Patents by Inventor Seizi Huzino

Seizi Huzino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5461253
    Abstract: A semiconductor circuit structure including a semiconductor substrate portion and at least one region provided on one main surface thereof insulatedly isolated from other regions provided on the same surface, by burying means made of an oxide film, the burying means including a bottom flat portion and at least one side wall portion provided at least in the vicinity of an edge portion of and integrally formed with the bottom flat portion, thereby a semiconductor circuit structure provided with a plurality of insulatedly isolated regions on a main surface thereof and having a high withstand voltage can be obtained in a short production process.
    Type: Grant
    Filed: July 7, 1994
    Date of Patent: October 24, 1995
    Assignee: Nippon Steel Inc.
    Inventors: Kazuhiro Tsuruta, Seizi Huzino, Mitutaka Katada, Tadashi Hattori, Masami Yamaoka
  • Patent number: 5204282
    Abstract: A semiconductor circuit structure including a semiconductor substrate portion and at least one region provided on one main surface thereof insulatedly isolated from other regions provided on the same surface, by an burying means made of an oxide film, the burying means including a bottom flat portion and at least one side wall portion provided at least in the vicinity of an edge portion of and integrally formed with the bottom flat portion, thereby a semiconductor circuit structure provided with a plurality of insulatedly isolated regions on a main surface thereof and having a high withstand voltage can be obtained in a short production process.
    Type: Grant
    Filed: June 29, 1990
    Date of Patent: April 20, 1993
    Assignee: Nippon Soken, Inc.
    Inventors: Kazuhiro Tsuruta, Seizi Huzino, Mitutaka Katada, Tadashi Hattori, Masami Yamaoka
  • Patent number: 5153700
    Abstract: Semiconductor chips are mounted in a supporting semiconductor substrate, with matching anisotropic (crystal plane) faces on the chips and substrate. The chips may extend above the substrate to facilitate connection together.
    Type: Grant
    Filed: January 22, 1991
    Date of Patent: October 6, 1992
    Assignees: Nippondenso Co., Ltd., Nippon Soken Inc.
    Inventors: Fumio Ohara, Toshiyuki Kawai, Nobuyoshi Sakakibara, Seizi Huzino, Tadashi Hattori, Kazunori Kawamoto
  • Patent number: 4992846
    Abstract: In a method of producing a semiconductor device, an amorphous silicon layer is deposited on a polycrystalline silicon layer formed on an insulator layer (SiO.sub.2). Ions are implanted into the amorphous silicon layer while heat treating the amorphous silicon layer at a low temperature thereby forming a solid-phase growth layer, and a transistor is formed of the solid-phase growth layer.
    Type: Grant
    Filed: July 9, 1990
    Date of Patent: February 12, 1991
    Assignee: Nippon Soken, Inc.
    Inventors: Nobuyoshi Sakakibara, Mitutaka Katada, Seizi Huzino, Tadashi Hattori
  • Patent number: 4986861
    Abstract: A semiconductor pressure sensor having a cylindrical housing with an opening formed at its tip end which is exposed to a pressure atmosphere and a metal diaphragm for receiving pressure, which is formed in a wall of the cylindrical housing defining the opening. A metal oxide layer is formed in a surface of the metal diaphragm by oxidizing the surface of the metal diaphragm, and a glass layer is formed on the metal oxide layer. A semiconductor chip, on which a strain gauge is formed, is firmly and surely bonded to the metal diaphragm through the glass layer by virtue of the metal oxide layer. This semiconductor pressure sensor can measure high pressure with sufficient sensitivity and high accuracy.
    Type: Grant
    Filed: March 13, 1989
    Date of Patent: January 22, 1991
    Assignee: Nippon Soken, Inc.
    Inventors: Minoru Nishida, Naohito Mizuno, Tadashi Hattori, Seizi Huzino, Yoshiyasu Ando
  • Patent number: 4983469
    Abstract: A thin film electroluminescent element has a substrate, a transparent electrode formed on the substrate, a luminescent film wherein two kinds of luminescent centers are distributed in layers within a basic luminescent material, formed on the transparent electrode through an insulating film, and a back electrode formed on the luminescent film through another insulating film. The luminescent film of this thin film electroluminescent element can emit white light of excellent tone, including lights of three primary colors with sufficiently large luminous intensity.
    Type: Grant
    Filed: February 17, 1989
    Date of Patent: January 8, 1991
    Assignee: Nippon Soken, Inc.
    Inventors: Seizi Huzino, Shinya Mizuki, Masumi Arai, Tadashi Hattori
  • Patent number: 4912975
    Abstract: In a direct-heated flow measuring apparatus including a substrate having a film resistance pattern and a supporting member for supporting the substrate, the supporting member has good heat dissipation characteristics. Provided between the substrate and the supporting member is a heat transfer throttling portion.
    Type: Grant
    Filed: January 25, 1989
    Date of Patent: April 3, 1990
    Assignee: Nippon Soken, Inc.
    Inventors: Minoru Ohta, Kazuhiko Miura, Seizi Huzino, Kenji Kanehara, Tadashi Hattori
  • Patent number: 4870860
    Abstract: In a direct-heated flow measuring apparatus including a substrate having a film resistance pattern and a supporting member for supporting the substrate, the supporting member has good heat dissipation characteristics. Provided between the substrate and the supporting member is a heat transfer throttling portion.
    Type: Grant
    Filed: February 25, 1988
    Date of Patent: October 3, 1989
    Assignee: Nippon Soken, Inc.
    Inventors: Minoru Ohta, Kazuhiko Miura, Seizi Huzino, Kenji Kanehara, Tadashi Hattori
  • Patent number: 4843882
    Abstract: In a direct-heated flow measuring apparatus including a film resistor having a substrate supported by a supporting member in a passage, at least one face of the substrate on the upstream side thereof is sloped with respect to a fluid stream within the passage.
    Type: Grant
    Filed: July 25, 1988
    Date of Patent: July 4, 1989
    Assignee: Nippon Soken, Inc.
    Inventors: Minoru Ohta, Michitoshi Onoda, Kazuhiko Miura, Seizi Huzino, Tadashi Hattori, Kenji Kanehara, Masanori Fukutani
  • Patent number: 4840067
    Abstract: A semiconductor pressure sensor having a cylindrical housing with an opening formed at its tip end which is exposed to a pressure atmosphere and a metal diaphragm for receiving pressure which is formed in a wall of the cylindrical housing defining the opening. A metal oxide layer is formed in a surface of the metal diaphragm by oxidizing the surface of the metal diaphragm, and a glass layer is formed on the metal oxide layer. A semiconductor chip, on which a strain gauge is formed, is firmly and surely bonded to the metal diaphragm through the glass layer by virtue of the metal oxide layer. This semiconductor pressure sensor can measure high pressure with sufficient sensitivity and high accuracy.
    Type: Grant
    Filed: May 15, 1987
    Date of Patent: June 20, 1989
    Assignee: Nippon Soken, Inc.
    Inventors: Minoru Nishida, Naohito Mizuno, Tadashi Hattori, Seizi Huzino, Yoshiyasu Ando
  • Patent number: 4785662
    Abstract: A direct-heated gas-flow measuring apparatus including a measuring tube disposed in the gas stream, a film resistor for generating heat and detecting the temperature thereof, and a feedback control circuit for controlling the heat generated by the film resistor so that the temperature of the film resistor is a predetermined value. Provided at least at the upstream side of the film resistor near thereto is a shield for reducing the accumulation of deposits on the film resistor. The shield and the film resistor have substantially the same thickness to satisfy the condition:l/t.ltoreq.50where l is a distance therebetween and t is a thickness thereof.
    Type: Grant
    Filed: November 12, 1986
    Date of Patent: November 22, 1988
    Assignee: Nippon Soken, Inc.
    Inventors: Minoru Ohta, Kazuhiko Miura, Seizi Huzino, Kenji Kanehara, Tadashi Hattori
  • Patent number: 4756190
    Abstract: In a direct-heated flow measuring apparatus including a film resistor having a substrate and a resistance layer thereon, the substrate is supported by a supporting member in a passage. Provided between the substrate and the supporting member is an adiabatic member for enhancing the adiabatic effect of the resistance layer. The substrate is adhered by adhesives having an excellent thermal conductivity coefficient to the adiabatic member, and the supporting member is also adhered by adhesives having an excellent thermal conductivity coefficient to the adiabatic member.
    Type: Grant
    Filed: August 8, 1986
    Date of Patent: July 12, 1988
    Assignee: Nippon Soken, Inc.
    Inventors: Minoru Ohta, Michitoshi Onoda, Kazuhiko Miura, Seizi Huzino, Tadashi Hattori
  • Patent number: 4735099
    Abstract: A direct-heated gas-flow measuring apparatus including a measuring tube disposed in the gas stream, a film resistor for generating heat and detecting the temperature thereof, and a feedback control circuit for controlling the heat generated by the film resistor so that the temperature of the film resistor is a predetermined value. Provided in a supporting portion of the film resistor for supporting it to the measuring tube is an aperture for throttling the heat transfer thereof.
    Type: Grant
    Filed: November 24, 1986
    Date of Patent: April 5, 1988
    Assignee: Nippon Soken, Inc.
    Inventors: Minoru Ohta, Kazuhiko Miura, Seizi Huzino, Kenji Kanehara, Tadashi Hattori
  • Patent number: 4700127
    Abstract: A microwave probe has a cylindrical support made of stabilized zirconia being excellent in heat insulation, and the cylindrical support is threadably installed at a partitioning wall to partition an atmosphere of high temperature. The support is provided at the center with a through hole, and an antenna for transmitting or receiving microwave is installed at one opening of the through hole positioning at outside of the partitioning wall, and a metal ring member is installed at other opening of the through hole positioning within the partitioning wall. The transmitting and receiving antenna and the ring member are fixed to respective openings by a ceramic adhesive which is filled in the through hole and excellent in heat insulation. A part of the ring member projects in the atmosphere.
    Type: Grant
    Filed: May 1, 1985
    Date of Patent: October 13, 1987
    Assignee: Nippon Soken, Inc.
    Inventors: Kunihiko Sasaki, Masao Kodera, Seizi Huzino, Takeshi Tanaka
  • Patent number: 4688425
    Abstract: In a direct-heated flow measuring apparatus including an electric heater of a film resistor type and a temperature-detecting resistor for detecting the temperature within a passage, the flow rate thereof is measured by a sensing circuit. The temperatures of the electric heater and the temperature of the temperature-detecting resistor are compared. The measuring operation of the sensing circuit is stopped when the temperature within the passage is abnormal as indicated by this comparison.
    Type: Grant
    Filed: February 19, 1986
    Date of Patent: August 25, 1987
    Assignee: Nippon Soken, Inc.
    Inventors: Kenji Kanehara, Seizi Huzino, Kazuhiko Miura, Minoru Ohta
  • Patent number: 4627279
    Abstract: A direct-heated gas-flow measuring apparatus for a passage including a plurality of film resistors, disposed within the passage, for generating heat and measuring the temperature thereof, and a feedback control circuit for controlling the heat generated by the film resistors so that the temperature of each of the film resistors is a predetermined value. The feedback control circuit generates a plurality of output signals corresponding to voltages applied to the film resistors. A mean value for the plurality of output signals is calculated as the amount of gas-flow rate.
    Type: Grant
    Filed: May 2, 1985
    Date of Patent: December 9, 1986
    Assignee: Nippon Soken, Inc.
    Inventors: Minoru Ohta, Kazuhiko Miura, Seizi Huzino, Kenji Kanehara, Tadashi Hattori
  • Patent number: 4489695
    Abstract: The number of working cylinders of the internal combustion engine is controlled so that the load of the internal combustion engine is relatively increased thereby to keep the combustion effect within an expected range. By controlling the number of working cylinders of the internal combustion engine also to other than integral numbers, the torque control of large freedom is continuously effected. Thus the torque characteristic is smoothed, thus improving the fuel efficiency and driveability at the same time.
    Type: Grant
    Filed: January 27, 1982
    Date of Patent: December 25, 1984
    Assignee: Nippon Soken, Inc.
    Inventors: Tokio Kohama, Seizi Huzino, Hideki Obayashi, Hisasi Kawai, Tsuneyuki Egami
  • Patent number: 4434767
    Abstract: In the range where the fuel efficiency may be improved by relatively increasing the load of working cylinders at the time of partial loading of a multicylinder internal combustion engine, the intake pressure of the engine is maintained at a fixed optimum value. Also, the number of working cylinders is controlled, so that a torque actually required by the driver is obtained, and under any load, the maximum improvement of fuel efficiency may be attained at a saving of fuel consumption.
    Type: Grant
    Filed: December 23, 1981
    Date of Patent: March 6, 1984
    Assignee: Nippon Soken, Inc.
    Inventors: Tokio Kohama, Seizi Huzino, Hideki Obayashi, Hisasi Kawai, Tsuneyuki Egami