Patents by Inventor Seiya Imada

Seiya Imada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 3969420
    Abstract: Resorcinol and hydroquinone are recovered in mixture at a high purity from a solution containing resorcinol and hydroquinone, especially, a solution resulting from cleavage of oxidation products of isopropylbenzene and successive distillation of the cleavage product thereby to remove lower and higher boiling components therefrom, by adding 0.
    Type: Grant
    Filed: July 2, 1973
    Date of Patent: July 13, 1976
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hideaki Suda, Iwao Dohgane, Takashi Chinuki, Kenji Tanimoto, Hirokazu Hosaka, Yukimichi Nakao, Yuji Ueda, Seiya Imada, Hideki Yanagihara, Kunihiko Tanaka
  • Patent number: 3953521
    Abstract: Meta-and/or paradiisopropylbenzene dihydroperoxides are continuously produced by oxidizing meta-and/or paradiisopropylbenzenes in liquid phase through contact with oxygen or a gas containing oxygen, while keeping the concentration of meta-and/or paradiisopropylbenzene monohydroperoxides of the oxidation product solution in a range of 20 to 40% by weight.
    Type: Grant
    Filed: June 27, 1975
    Date of Patent: April 27, 1976
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hideaki Suda, Iwao Dohgane, Takashi Chinuki, Kenji Tanimoto, Hirokazu Hosaka, Yukimichi Nakao, Yuji Ueda, Seiya Imada, Hideki Yanagihara, Kunihiko Tanaka
  • Patent number: 3950431
    Abstract: Impurities, that is, by-products, in an oxidation product solution obtained by oxidation of diisopropylbenzene by molecular oxygen or in the oxidation product solution freed from diisopropylbenzene dihydroperoxide, are removed by extracting the by-products such as carbinols, ketones and styrenes from the solution with a mixture of an aqueous alkaline solution and at least one of alcohols having 1 to 3 carbon atoms such as methanol, ethanol, and isopropanol, as an extracting reagent at a temperature of 20.degree. to 80.degree.C.
    Type: Grant
    Filed: September 20, 1973
    Date of Patent: April 13, 1976
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hideaki Suda, Iwao Dohgane, Takashi Chinuki, Kenji Tanimoto, Hirokazu Hosaka, Yukimichi Nakao, Yuji Ueda, Seiya Imada, Hideki Yanagihara, Kunihiko Tanaka
  • Patent number: 3933921
    Abstract: In a process for the production of hydroperoxides by the oxidation of an aromatic hydrocarbon having at least one tertiary carbon atom with oxygen or an oxygen containing gas in the presence of an aqueous alkaline solution, an improvement is made in that the oxidation is effected in an emulsion phase which is caused by powerfully mixing all or a part of the materials to be brought into the oxidation reaction only by the aid of the hydroperoxides formed in the reaction, whereby enhancing the reaction rate with safety.
    Type: Grant
    Filed: June 18, 1973
    Date of Patent: January 20, 1976
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hideaki Suda, Iwao Dohgane, Takashi Chinuki, Kenji Tanimoto, Hirokazu Hosaka, Yukimichi Nakao, Yuji Ueda, Seiya Imada, Hideki Yanagihara, Kunihiko Tanaka
  • Patent number: 3932528
    Abstract: Dihydroperoxides of dialkylaromatic hydrocarbons are separated in high yield from an aqueous alkaline solutions of hydroperoxides containing the dihydroperoxides by adding 0.01 to 1 % by weight of a compound having a nitrogen base, such as ammonia and aromatic amines, to the solution, based on the weight of the solution, thereby stabilizing the dihydroperoxides in the solution, and separating the dihydroperoxides therefrom by extraction.
    Type: Grant
    Filed: August 27, 1973
    Date of Patent: January 13, 1976
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hideaki Suda, Iwao Dohgane, Takashi Chinuki, Kenji Tanimoto, Hirokazu Hosaka, Yukimichi Nakao, Yuji Ueda, Seiya Imada, Hideki Yanagihara, Kunihiko Tanaka