Patents by Inventor Seitarou Hattori

Seitarou Hattori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a trench isolation
    Patent number: 8318582
    Abstract: A method of forming a trench isolation, comprising the steps of: applying a silicone resin composition comprising a silicone resin which is represented by the following rational formula (1) and is solid at 120° C.: (H2SiO)n(HSiO1.5)m(SiO2)k??(1) (wherein n, m and k are each a number, with the proviso that when n+m+k=1, n is 0 to 0.8, m is 0 to 1.0, and k is 0 to 0.2) and an organic solvent to a substrate having trenches in such a manner that the trenches of the substrate are filled with the silicone resin composition so as to form a coating film; and carrying out the step of bringing the coating film into contact with at least one selected from the group consisting of water, an alcohol and hydrogen peroxide and the step of subjecting the coating film to at least one treatment selected from the group consisting of a heat treatment and an optical treatment.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: November 27, 2012
    Assignee: JSR Corporation
    Inventors: Seitarou Hattori, Manabu Sekiguchi, Terukazu Kokubo, Kentaro Tamaki, Tsuyoshi Furukawa, Taichi Matsumoto, Chiaki Miyamoto
  • METHOD OF FORMING A TRENCH ISOLATION
    Publication number: 20110053340
    Abstract: A method of forming a trench isolation, comprising the steps of: applying a silicone resin composition comprising a silicone resin which is represented by the following rational formula (1) and is solid at 120° C.: (H2SiO)n(HSiO1.5)m(SiO2)k??(1) (wherein n, m and k are each a number, with the proviso that when n+m+k=1, n is 0 to 0.8, m is 0 to 1.0, and k is 0 to 0.2) and an organic solvent to a substrate having trenches in such a manner that the trenches of the substrate are filled with the silicone resin composition so as to form a coating film; and carrying out the step of bringing the coating film into contact with at least one selected from the group consisting of water, an alcohol and hydrogen peroxide and the step of subjecting the coating film to at least one treatment selected from the group consisting of a heat treatment and an optical treatment.
    Type: Application
    Filed: January 30, 2009
    Publication date: March 3, 2011
    Applicant: JSR CORPORATION
    Inventors: Seitarou Hattori, Manabu Sekiguchi, Terukazu Kokubo, Kentaro Tamaki, Tsuyoshi Furukawa, Taichi Matsumoto, Chiaki Miyamoto