Patents by Inventor Seiya Fujimoto
Seiya Fujimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240133424Abstract: A motor according to the present application includes a rotating shaft, a bearing, a bearing holder configured to accommodate the bearing, a holder disposed at one end portion side of the bearing holder in a rotating shaft direction, and a lid disposed at another end portion side of the bearing holder in the rotating shaft direction. A labyrinth structure is formed of one end portion of the bearing holder and an inner peripheral portion of the holder, and/or a labyrinth structure is formed of the rotating shaft and the lid.Type: ApplicationFiled: January 2, 2024Publication date: April 25, 2024Inventor: Seiya FUJIMOTO
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Patent number: 11892033Abstract: A motor according to the present application includes a rotating shaft, a bearing, a bearing holder configured to accommodate the bearing, a holder disposed at one end portion side of the bearing holder in a rotating shaft direction, and a lid disposed at another end portion side of the bearing holder in the rotating shaft direction. A labyrinth structure is formed of one end portion of the bearing holder and an inner peripheral portion of the holder, and/or a labyrinth structure is formed of the rotating shaft and the lid.Type: GrantFiled: February 21, 2022Date of Patent: February 6, 2024Assignee: MINEBEA MITSUMI Inc.Inventor: Seiya Fujimoto
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Patent number: 11862486Abstract: A substrate processing apparatus includes a substrate holding unit 31 configured to hold a substrate W; an outer nozzle 45 configured to discharge a processing liquid toward a surface of the substrate from a position at an outside of an outer edge of the substrate held by the substrate holding unit such that at least a central portion of the surface of the substrate is covered with a liquid film of the discharged processing liquid; and an actuator 46 (90) configured to change a height position or a discharge angle of the outer nozzle.Type: GrantFiled: August 5, 2020Date of Patent: January 2, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Kazuki Kosai, Yoshihiro Kai, Gentaro Goshi, Hiroshi Komiya, Seiya Fujimoto, Takahisa Otsuka
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Publication number: 20230170769Abstract: A wiring board includes a base including a hole part, an inner circumferential end part forming the hole part, and a wiring line including a part surrounding the hole part. The inner circumferential end part of the base is arranged at an inner side than the part surrounding the hole part. The inner circumferential end part of the base is deformed in a direction passing through the hole part.Type: ApplicationFiled: April 23, 2021Publication date: June 1, 2023Inventors: Koichiro HIRABAYASHI, Seiya FUJIMOTO
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Publication number: 20230005763Abstract: An apparatus includes: a tank storing a processing liquid; a circulation line; a branch line; a processing part for supplying the processing liquid to a substrate at the branch line; a discharge part for reducing a storage amount of the processing liquid; a supply part for supplying a new processing liquid to the tank; and a controller including: a first determination part for determining whether the storage amount is less than a lower limit value; a first replenishment controller for replenishing the processing liquid to the tank when the storage amount is less than the lower limit value; a calculation part for calculating a replenishment amount of the processing liquid; and a second replenishment controller for reducing the storage amount and replenishing the processing liquid to the tank when a calculation value of the replenishment amount is less than a set value.Type: ApplicationFiled: June 22, 2022Publication date: January 5, 2023Inventors: Kazuki KOSAI, Hideaki UDOU, Seiya FUJIMOTO, Yudai TAKANAGA, Takahito NAKASHOYA, Shogo FUKUI, Atsushi ANAMOTO, So OSADA
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Publication number: 20220275829Abstract: A motor according to the present application includes a rotating shaft, a bearing, a bearing holder configured to accommodate the bearing, a holder disposed at one end portion side of the bearing holder in a rotating shaft direction, and a lid disposed at another end portion side of the bearing holder in the rotating shaft direction. A labyrinth structure is formed of one end portion of the bearing holder and an inner peripheral portion of the holder, and/or a labyrinth structure is formed of the rotating shaft and the lid.Type: ApplicationFiled: February 21, 2022Publication date: September 1, 2022Inventor: Seiya FUJIMOTO
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Publication number: 20220278577Abstract: A motor according to the present application includes a rotor including a magnet, a yoke including an inner side surface around the magnet and having an annular shape, and a holder configured to hold the yoke. The yoke includes an end portion at the holder side in a rotating shaft (X) direction of the rotor. An outer side surface of the holder fits in an inner side surface of the yoke. The end portion of the yoke at the holder side and an outer side surface of the holder engage with each other.Type: ApplicationFiled: February 21, 2022Publication date: September 1, 2022Inventor: Seiya FUJIMOTO
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Publication number: 20220103043Abstract: A rotating device according to an embodiment includes a motor, an output gear to transmit the rotation of the motor to the external device, and a housing accommodating the motor and the output gear. The motor is held by holding parts formed at the housing via an adhesive having elasticity. The adhesive having elasticity is disposed between surfaces perpendicular to an axial direction in the holding parts of the housing, and a first end part and a second end part-of a frame.Type: ApplicationFiled: December 2, 2019Publication date: March 31, 2022Inventors: Koichiro HIRABAYASHI, Yukimasa MATSUMURA, Seiya FUJIMOTO
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Patent number: 10914317Abstract: A centrifugal fan that is light in weight and has a structure that restrains vibration are provided. The centrifugal fan includes a resin upper casing, a resin lower casing, an impeller, a motor, and a circuit board. The impeller, the motor and the circuit board are housed between the resin upper casing and the resin lower casing. Radial ribs and a concentric ribs for reinforcing are formed at a bottom surface of a concave part of the lower casing. Resin pins are provided in a standing manner at these rib parts, and the circuit board is fixed to the lower casing by the resin pins.Type: GrantFiled: May 23, 2018Date of Patent: February 9, 2021Assignees: MINEBEA MITSUMI INC., TOYOTA BOSHOKU KABUSHIKI KAISHAInventors: Wataru Nogamida, Masaaki Matsubara, Seiya Fujimoto, Tetsuya Seki, Satoshi Hatahara, Kiyohisa Nara, Atsushi Tsuzaki, Yuki Kadono, Yuya Makino, Hiroshi Murahata
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Patent number: 10871171Abstract: A centrifugal fan comprises a rotor that has a rotor yoke, an impeller that has a blade and is coupled to the outer periphery of the rotor yoke, a motor that rotates the rotor and a casing that has a suction opening and a discharge opening, and houses the rotor, the impeller, and the motor. The impeller rotating together with the rotor discharges air sucked in through the suction opening to the outside of the casing through the discharge opening. An inner periphery part of the blade on the rotor yoke side extends to the inner periphery side, in such a manner as to overlap with an outer peripheral surface of the rotor yoke in the axial direction of the motor.Type: GrantFiled: March 31, 2017Date of Patent: December 22, 2020Assignee: MINEBEA MITSUMI INC.Inventors: Kiyohisa Nara, Seiya Fujimoto
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Publication number: 20200365424Abstract: A substrate processing apparatus includes a substrate holding unit 31 configured to hold a substrate W; an outer nozzle 45 configured to discharge a processing liquid toward a surface of the substrate from a position at an outside of an outer edge of the substrate held by the substrate holding unit such that at least a central portion of the surface of the substrate is covered with a liquid film of the discharged processing liquid; and an actuator 46 (90) configured to change a height position or a discharge angle of the outer nozzle.Type: ApplicationFiled: August 5, 2020Publication date: November 19, 2020Inventors: Kazuki Kosai, Yoshihiro Kai, Gentaro Goshi, Hiroshi Komiya, Seiya Fujimoto, Takahisa Otsuka
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Patent number: 10770316Abstract: A substrate processing apparatus includes a substrate holding unit 31 configured to hold a substrate W; an outer nozzle 45 configured to discharge a processing liquid toward a surface of the substrate from a position at an outside of an outer edge of the substrate held by the substrate holding unit such that at least a central portion of the surface of the substrate is covered with a liquid film of the discharged processing liquid; and an actuator 46 (90) configured to change a height position or a discharge angle of the outer nozzle.Type: GrantFiled: November 17, 2016Date of Patent: September 8, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Kazuki Kosai, Yoshihiro Kai, Gentaro Goshi, Hiroshi Komiya, Seiya Fujimoto, Takahisa Otsuka
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Patent number: 10685858Abstract: The substrate processing method according to an exemplary embodiment includes a low temperature dissolving processing and an etching processing. The low temperature dissolving processing dissolves oxygen in an alkaline aqueous solution cooled to a predetermined temperature lower than the room temperature. The etching processing etches a substrate by supplying the alkaline aqueous solution in which oxygen is dissolved to the substrate.Type: GrantFiled: June 27, 2018Date of Patent: June 16, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Hiroyuki Higashi, Takahisa Otsuka, Kazuyoshi Shinohara, Takashi Nakazawa, Seiya Fujimoto, Yuichi Douki
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Publication number: 20190376523Abstract: The application provides a centrifugal fan that can be easily positioned when it is installed in a device or apparatus, which can further improve positioning accuracy, and which can decrease noise, even if it is made thin. In the centrifugal fan in which an impeller is received inside a casing and air drawn in from a suction port formed on the casing by rotating the impeller is discharged from the casing to the outside of a blowing port, a circular protruded portion is formed on a peripheral edge of the suction port, and protrudes upwardly in a shaft direction from an upper surface of the casing.Type: ApplicationFiled: August 21, 2019Publication date: December 12, 2019Inventors: Takuji YAMADA, Masaaki MATSUBARA, Seiya FUJIMOTO, Kiyohisa NARA
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Patent number: 10458424Abstract: There is provided a centrifugal fan that effectively cools an electronic component with a simple structure. The centrifugal fan comprises an impeller 8 having a plurality of pins extending in an axial direction, a rotor yoke 18 formed with a plurality of through-holes through which the pins penetrate, the rotor yoke 18 being joined to the impeller 8 as the pins penetrate through the through-holes, and a circuit board 10 arranged in a state having a gap with respect to the rotor yoke 18, wherein an end 11c? of the pin protrudes from the rotor yoke to a side of the circuit board, and the plurality of pins are arranged with uneven pitch in a circumferential direction of the impeller.Type: GrantFiled: June 22, 2017Date of Patent: October 29, 2019Assignee: MINEBEA MITSUMI INC.Inventors: Kiyohisa Nara, Seiya Fujimoto
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Patent number: 10428827Abstract: The present invention provides a centrifugal fan that can be easily positioned when it is installed in a device or apparatus, which can further improve positioning accuracy, and which can decrease noise, even if it is made thin. In the centrifugal fan in which an impeller is received inside a casing and air drawn in from a suction port formed on the casing by rotating the impeller is discharged from the casing to the outside of a blowing port, a circular protruded portion is formed on a peripheral edge of the suction port, and protrudes upwardly in a shaft direction from an upper surface of the casing.Type: GrantFiled: October 20, 2016Date of Patent: October 1, 2019Assignee: MINEBEA MITSUMI INC.Inventors: Takuji Yamada, Masaaki Matsubara, Seiya Fujimoto, Kiyohisa Nara
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Patent number: 10316860Abstract: A centrifugal fan includes: a casing including an upper casing, a lower casing, and struts disposed between the upper casing and the lower casing; and an impeller that is provided in the casing, the impeller having an annular shroud, a plurality of blades, and a main plate, wherein the main plate of the impeller has an inclined surface between an inner circumference side and an outer circumference side of the impeller, and wherein the inner circumference side of the impeller is located at an upward position in an axial direction of the impeller, and the outer circumference side of the impeller is located at an downward position in the axial direction of the impeller.Type: GrantFiled: July 27, 2016Date of Patent: June 11, 2019Assignee: Minebea Co., Ltd.Inventors: Seiya Fujimoto, Kiyohisa Nara, Tetsuya Seki
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Publication number: 20190003485Abstract: A valve device for a cooling water system of a motor vehicle, with a housing including a first connection and a second connection for a first liquid circuit, and a third connection and a fourth connection for a second liquid circuit, wherein the first connection is permanently fluidically connected to the second connection, and with a valve unit including a movably mounted valve element with which a thermally activatable spring element is associated, and which opens a connection between the third connection and the fourth connection in a first end position and cuts off the connection in a second end position. The thermally activatable spring element is arranged in a chamber located between the first connection and the second connection, which is permanently cut off from the third and the fourth connection and which preloads the valve element in the direction of the second end position.Type: ApplicationFiled: May 23, 2018Publication date: January 3, 2019Inventors: Wataru NOGAMIDA, Masaaki MATSUBARA, Seiya FUJIMOTO, Tetsuya SEKI, Satoshi HATAHARA, Kiyohisa NARA, Atsushi TSUZAKI, Yuki KADONO, Yuya MAKINO, Hiroshi MURAHATA
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Publication number: 20190006206Abstract: The substrate processing method according to an exemplary embodiment includes a low temperature dissolving processing and an etching processing. The low temperature dissolving processing dissolves oxygen in an alkaline aqueous solution cooled to a predetermined temperature lower than the room temperature. The etching processing etches a substrate by supplying the alkaline aqueous solution in which oxygen is dissolved to the substrate.Type: ApplicationFiled: June 27, 2018Publication date: January 3, 2019Inventors: Hiroyuki Higashi, Takahisa Otsuka, Kazuyoshi Shinohara, Takashi Nakazawa, Seiya Fujimoto, Yuichi Douki
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Publication number: 20180337067Abstract: A substrate processing apparatus includes a substrate holding unit 31 configured to hold a substrate W; an outer nozzle 45 configured to discharge a processing liquid toward a surface of the substrate from a position at an outside of an outer edge of the substrate held by the substrate holding unit such that at least a central portion of the surface of the substrate is covered with a liquid film of the discharged processing liquid; and an actuator 46 (90) configured to change a height position or a discharge angle of the outer nozzle.Type: ApplicationFiled: November 17, 2016Publication date: November 22, 2018Inventors: Kazuki Kosai, Yoshihiro Kai, Gentaro Goshi, Hiroshi Komiya, Seiya Fujimoto, Takahisa Otsuka