Patents by Inventor Seiya TOMIZAWA

Seiya TOMIZAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240117083
    Abstract: A chloroprene-based polymer, wherein: a 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.80 to 6.00 ppm; when an area of the peak at 5.80 to 6.00 ppm is A and an area of a peak at 4.05 to 6.00 ppm is B, A/B is 1.20/100 or less; the 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.40 to 5.60 ppm; when an area of the peak at 5.40 to 5.60 ppm is D and the area of the peak at 4.05 to 6.00 ppm is B, D/B is 97.20/100 or less, is provided.
    Type: Application
    Filed: March 24, 2022
    Publication date: April 11, 2024
    Applicant: DENKA COMPANY LIMITED
    Inventors: Seiya TOMIZAWA, Wataru NISHINO, Misaki TADA
  • Publication number: 20240117161
    Abstract: A chloroprene-based polymer latex including a chloroprene-based polymer, wherein: an amount of substance of alkali metal cation per unit mass in the chloroprene-based polymer latex is 0.05 to 0.12 mmol/g, when the chloroprene-based polymer latex is freeze-dried to obtain a solid content containing the chloroprene-based polymer, and an ethanol-toluene azeotropic mixture soluble content specified in JIS K 6229 is extracted by refluxing from the solid content to obtain an extract, and the obtained extract is acid treated with hydrochloric acid, an amount of rosin acid of in the solid content measured by gas chromatography is 1.4 to 4.2% by mass with respect to 100% by mass of the chloroprene-based polymer in the solid content, is provided.
    Type: Application
    Filed: March 24, 2022
    Publication date: April 11, 2024
    Applicant: DENKA COMPANY LIMITED
    Inventors: Seiya TOMIZAWA, Wataru NISHINO, Misaki TADA