee: HOYA CORPORATION
    Inventors: Takahiro Hiromatsu, Hiroaki Shishido, Seishi Shibayama
  • MASK BLANK HAVING RESIST LAYER, METHOD FOR MANUFACTURING MASK BLANK HAVING RESIST LAYER, AND METHOD FOR MANUFACTURING TRANSFER MASK
    Publication number: 20180335693
    Abstract: A mask blank having a resist layer, which enables charge-up to be suppressed during electron beam irradiation. The mask blank having a resist layer includes a substrate having a thin film, a resist layer formed on a surface of the thin film, and a conductive layer formed on the resist layer. The conductive layer includes a first metal layer containing aluminum as a main component thereof and a second metal layer made of a metal other than aluminum. The first metal layer is formed on the resist layer side of the second metal layer.
    Type: Application
    Filed: November 7, 2016
    Publication date: November 22, 2018
    Applicant: HOYA CORPORATION
    Inventors: Takahiro HIROMATSU, Hiroaki SHISHIDO, Seishi SHIBAYAMA